Abstract: The present invention concerns a novel method for the modification and/or custom-made design of artificial non-ribosomal peptide synthetases (NRPSs) from naturally available NRPSs. The artificial NRPSs are of predetermined length and amino acid composition and sequence. Via fusion of well-defined NRPS units (so-called “exchange units”) in a certain manner, using a specific sequence motif in the linker areas it is possible to construct artificial and/or modified NRPS assembly lines, which have the ability of synthesizing peptides of a desired structure.

Abstract: The present invention describes mixtures comprising at least two organic-functional compounds OSM1 and OSM2 that are constitutional isomers of one another, especially for use in electronic devices. The invention further relates to a process for preparing the mixtures of the invention and to electronic devices comprising these.

Abstract: The present invention concerns a novel method for the modification and/or custom-made design of artificial non-ribosomal peptide synthetases (NRPSs) from naturally available NRPSs. The artificial NRPSs are of predetermined length and amino acid composition and sequence. Via fusion of well-defined NRPS units (so-called “exchange units”) in a certain manner, using a specific sequence motif in the linker areas it is possible to construct artificial and/or modified NRPS assembly lines, which have the ability of synthesizing peptides of a desired structure.

Abstract: Method for the chromatographic separation of compounds of the formula (I), in which R1, R2, R3, R4, R5, R6 have the meanings indicated in Claim 1, and acid-addition salts thereof, characterized in that the separation is carried out on a chiral ion-exchanger material.

Abstract: A new process for the enantiomeric separation of racemic 3,6-dihydro-1,3,5-triazine derivatives for the treatment of disorders associated with insulin-resistance syndrome, by preferential crystallization.

Abstract: A new process for the enantiomeric separation of racemic 3,6-dihydro-1,3,5-triazine derivatives for the treatment of disorders associated with insulin-resistance syndrome, by preferential crystallization.

Abstract: Method for the chromatographic separation of compounds of the formula (I), in which R1, R2, R3, R4, R5, R6 have the meanings indicated in claim 1, and acid-addition salts thereof, characterised in that the separation is carried out on a chiral ion-exchanger material.

Abstract: The invention relates to monoalkylaminoketones of the formula (I), in which R1 and R2 have the meanings indicated.

Abstract: The invention relates to monoalkylaminoketones of the formula (I), in which R1 and R2 have the meanings indicated.

Abstract: The present invention relates to a process for the hydrogenation of metallocenes, which comprises treating at least one metallocene containing at least one double bond and/or at least one aromatic substituent in at least one nonhalogenated solvent with hydrogen in the presence of at least one hydrogenation catalyst.

Abstract: Compounds of the general formula I: (SIL--X--).sub.m IN (I), in which SIL is a radical of the formula Si(R.sup.1)(R.sup.2)(R.sup.3), where R.sup.1 is an alkyl, haloalkyl or alkoxy radical of 1 to 8 carbon atoms, an alkenyl radical, an alkenyloxy or acyloxy radical of 2 to 8 carbon atoms, an aryl or aryloxy radical of 6 to 10 carbon atoms, or a dialkyl-, diaryl- or alkylaryl-methyleneaminooxy radical having C.sub.1 -C.sub.4 -alkyl or C.sub.6 -aryl groups; and R.sup.2 and R.sup.3 are identical or different radicals with the meaning of R.sup.1 or X--IN; X is a group C.sub.n H.sub.2n ; IN is the radical of a compound which is active as a photoinitiator or photosensitizer and which has at least one carbonyl group located on an aromatic nucleus; m is a number from 1 to 4; and n is a number from 2 to 12, or of the formula II: Si.sub.o O.sub.o-1 (--X--IN).sub.p R.sup.4.sub.2o+2-p (II), in which R.sup.4 is a radical with the meaning of R.sup.1, and two or more radicals R.sup.

Abstract: The present invention relates to an improved lithographic photoresist composition comprising a photosensitive base generator. The composition is useful in the manufacture of integrated circuits.