Patents by Inventor Clemente Bottini
Clemente Bottini has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 8736275Abstract: A system and method is provided for correcting alignment of a product on a tool and, more particularly, to a system and method for correcting alignment of a wafer on a chuck of a tool. The system is a tool including at least one contact near a circumference of the tool and a grounded contact proximate to the at least one contact.Type: GrantFiled: April 24, 2013Date of Patent: May 27, 2014Assignee: International Business Machines CorporationInventors: Robert J. Foster, Lin Zhou, Shahin Zangooie, Roger M. Young, Clemente Bottini
-
Patent number: 8680871Abstract: A system and method is provided for correcting alignment of a product on a tool and, more particularly, to a system and method for correcting alignment of a wafer on a chuck of a tool. The system is a tool including at least one contact near a circumference of the tool and a grounded contact proximate to the at least one contact.Type: GrantFiled: April 24, 2013Date of Patent: March 25, 2014Assignee: International Business Machines CorporationInventors: Robert J. Foster, Lin Zhou, Shahin Zangooie, Roger M. Young, Clemente Bottini
-
Publication number: 20130238112Abstract: A system and method is provided for correcting alignment of a product on a tool and, more particularly, to a system and method for correcting alignment of a wafer on a chuck of a tool. The system is a tool including at least one contact near a circumference of the tool and a grounded contact proximate to the at least one contact.Type: ApplicationFiled: April 24, 2013Publication date: September 12, 2013Applicant: International Business Machines CorporationInventors: Robert J. FOSTER, Lin ZHOU, Shahin ZANGOOIE, Roger M. YOUNG, Clemente BOTTINI
-
Patent number: 8451008Abstract: A system and method is provided for correcting alignment of a product on a tool and, more particularly, to a system and method for correcting alignment of a wafer on a chuck of a tool. The system is a tool that includes at least one contact near a circumference of the tool and a grounded contact proximate to the at least one contact.Type: GrantFiled: July 8, 2009Date of Patent: May 28, 2013Assignee: International Business Machines CorporationInventors: Robert J. Foster, Lin Zhou, Shahin Zangodie, Roger M. Young, Clemente Bottini
-
Patent number: 8411270Abstract: Methods, apparatuses and systems for monitoring a stage alignment in a processing system are disclosed. A method for monitoring a stage alignment in a processing system may include providing a calibration target on a surface of the stage; measuring an angle of incident of a light beam to the calibration target; and monitoring the stage alignment based on the determined angle of incidence.Type: GrantFiled: January 17, 2008Date of Patent: April 2, 2013Assignee: International Business Machines CorporationInventors: Shahin Zangooie, Lin Zhou, Roger M. Young, Clemente Bottini, Ronald D. Fiege
-
Patent number: 7742160Abstract: A method, system and computer program product for determining an angle of incidence of a light beam illuminating a workpiece positioned on a stage are disclosed. A method for determining an angle of incidence of a light beam illuminating a workpiece positioned on a stage may include: positioning a calibration target on the stage with multiple different tilts; first determining an angle of incident of the light beam with respect to the calibration target with each tilt using a detector; mapping a response of the detector to a determined angle of incidence; and second determining the angle of incidence with respect to the workpiece based on a result of the mapping.Type: GrantFiled: January 15, 2008Date of Patent: June 22, 2010Assignee: International Business Machines CorporationInventors: Clemente Bottini, Ronald D. Fiege, Roger M. Young, Shahin Zangooie, Lin Zhou
-
Patent number: 7646491Abstract: A method, system and computer program product for determining an Azimuth angle of an incident beam to a wafer are disclosed. A method comprises: using the incident beam to make a first set of measurements of calibration targets of a first set of grating angles that are different than one another; analyzing the first set of measurements to determine an reference grating angle which corresponds to a grating line to which the incident beam has a practically zero Azimuth angle; and determining the Azimuth angle of the incident beam to the wafer using the determined reference grating angle.Type: GrantFiled: June 22, 2007Date of Patent: January 12, 2010Assignee: International Business Machines CorporationInventors: Shahin Zangooie, Roger M. Young, Lin Zhou, Clemente Bottini, Ronald D. Fiege
-
Publication number: 20090312982Abstract: A system and method is provided for correcting alignment of a product on a tool and, more particularly, to a system and method for correcting alignment of a wafer on a chuck of a tool. The system is a tool comprising at least one contact near a circumference of the tool and a grounded contact proximate to the at least one contact. The method comprises measuring current on each branch of a circuit and calculating an angle of a wafer based on a difference in the current on each branch of the circuit.Type: ApplicationFiled: July 8, 2009Publication date: December 17, 2009Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Robert J. Foster, Lin Zhou, Shahin Zangodie, Roger M. Young, Clemente Bottini
-
Patent number: 7592817Abstract: A system and method for correcting alignment of a product on a tool and, more particularly, to a system and method for correcting alignment of a wafer on a chuck of a tool. The system is a tool comprising at least one contact near a circumference of the tool and a grounded contact proximate to the at least one contact. The method comprises measuring current on each branch of a circuit and calculating an angle of a wafer based on a difference in the current on each branch of the circuit.Type: GrantFiled: July 17, 2007Date of Patent: September 22, 2009Assignee: International Business Machines CorporationInventors: Robert J. Foster, Lin Zhou, Shahin Zangooie, Roger M. Young, Clemente Bottini
-
