Patents by Inventor Cliff Bugge
Cliff Bugge has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230215683Abstract: Methods and systems for performing sample lift-out and protective cap placement for highly reactive materials within charged particle microscopy systems are disclosed herein. Methods include preparing a nesting void in a support structure, translating at least a portion of a sample into the nesting void, and milling material from a region of the support structure that defines the nesting void. The material from the region of the support structure is milled such that at least some of the removed material redeposits to form an attachment bond between the sample and a remaining portion of the support structure. In various embodiments, the sample can then be investigated using one or more of serial sectioning tomography on the sample, enhanced insertable backscatter detector (CBS) analysis on the sample, and electron backscatter diffraction (EBSD) analysis on the sample.Type: ApplicationFiled: December 31, 2021Publication date: July 6, 2023Applicant: FEI CompanyInventors: Adam STOKES, Cliff BUGGE, Brandon VAN LEER, Valerie BROGDEN, Chengge JIAO, Letian LI, David DONNET
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Patent number: 11069509Abstract: The backside of a planar view lamella is prepared from a sample extracted from a workpiece. The sample includes multiple device layers and a substrate layer. After removing at least a part of the substrate layer covering a final device layer to obtain a sample surface, a region of interest (ROI) relative to the sample surface is alternately scanned with an electron beam and spontaneously etched until the final device layer within the ROI is exposed. One or more device layers may be removed from the sample backside after the final device layer is exposed to obtain the backside of the planar view lamella.Type: GrantFiled: March 16, 2020Date of Patent: July 20, 2021Assignee: FEI CompanyInventors: James Clarke, Brian Routh, Jr., Micah LeDoux, Cliff Bugge
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Publication number: 20180247793Abstract: Embodiments are directed to a method and charged particle beam system for forming views for an electron microscope. Embodiments include milling a first surface at least in the local area of a feature of interest using an ion beam directed at a first angle to make the first surface at least in the local area of the feature of interest substantially planar, wherein the first angle between the ion beam and the first surface is equal to or less than ten degrees; subsequent to milling the first surface, milling the sample using the ion beam directed at a second angle to expose a second surface, the second surface comprising a cross-section of the feature of interest; and forming an image of the second surface by directing an electron beam to the second surface and detecting the interaction of the electron beam with the second surface.Type: ApplicationFiled: February 23, 2018Publication date: August 30, 2018Applicant: FEI CompanyInventors: Michael Schmidt, Cliff Bugge
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Patent number: 9941096Abstract: A method and system for forming a planar cross-section view for an electron microscope. The method comprises directing an ion beam from an ion source toward a first surface of a sample to mill at least a portion of the sample; milling the first surface, using the ion beam, to expose a second surface in which the end of the second surface distal to the ion source is milled to a greater depth relative to a reference depth than the end of the first surface proximal to the ion source; directing an electron beam from an electron source to the second surface; and forming an image of the second surface by detecting the interaction of the electron beam with the second surface. Embodiments also include planarzing the first surface of the sample prior to forming a cross-section.Type: GrantFiled: September 11, 2012Date of Patent: April 10, 2018Assignee: FEI CompanyInventors: Michael Schmidt, Cliff Bugge
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Patent number: 9378925Abstract: An improved method of preparing ultra-thin TEM samples that combines backside thinning with an additional cleaning step to remove surface defects on the FIB-facing substrate surface. This additional step results in the creation of a cleaned, uniform “hardmask” that controls the ultimate results of the sample thinning, and allows for reliable and robust preparation of samples having thicknesses down to the 10 nm range.Type: GrantFiled: September 29, 2015Date of Patent: June 28, 2016Assignee: FEI CompanyInventors: Jeffrey Blackwood, Matthew Bray, Corey Senowitz, Cliff Bugge
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Publication number: 20160020069Abstract: An improved method of preparing ultra-thin TEM samples that combines backside thinning with an additional cleaning step to remove surface defects on the FIB-facing substrate surface. This additional step results in the creation of a cleaned, uniform “hardmask” that controls the ultimate results of the sample thinning, and allows for reliable and robust preparation of samples having thicknesses down to the 10 nm range.Type: ApplicationFiled: September 29, 2015Publication date: January 21, 2016Applicant: FEI CompanyInventors: Jeffrey Blackwood, Matthew Bray, Corey Senowitz, Cliff Bugge
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Patent number: 9177760Abstract: An improved method of preparing ultra-thin TEM samples that combines backside thinning with an additional cleaning step to remove surface defects on the FIB-facing substrate surface. This additional step results in the creation of a cleaned, uniform “hardmask” that controls the ultimate results of the sample thinning, and allows for reliable and robust preparation of samples having thicknesses down to the 10 nm range.Type: GrantFiled: September 30, 2014Date of Patent: November 3, 2015Assignee: FEI CompanyInventors: Jeffrey Blackwood, Matthew Bray, Corey Senowitz, Cliff Bugge
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Patent number: 9041793Abstract: A method of using a scanning microscope to rapidly form a digital image of an area. The method includes performing an initial set of scans to form a guide pixel set for the area and using the guide pixel set to identify regions representing structures of interest in the area. Then, performing additional scans of the regions representing structures of interest, to gather further data to further evaluate pixels in the regions, and not scanning elsewhere in the area.Type: GrantFiled: May 17, 2012Date of Patent: May 26, 2015Assignee: FEI COMPANYInventors: Cliff Bugge, Brandon van Leer
