Patents by Inventor Claude L. Davis
Claude L. Davis has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6931097Abstract: The projection lithographic method for producing integrated circuits and forming patterns with extremely small feature dimensions includes an illumination sub-system (36) for producing and directing an extreme ultraviolet soft x-ray radiation ? from an extreme ultraviolet soft x-ray source (38); a mask stage (22) illuminated by the extreme ultraviolet soft x-ray radiation ? produced by illumination stage and the mask stage (22) includes a pattern when illuminated by radiation ?. A protection sub-system includes reflective multilayer coated Ti doped high purity SiO2 glass defect free surface (32) and printed media subject wafer which has a radiation sensitive surface.Type: GrantFiled: July 10, 2000Date of Patent: August 16, 2005Assignee: Corning IncorporatedInventors: Claude L. Davis, Jr., Kenneth E. Hrdina
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Patent number: 6776006Abstract: A method for manufacturing an EUV lithography element mirror includes sagging a plate of a glass material to produce an EUV mirror blank; and polishing a top face of the EUV mirror blank to produce a polished EUV mirror. A method for manufacturing an EUV lithography element mirror includes grinding a top face of a piece of a glass material; sagging a plate of the glass material over the top face of the piece to produce an EUV mirror blank; and polishing a top face of the EUV mirror blank to produce an EUV polished mirror.Type: GrantFiled: August 30, 2001Date of Patent: August 17, 2004Assignee: Corning IncorporatedInventors: Michael E. Best, Claude L. Davis, Jr., Mary J. Edwards, Thomas W. Hobbs, Gregory L. Murray
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Publication number: 20030226377Abstract: Methods and apparatus for manufacturing titania-containing fused silica bodies are disclosed. The titania-containing fused silica bodies are subsequently processed to make extreme ultraviolet soft x-ray masks. The methods and apparatus involve providing powders external to a furnace cavity and depositing the powders in the furnace cavity to form a titania-containing fused silica body.Type: ApplicationFiled: March 3, 2003Publication date: December 11, 2003Inventors: W. Tim Barrett, Bradley F. Bowden, Claude L. Davis, Kenneth E. Hrdina, Michael MR. Robinson, Michael H. Wasilewski, John F. Wight
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Patent number: 6576380Abstract: The present invention relates to reflective masks and their use for reflecting extreme ultraviolet soft x-ray photons to enable the use of extreme ultraviolet soft x-ray radiation projection lithographic methods and systems for producing integrated circuits and forming patterns with extremely small feature dimensions. The projection lithographic method includes providing an illumination sub-system for producing and directing an extreme ultraviolet soft x-ray radiation &lgr; from an extreme ultraviolet soft x-ray source; providing a mask sub-system illuminated by the extreme ultraviolet soft x-ray radiation &lgr; produced by the illumination sub-system and providing the mask sub-system includes providing a patterned reflective mask for forming a projected mask pattern when illuminated by radiation &lgr;.Type: GrantFiled: September 13, 2002Date of Patent: June 10, 2003Assignee: Corning IncorporatedInventors: Claude L. Davis, Jr., Kenneth E. Hrdina, Robert Sabia, Harrie J. Stevens
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Patent number: 6542224Abstract: A lithographic stage includes a platen having a top face and a bottom face and a holder for holding an optical component on the top face of the platen. The platen is made of a light-weight material such as high purity fused silica or ultra low expansion glass. The bottom face of the platen may further include means for connecting to a positioning device in an extreme ultraviolet lithography system.Type: GrantFiled: August 30, 2001Date of Patent: April 1, 2003Assignee: Corning IncorporatedInventors: Bradford G. Ackerman, Bradley F. Bowden, Claude L. Davis, Jr., Kenneth E. Hrdina
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Publication number: 20030017402Abstract: The present invention relates to reflective masks and their use for reflecting extreme ultraviolet soft x-ray photons to enable the use of extreme ultraviolet soft x-ray radiation projection lithographic methods and systems for producing integrated circuits and forming patterns with extremely small feature dimensions. The projection lithographic method includes providing an illumination sub-system for producing and directing an extreme ultraviolet soft. x-ray radiation &lgr; from an extreme ultraviolet soft x-ray source; providing a mask sub-system illuminated by the extreme ultraviolet soft x-ray radiation &lgr; produced by the illumination sub-system and providing the mask sub-system includes providing a patterned reflective mask for forming a projected mask pattern when illuminated by radiation &lgr;.Type: ApplicationFiled: September 13, 2002Publication date: January 23, 2003Inventors: Claude L. Davis, Kenneth E. Hrdina, Robert Sabia, Harrie J. Stevens
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Patent number: 6465272Abstract: The present invention relates to reflective masks and their use for reflecting extreme ultraviolet soft x-ray photons to enable the use of extreme ultraviolet soft x-ray radiation projection lithographic methods and systems for producing integrated circuits and forming patterns with extremely small feature dimensions. The projection lithographic method includes providing an illumination sub-system for producing and directing an extreme ultraviolet soft x-ray radiation &lgr; from an extreme ultraviolet soft x-ray source; providing a mask sub-system illuminated by the extreme ultraviolet soft x-ray radiation &lgr; produced by the illumination sub-system and providing the mask sub-system includes providing a patterned reflective mask for forming a projected mask pattern when illuminated by radiation &lgr;.Type: GrantFiled: July 13, 2000Date of Patent: October 15, 2002Assignee: Corning IncorporatedInventors: Claude L. Davis, Jr., Kenneth E. Hrdina, Robert Sabia, Harrie J. Stevens
