Abstract: A casing running rotary insert can include a base having a first aperture that traverses therethrough. The casing running rotary insert can also include a rotary table engagement feature that extends from a bottom surface of the base, where the rotary table engagement feature is configured to engage a complementary feature of a rotary table to fix a position of the base relative to the rotary table, and where the aperture in the base is configured to align with a second aperture in the rotary table when the rotary table engagement feature is engaged with the complementary feature of the rotary table. The casing running rotary insert can further include a casing bowl engagement feature that extends from a top surface of the base, where the casing bowl engagement feature is configured to engage a casing bowl to fix a position of the casing bowl relative to the base.

Abstract: An RF antenna is configured, when powered, to inductively generate plasma in a process region of a chamber, including: an array of parallel conductive lines that are oriented along a plane, the array including a first conductive line, a second conductive line, a third conductive line, and a fourth conductive line; wherein the first and second conductive lines are adjacent, wherein the second and third conductive lines are adjacent, and wherein the third and fourth conductive lines are adjacent; wherein when the RF antenna is powered, current flow in the adjacent first and second conductive lines occurs in an opposite direction, current flow in the adjacent second and third conductive lines occurs in a same direction, current flow in the adjacent third and fourth conductive lines occurs in an opposite direction.

Abstract: A dual-plenum fractal (DPF) showerhead for distributing different semiconductor processing gases across a semiconductor wafer during processing operations is provided. The DPF showerhead may have a plurality of layers, each featuring a pattern of gas distribution features, with the gas distribution features on each layer generally being similar in shape to the gas distribution features on the layer immediately upstream therefrom but smaller in size. Such a “fractal”-like structure to the gas flow passages provides very uniform processing gas delivery across the surface of a semiconductor wafer during processing operations, thereby enhancing wafer uniformity.

Abstract: Dry backside and bevel edge clean is performed without exposure to plasma to remove unwanted photoresist material from a substrate. The substrate is supported on a substrate support and elevated by minimum contact area (MCA) supports so that etch gas can access a backside of the substrate. A gas distributor delivers curtain gas to a frontside of the substrate to protect photoresist material on the frontside. An etch gas delivery source delivers a first etch gas flow to the backside, and one or more peripheral gas inlets deliver a second etch gas flow to a periphery of the frontside and around the bevel edge. A radiative heat source is positioned below the substrate to heat the substrate.

Abstract: Systems and techniques for dry deposition of extreme ultra-violet-sensitive (EUV-sensitive) photoresist layers are discussed. In some such systems, a processing chamber may be provided that features a multi-plenum showerhead that is configured to receive a vaporized organometallic precursor in one plenum and a vaporized counter-reactant thereof in another plenum. The two vaporized reactants may be delivered to a reaction space within the processing chamber and over a wafer support that supports the substrate.

Abstract: An RF antenna is configured, when powered, to inductively generate plasma in a process region of a chamber, including: an array of parallel conductive lines that are oriented along a plane, the array including a first conductive line, a second conductive line, a third conductive line, and a fourth conductive line; wherein the first and second conductive lines are adjacent, wherein the second and third conductive lines are adjacent, and wherein the third and fourth conductive lines are adjacent; wherein when the RF antenna is powered, current flow in the adjacent first and second conductive lines occurs in an opposite direction, current flow in the adjacent second and third conductive lines occurs in a same direction, current flow in the adjacent third and fourth conductive lines occurs in an opposite direction.

Abstract: A method and apparatus for operating a plunger lift system in a well can include: opening a control valve and allowing a plunger to rise to a top of the well; determining an actual rise time of the plunger based on a time it takes the plunger to rise to the top of the well; using actual rise time of the plunger and a target rise time calculating adjustments to the afterflow time or close time; and allowing the afterflow time to pass before closing the control valve and keeping the valve closed for the close time. The methods are repeated, each time calculating a new adjusted afterflow time or adjusted close time to incrementally alter these times.

