Patents by Inventor Claudia WIDMANN

Claudia WIDMANN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate holder, plasma reactor and method for depositing diamond
    Patent number: 10100433
    Abstract: A substrate holder having a base plate where a plurality of protruding poles is arranged, said poles spaced apart from one another by intermediate spaces. Alternatively or in addition, a plasma reactor for depositing diamond from the gas phase may be provided, the plasma reactor comprising such a substrate holder. A method for depositing diamond from the gas phase may be provided.
    Type: Grant
    Filed: November 10, 2015
    Date of Patent: October 16, 2018
    Assignee: FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V
    Inventors: Christoph E. Nebel, Wolfgang Müller-Sebert, Claudia Widmann, Nicola Heidrich, Christoph Schreyvogel
  • Epitaxial diamond layer and method for the production thereof
    Patent number: 9988737
    Abstract: An epitaxial diamond layer and a method for the production thereof can be provided that comprises the following steps: providing a substrate; depositing a metal layer on at least a subarea of the substrate, wherein the metal layer contains, or consists of, at least one period 4, 5 or 6 metal having a melting point of greater than or equal to 1200 K; and depositing a diamond layer on at least a subarea of the metal layer; wherein at least one intermediate layer is deposited between the metal layer and the diamond layer and has a higher lattice constant than undoped crystalline diamond and a lower hardness than undoped crystalline diamond.
    Type: Grant
    Filed: January 15, 2016
    Date of Patent: June 5, 2018
    Assignee: FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.
    Inventors: Christoph E Nebel, Claudia Widmann
  • EPITAXIAL DIAMOND LAYER AND METHOD FOR THE PRODUCTION THEREOF
    Publication number: 20160208413
    Abstract: An epitaxial diamond layer and a method for the production thereof can be provided that comprises the following steps: providing a substrate; depositing a metal layer on at least a subarea of the substrate, wherein the metal layer contains, or consists of, at least one period 4, 5 or 6 metal having a melting point of greater than or equal to 1200 K; and depositing a diamond layer on at least a subarea of the metal layer; wherein at least one intermediate layer is deposited between the metal layer and the diamond layer and has a higher lattice constant than undoped crystalline diamond and a lower hardness than undoped crystalline diamond.
    Type: Application
    Filed: January 15, 2016
    Publication date: July 21, 2016
    Inventors: Christoph E. Nebel, Claudia Widmann
  • SUBSTRATE HOLDER, PLASMA REACTOR AND METHOD FOR DEPOSITING DIAMOND
    Publication number: 20160138189
    Abstract: A substrate holder having a base plate where a plurality of protruding poles is arranged, said poles spaced apart from one another by intermediate spaces. Alternatively or in addition, a plasma reactor for depositing diamond from the gas phase may be provided, the plasma reactor comprising such a substrate holder. A method for depositing diamond from the gas phase may be provided.
    Type: Application
    Filed: November 10, 2015
    Publication date: May 19, 2016
    Inventors: Christoph E. NEBEL, Wolfgang MÜLLER-SEBERT, Claudia WIDMANN, Nicola HEIDRICH, Christoph SCHREYVOGEL