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Publication number: 20020044267Abstract: A lithographic stage includes a platen having a top face and a bottom face and a holder for holding an optical component on the top face of the platen. The platen is made of a light-weight material such as high purity fused silica or ultra low expansion glass. The bottom face of the platen may further include means for connecting to a positioning device in an extreme ultraviolet lithography system.Type: ApplicationFiled: August 30, 2001Publication date: April 18, 2002Inventors: Bradford G. Ackerman, Bradley F. Bowden, Claude L. Davis, Kenneth E. Hrdina
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Publication number: 20020043081Abstract: A method for manufacturing an extreme ultraviolet lithography mirror for use in includes machining a bottom face of a mirror blank, polishing a top face of the mirror blank to produce a polished mirror, and cutting a piece from the polished mirror. Another method for manufacturing an extreme ultraviolet lithography mirror for use in includes annealing a faceplate to a honeycomb core, polishing the faceplate to produce a polished mirror, and cutting a piece from the polished mirror.Type: ApplicationFiled: August 30, 2001Publication date: April 18, 2002Inventors: Bradley F. Bowden, Claude L. Davis, Kenneth E. Hrdina, Gautam Meda
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Publication number: 20020043080Abstract: A method for manufacturing an EUV lithography element mirror includes sagging a plate of a glass material to produce an EUV mirror blank; and polishing a top face of the EUV mirror blank to produce a polished EUV mirror. A method for manufacturing an EUV lithography element mirror includes grinding a top face of a piece of a glass material; sagging a plate of the glass material over the top face of the piece to produce an EUV mirror blank; and polishing a top face of the EUV mirror blank to produce an EUV polished mirror.Type: ApplicationFiled: August 30, 2001Publication date: April 18, 2002Inventors: Michael E. Best, Claude L. Davis, Mary J. Edwards, Thomas W. Hobbs, Gregory L. Murray
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Patent number: 6176588Abstract: An inexpensive lightweight mirror blank having good dimensional stability, and a method of making the same is provided. The mirror blank includes an extruded ceramic honeycomb core and a faceplate bonded or otherwise affixed to the front surface of the core. The extruded honeycomb core is comprised of a matrix of cell walls defining an array of cells, with the number of cells being greater than about 16 cells per square inch, to render the core extremely light in weight yet sufficiently rigid and strong to support the optical faceplate. The faceplate is formed from a material that is capable of being polished to an optical surface. An optional back plate can be bonded or otherwise affixed to the back surface of the core in order to improve stiffness and mechanical stability of the mirror blank.Type: GrantFiled: December 14, 1999Date of Patent: January 23, 2001Assignee: Corning IncorporatedInventors: Claude L. Davis, Jr., Michael W. Linder
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Patent number: 5627676Abstract: A birefringent waveplate that is composed of an integral, transparent, glass body, the glass body consisting of non-absorbing crystalline particles dispersed in a glassy matrix, the dispersed crystalline particles being selected from the group consisting of copper chloride, copper bromide and mixtures thereof, the dispersed crystalline particles having a high aspect ratio and being oriented and aligned along a common axis, whereby the waveplate is rendered birefringent so that polarized components of light transmitted through the waveplate have a phase shift introduced.Type: GrantFiled: December 2, 1994Date of Patent: May 6, 1997Assignee: Corning IncorporatedInventors: Nicholas F. Borrelli, Claude L. Davis, Jr.
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Patent number: 5425046Abstract: An integral optical train comprising a plurality of optical components including a polarized glass element and a light-altering optical element. The polarized glass element may be a glass containing elongated particles of a silver halide selected from the group consisting of AgCl, AgBr and AgI, and the optical element may be a lens or a mirror.Type: GrantFiled: June 11, 1992Date of Patent: June 13, 1995Assignee: Corning IncorporatedInventor: Claude L. Davis, Jr.
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Patent number: RE41220Abstract: The projection lithographic method for producing integrated circuits and forming patterns with extremely small feature dimensions includes an illumination sub-system (36) for producing and directing an extreme ultraviolet soft x-ray radiation ? from an extreme ultraviolet soft x-ray source (38); a mask stage (22) illuminated by the extreme ultraviolet soft x-ray radiation ? produced by illumination stage and the mask stage (22) includes a pattern when illuminated by radiation ?. A protection sub-system includes reflective multilayer coated Ti doped high purity SiO2 glass defect free surface (32) and printed media subject wafer which has a radiation sensitive surface.Type: GrantFiled: July 10, 2000Date of Patent: April 13, 2010Assignee: Corning IncorporatedInventors: Claude L. Davis Jr., Kenneth E. Hrdina