Publication number: 20090185183Abstract: Methods, apparatuses and systems for monitoring a stage alignment in a processing system are disclosed. A method for monitoring a stage alignment in a processing system may include providing a calibration target on a surface of the stage; measuring an angle of incident of a light beam to the calibration target; and monitoring the stage alignment based on the determined angle of incidence.Type: ApplicationFiled: January 17, 2008Publication date: July 23, 2009Applicant: International Business Machines CorporationInventors: Shahin Zangooie, Lin Zhou, Roger M. Young, Clemente Bottini, Ronald D. Fiege
-
Publication number: 20090180108Abstract: A method, system and computer program product for determining an angle of incidence of a light beam illuminating a workpiece positioned on a stage are disclosed. A method for determining an angle of incidence of a light beam illuminating a workpiece positioned on a stage may include: positioning a calibration target on the stage with multiple different tilts; first determining an angle of incident of the light beam with respect to the calibration target with each tilt using a detector; mapping a response of the detector to a determined angle of incidence; and second determining the angle of incidence with respect to the workpiece based on a result of the mapping.Type: ApplicationFiled: January 15, 2008Publication date: July 16, 2009Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Clemente Bottini, Ronald D. Fiege, Roger M. Young, Shahin Zangooie, Lin Zhou
-
Patent number: 7542136Abstract: A sample stage for performing measurements using an optical metrology system includes at least one sample section for retention of a sample, and components for controlling orientation of the sample section with relation to the optical metrology system. A method and a computer program product are provided.Type: GrantFiled: July 3, 2007Date of Patent: June 2, 2009Assignee: International Business Machines CorporationInventors: Shahin Zangooie, Lin Zhou, Roger M. Young, Clemente Bottini, Robert J. Foster, Ronald D. Fiege
-
Publication number: 20090027660Abstract: A method, system and computer program product for determining a geometric parameter of an optical spot of a light beam are disclosed. A method comprises: providing a calibration target, the calibration target including a systematic variation in a parameter; measuring the calibration target with respect to the systematic variation using the light beam to obtain a plurality of measurements; and analyzing the measurements and the systematic variation to determine the geometric parameter of the optical spot.Type: ApplicationFiled: July 16, 2008Publication date: January 29, 2009Inventors: Shahin Zangooie, Roger M. Young, Lin Zhou, Clemente Bottini, Ronald D. Fiege
-
Publication number: 20090021236Abstract: A system and method for correcting alignment of a product on a tool and, more particularly, to a system and method for correcting alignment of a wafer on a chuck of a tool. The system is a tool comprising at least one contact near a circumference of the tool and a grounded contact proximate to the at least one contact. The method comprises measuring current on each branch of a circuit and calculating an angle of a wafer based on a difference in the current on each branch of the circuit.Type: ApplicationFiled: July 17, 2007Publication date: January 22, 2009Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Robert J. Foster, Lin Zhou, Shahin Zangooie, Roger M. Young, Clemente Bottini
-
Patent number: 7477365Abstract: A method, system and computer program product for determining a geometric parameter of an optical spot of a light beam are disclosed. A method comprises: providing a calibration target, the calibration target including a systematic variation in a parameter; measuring the calibration target with respect to the systematic variation using the light beam to obtain a plurality of measurements; and analyzing the measurements and the systematic variation to determine the geometric parameter of the optical spot.Type: GrantFiled: July 26, 2007Date of Patent: January 13, 2009Assignee: International Business Machines CorporationInventors: Shahin Zangooie, Roger M. Young, Lin Zhou, Clemente Bottini, Ronald D. Fiege
-
Publication number: 20090009763Abstract: A sample stage for performing measurements using an optical metrology system includes at least one sample section for retention of a sample, and components for controlling orientation of the sample section with relation to the optical metrology system. A method and a computer program product are provided.Type: ApplicationFiled: July 3, 2007Publication date: January 8, 2009Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Shahin Zangooie, Lin Zhou, Roger M. Young, Clemente Bottini, Robert J. Foster, Ronald D. Fiege
-
Publication number: 20080316471Abstract: A method, system and computer program product for determining an Azimuth angle of an incident beam to a wafer are disclosed. A method comprises: using the incident beam to make a first set of measurements of calibration targets of a first set of grating angles that are different than one another; analyzing the first set of measurements to determine an reference grating angle which corresponds to a grating line to which the incident beam has a practically zero Azimuth angle; and determining the Azimuth angle of the incident beam to the wafer using the determined reference grating angle.Type: ApplicationFiled: June 22, 2007Publication date: December 25, 2008Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Shahin Zangooie, Roger M. Young, Lin Zhou, Clemente Bottini, Ronald D. Fiege
-
Publication number: 20080024781Abstract: A method, system and computer program product for determining a geometric parameter of an optical spot of a light beam are disclosed. A method comprises: providing a calibration target, the calibration target including a systematic variation in a parameter; measuring the calibration target with respect to the systematic variation using the light beam to obtain a plurality of measurements; and analyzing the measurements and the systematic variation to determine the geometric parameter of the optical spot.Type: ApplicationFiled: July 26, 2007Publication date: January 31, 2008Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Shahin Zangooie, Roger M. Young, Lin Zhou, Clemente Bottini, Ronald D. Fiege