Patents by Inventor Claudiu Valentin FALUB

Claudiu Valentin FALUB has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods of and apparatus for magnetron sputtering
    Patent number: 11848179
    Abstract: In a magnetron sputtering reaction space a magnetron magnetic field is generated. A further magnetic field is generated in the reaction space whereby a resultant magnetic field has a directional component parallel to a target plane which is larger than the directional component of the magnetron magnetic field parallel to the target plane in the reaction space.
    Type: Grant
    Filed: September 16, 2022
    Date of Patent: December 19, 2023
    Assignee: EVATEC AG
    Inventors: Hartmut Rohrmann, Claudiu Valentin Falub, Martin Bless
  • METHODS OF AND APPARATUS FOR MAGNETRON SPUTTERING
    Publication number: 20230014186
    Abstract: In a magnetron sputtering reaction space a magnetron magnetic field is generated. A further magnetic field is generated in the reaction space whereby a resultant magnetic field has a directional component parallel to a target plane which is larger than the directional component of the magnetron magnetic field parallel to the target plane in the reaction space.
    Type: Application
    Filed: September 16, 2022
    Publication date: January 19, 2023
    Inventors: Hartmut Rohrmann, Claudiu Valentin Falub, Martin Bless
  • Methods of and apparatus for magnetron sputtering
    Patent number: 11476099
    Abstract: In a magnetron sputtering reaction space a magnetron magnetic field is generated. A further magnetic field is generated in the reaction space whereby a resultant magnetic field has a directional component parallel to a target plane which is larger than the directional component of the magnetron magnetic field parallel to the target plane in the reaction space.
    Type: Grant
    Filed: April 16, 2018
    Date of Patent: October 18, 2022
    Assignee: EVATEC AG
    Inventors: Hartmut Rohrmann, Claudiu Valentin Falub, Martin Bless
  • METHODS OF AND APPARATUS FOR MAGNETRON SPUTTERING
    Publication number: 20210050193
    Abstract: In a magnetron sputtering reaction space a magnetron magnetic field is generated. A further magnetic field is generated in the reaction space whereby a resultant magnetic field has a directional component parallel to a target plane which is larger than the directional component of the magnetron magnetic field parallel to the target plane in the reaction space.
    Type: Application
    Filed: April 16, 2018
    Publication date: February 18, 2021
    Inventors: Hartmut Rohrmann, Claudiu Valentin Falub, Martin Bless
  • SOFT MAGNETIC MULTILAYER DESPOSITION APPARATUS, METHODS OF MANUFACTURING AND MAGNETIC MULTILAYER
    Publication number: 20200203071
    Abstract: The soft magnetic material multilayer deposition apparatus includes a circular arrangement of a multitude of substrate carriers in a circular inner space of a vacuum transport chamber. In operation the substrate carriers pass treatment stations. One of the treatment stations has a sputtering target made of a first soft magnetic material. A second treatment station includes a target made of a second soft magnetic material which is different from the first soft magnetic material of the first addressed target. A control unit controlling relative movement of the substrate carriers with respect to the treatment stations provides for more than one 360° revolution of the multitude of substrate carriers around the axis AX of the circular inner space of the vacuum transport chamber, while the first and second treatment stations are continuously operative.
    Type: Application
    Filed: April 18, 2018
    Publication date: June 25, 2020
    Inventors: Claudiu Valentin FALUB, Martin BLESS