Patents by Inventor Claus Zahlten

Claus Zahlten has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Imaging optics and projection exposure installation for microlithography with an imaging optics
    Patent number: 9057964
    Abstract: Imaging optics includes a first mirror in the imaging beam path after the object field, a last mirror in the imaging beam path before the image field, and a fourth to last mirror in the imaging beam path before the image field. In an unfolded imaging beam path between the object plane and the image plane, an impingement point of the chief ray on a used region of each of the plurality of mirrors has a mirror spacing from the image plane. The mirror spacing of the first mirror is greater than the mirror spacing of the last mirror. The mirror spacing of the fourth to last mirror is greater than the mirror spacing of the first mirror. Chief rays that emanate from points of the object field that are spaced apart from another have a mutually diverging beam course, giving a negative back focus of the entrance pupil.
    Type: Grant
    Filed: September 20, 2011
    Date of Patent: June 16, 2015
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Hans-Juergen Mann, Johannes Zellner, Aurelian Dodoc, Claus Zahlten, Christoph Menke, Marco Pretorius, Wilhelm Ulrich, Hans-Juergen Rostalski
  • IMAGING OPTICS AND PROJECTION EXPOSURE INSTALLATION FOR MICROLITHOGRAPHY WITH AN IMAGING OPTICS
    Publication number: 20120069315
    Abstract: Imaging optics includes a first mirror in the imaging beam path after the object field, a last mirror in the imaging beam path before the image field, and a fourth to last mirror in the imaging beam path before the image field. In an unfolded imaging beam path between the object plane and the image plane, an impingement point of the chief ray on a used region of each of the plurality of mirrors has a mirror spacing from the image plane. The mirror spacing of the first mirror is greater than the mirror spacing of the last mirror. The mirror spacing of the fourth to last mirror is greater than the mirror spacing of the first mirror. Chief rays that emanate from points of the object field that are spaced apart from another have a mutually diverging beam course, giving a negative back focus of the entrance pupil.
    Type: Application
    Filed: September 20, 2011
    Publication date: March 22, 2012
    Applicant: CARL ZEISS SMT GMBH
    Inventors: Hans-Juergen Mann, Johannes Zellner, Aurelian Dodoc, Claus Zahlten, Christoph Menke, Marco Pretorius, Wilhelm Ulrich, Hans-Juergen Rostalski