Patents by Inventor Clay C. Titus

Clay C. Titus has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6882674
    Abstract: The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.
    Type: Grant
    Filed: December 21, 2001
    Date of Patent: April 19, 2005
    Assignee: Cymer, Inc.
    Inventors: Christian J. Wittak, William N. Partlo, Richard L. Sandstrom, Paul C. Melcher, David M. Johns, Robert B. Saethre, Richard M. Ness, Curtis L. Rettig, Robert A. Shannon, Richard C. Ujazdowski, Shahryar Rokni, Scott T. Smith, Stuart L. Anderson, John M. Algots, Ronald L. Spangler, Igor V. Fomenkov, Thomas D. Steiger, Jerome A. Emilo, Clay C. Titus, Alex P. Ivaschenko, Paolo Zambon, Gamaralalage G. Padmabandu, Mark S. Branham, Sunjay Phatak, Raymond F. Cybulski
  • Publication number: 20030118072
    Abstract: The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.
    Type: Application
    Filed: December 21, 2001
    Publication date: June 26, 2003
    Inventors: Christian J. Wittak, William N. Partlo, Richard L. Sandstrom, Paul C. Melcher, David M. Johns, Robert B. Saethre, Richard M. Ness, Curtis L. Rettig, Robert A. Shannon, Richard C. Ujazdowski, Shahryar Rokni, Scott T. Smith, Stuart L. Anderson, John M. Algots, Ronald L. Spangler, Igor V. Fomenkov, Thomas D. Steiger, Jerome A. Emilo, Clay C. Titus, Alex P. Ivaschenko, Paolo Zambon, Gamaralalage G. Padmabandu, Mark S. Branham, Sunjay Phatak, Raymond F. Cybulski
  • Patent number: 6496528
    Abstract: A grating based line narrowing device for line narrowing lasers producing high energy laser beams. Techniques are provided for minimizing adverse effects of heat produced by the laser beam inside the line narrowing device. A flexural grating mount is provided which virtually eliminates stress on the grating caused by differential thermal expansion between the grating and the LNP housing structure. In a preferred embodiment the grating which is comprised of a very thin lined aluminum surface on a thick ultra low expansion glass substrate is attached to an aluminum housing structure using a flexural grating mount. At least one flexure joint is provided in the grating mount which permits thermal expansion and contraction of the aluminum housing without producing undesirable mechanical stresses in the glass substrate of the grating. In some embodiments the mount comprises a metal plate and the flexure joint is a H-Flex joint which is machined into the metal plate.
    Type: Grant
    Filed: June 29, 2001
    Date of Patent: December 17, 2002
    Assignee: Cymer, Inc.
    Inventors: Clay C. Titus, William G. Hulburd, Raymond F. Cybulski, John M. Algots, Michael S. Lysik
  • Publication number: 20020034208
    Abstract: A grating based line narrowing device for line narrowing lasers producing high energy laser beams. Techniques are provided for minimizing adverse effects of heat produced by the laser beam inside the line narrowing device.
    Type: Application
    Filed: June 29, 2001
    Publication date: March 21, 2002
    Inventors: Clay C. Titus, William G. Hulburd, Raymond F. Cybulski, John M. Algots, Michael S. Lysik