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Publication number: 20150053548Abstract: An improved method of preparing ultra-thin TEM samples that combines backside thinning with an additional cleaning step to remove surface defects on the FIB-facing substrate surface. This additional step results in the creation of a cleaned, uniform “hardmask” that controls the ultimate results of the sample thinning, and allows for reliable and robust preparation of samples having thicknesses down to the 10 nm range.Type: ApplicationFiled: September 30, 2014Publication date: February 26, 2015Applicant: FEI CompanyInventors: Jeffrey Blackwood, Matthew Bray, Corey Senowitz, Cliff Bugge
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Patent number: 8859998Abstract: An improved method of preparing ultra-thin TEM samples that combines backside thinning with an additional cleaning step to remove surface defects on the FIB-facing substrate surface. This additional step results in the creation of a cleaned, uniform “hardmask” that controls the ultimate results of the sample thinning, and allows for reliable and robust preparation of samples having thicknesses down to the 10 nm range.Type: GrantFiled: January 28, 2012Date of Patent: October 14, 2014Assignee: FEI CompanyInventors: Jeffrey Blackwood, Matthew Bray, Corey Senowitz, Cliff Bugge
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Patent number: 8822957Abstract: A method and system for forming and using a fiducial on a sample to locate an area of interest on the sample, the method comprising forming a fiducial by depositing a block of material on a sample proximal to an area of interest on the sample, the block of material extending from the surface of the sample to a detectable extent above the surface of the sample; and milling, using a charged particle beam, a predetermined pattern into at least two exposed faces of the block of material; subsequent to forming the fiducial, detecting the location of the area of interest by detecting the location of the fiducial; and subsequent to detecting the location of the area of interest, imaging or milling the area of interest with a charged particle beam.Type: GrantFiled: July 23, 2013Date of Patent: September 2, 2014Assignee: FEI CompanyInventors: Cliff Bugge, Greg Clark, Todd Hanson, Scott Edward Fuller, Jason Donald
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Publication number: 20140217283Abstract: An improved method of preparing ultra-thin TEM samples that combines backside thinning with an additional cleaning step to remove surface defects on the FIB-facing substrate surface. This additional step results in the creation of a cleaned, uniform “hardmask” that controls the ultimate results of the sample thinning, and allows for reliable and robust preparation of samples having thicknesses down to the 10 nm range.Type: ApplicationFiled: January 28, 2012Publication date: August 7, 2014Applicant: FEI COMPANYInventors: Jeffrey Blackwood, Matthew Bray, Corey Senowitz, Cliff Bugge
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Publication number: 20130344292Abstract: A method and system for forming and using a fiducial on a sample to locate an area of interest on the sample, the method comprising forming a fiducial by depositing a block of material on a sample proximal to an area of interest on the sample, the block of material extending from the surface of the sample to a detectable extent above the surface of the sample; and milling, using a charged particle beam, a predetermined pattern into at least two exposed faces of the block of material; subsequent to forming the fiducial, detecting the location of the area of interest by detecting the location of the fiducial; and subsequent to detecting the location of the area of interest, imaging or milling the area of interest with a charged particle beam.Type: ApplicationFiled: July 23, 2013Publication date: December 26, 2013Applicant: FEI CompanyInventors: Cliff Bugge, Greg Clark, Todd Hanson, Scott Edward Fuller, Jason Donald
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Publication number: 20130307957Abstract: A method of using a scanning microscope to rapidly form a digital image of an area. The method includes performing an initial set of scans to form a guide pixel set for the area and using the guide pixel set to identify regions representing structures of interest in the area. Then, performing additional scans of the regions representing structures of interest, to gather further data to further evaluate pixels in the regions, and not scanning elsewhere in the area.Type: ApplicationFiled: May 17, 2012Publication date: November 21, 2013Applicant: FEI CompanyInventors: Cliff Bugge, Brandon van Leer
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Patent number: 8502172Abstract: A method and system for forming and using a fiducial on a sample to locate an area of interest on the sample, the method comprising forming a fiducial by depositing a block of material on a sample proximal to an area of interest on the sample, the block of material extending from the surface of the sample to a detectable extent above the surface of the sample; and milling, using a charged particle beam, a predetermined pattern into at least two exposed faces of the block of material; subsequent to forming the fiducial, detecting the location of the area of interest by detecting the location of the fiducial; and subsequent to detecting the location of the area of interest, imaging or milling the area of interest with a charged particle beam.Type: GrantFiled: June 26, 2012Date of Patent: August 6, 2013Assignee: FEI CompanyInventors: Cliff Bugge, Greg Clark, Todd Hanson, Scott Edward Fuller, Jason Donald
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Publication number: 20130186747Abstract: A method and system for forming a planar cross-section view for an electron microscope. The method comprises directing an ion beam from an ion source toward a first surface of a sample to mill at least a portion of the sample; milling the first surface, using the ion beam, to expose a second surface in which the end of the second surface distal to the ion source is milled to a greater depth relative to a reference depth than the end of the first surface proximal to the ion source; directing an electron beam from an electron source to the second surface; and forming an image of the second surface by detecting the interaction of the electron beam with the second surface. Embodiments also include planarzing the first surface of the sample prior to forming a cross-section.Type: ApplicationFiled: September 11, 2012Publication date: July 25, 2013Applicant: FEI CompanyInventors: Michael Schmidt, Cliff Bugge
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Publication number: 20040140291Abstract: A method of deprocessing damascene type integrated circuits which include copper (Cu) and tantalum nitride (TaN) layers is provided. An etch is used which includes an acetic salt in a solution with an hydroxide. The acetic salt etches the copper layer.Type: ApplicationFiled: January 20, 2003Publication date: July 22, 2004Inventors: Eric D. Swanson, Cliff Bugge