Abstract: An apparatus includes a discovery component to identify a first application routine within a storage for execution, to identify execution of a remote application routine within a node device as a first requisite for execution of the first application routine from a first application requisites data, and to provide indications of storage of the first application routine and the first requisite to a control master; a start component to restart an earlier started execution of the first application routine in response to receipt of an indication that execution of the remote application routine within the node device has been restarted in accordance with a catalog received from the control master, the catalog including indications of the first and remote application routines and an indication of the first requisite; and a status component to provide an indication to the control master of the restart of execution of the first application routine.

Abstract: A method and apparatus for operating a plunger lift system in a well is provided. The methods can include: opening a control valve and allowing a plunger to rise to a top of the well; determining an actual rise time of the plunger based on a time it takes the plunger to rise to the top of the well; using actual rise time of the plunger and a target rise time calculating adjustments to the afterflow time or close time; and allowing the afterflow time to pass before closing the control valve and keeping the valve closed for the close time. The methods are repeated, each time calculating a new adjusted afterflow time or adjusted close time to incrementally alter these times to improve the operation of the plunger lift system.

Abstract: An apparatus includes a discovery component to identify a first application routine within a storage for execution, to identify execution of a remote application routine within a node device as a first requisite for execution of the first application routine from a first application requisites data, and to provide indications of storage of the first application routine and the first requisite to a control master; a start component to start of execution of the first application routine in response to receipt of an indication that execution of the remote application routine within the node device has started in accordance with a catalog received from the control master, the catalog including indications of the first and remote application routines and an indication of the first requisite; and a status component to provide an indication to the control master of the start of execution of the first application routine.

Abstract: A method and apparatus for operating a plunger lift system in a well can include: opening a control valve and allowing a plunger to rise to a top of the well; determining an actual rise time of the plunger based on a time it take the plunger to rise to the top of the well; using actual rise time of the plunger and a target rise time calculating adjustments to the afterflow time or close time; and allowing the afterflow time to pass before closing the control valve and keeping the valve closed for the close time. The methods are repeated, each time calculating a new adjusted afterflow time or adjusted close time to incrementally alter these times.

Abstract: An apparatus includes a discovery component to identify a first application routine within a storage for execution, to identify execution of a remote application routine within a node device as a first requisite for execution of the first application routine from a first application requisites data, and to provide indications of storage of the first application routine and the first requisite to a control master; a start component to start of execution of the first application routine in response to receipt of an indication that execution of the remote application routine within the node device has started in accordance with a catalog received from the control master, the catalog including indications of the first and remote application routines and an indication of the first requisite; and a status component to provide an indication to the control master of the start of execution of the first application routine.

Abstract: An apparatus includes a discovery component to identify a first application routine within a storage for execution, to identify execution of a remote application routine within a node device as a first requisite for execution of the first application routine from a first application requisites data, and to provide indications of storage of the first application routine and the first requisite to a control master; a start component to restart an earlier started execution of the first application routine in response to receipt of an indication that execution of the remote application routine within the node device has been restarted in accordance with a catalog received from the control master, the catalog including indications of the first and remote application routines and an indication of the first requisite; and a status component to provide an indication to the control master of the restart of execution of the first application routine.

Abstract: A method and apparatus for operating a plunger lift system in a well is provided. The methods can include: opening a control valve and allowing a plunger to rise to a top of the well; determining an actual rise time of the plunger based on a time it takes the plunger to rise to the top of the well; using actual rise time of the plunger and a target rise time calculating adjustments to the afterflow time or close time; and allowing the afterflow time to pass before closing the control valve and keeping the valve closed for the close time. The methods are repeated, each time calculating a new adjusted afterflow time or adjusted close time to incrementally alter these times to improve the operation of the plunger lift system.

Abstract: A motor assembly comprises a plurality of redundant bearings, a plurality of coaxial support elements, with at least one of the support elements rotatable about an axis of rotation, and an armature rotatably guided by the plurality of support elements to rotate about the axis of rotation. The bearings provide redundancy to continue armature rotation in the event one bearing fails.