Patents by Inventor Clinton G. Graves

Clinton G. Graves has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods and apparatus for the treatment of hazardous biological waste material
    Publication number: 20010024887
    Abstract: The invention provides methods and apparatus for treating hazardous biological wastes. According to one exemplary method, a biological waste material is placed into a chamber and a vacuum is applied to the chamber. After the pressure within the chamber is sufficiently reduced, water vapor is introduced into the chamber and electromagnetic radiation energy is applied to produce a plasma. In one particularly preferable aspect, the chamber is allowed to reach a static condition before the water vapor is introduced. In this way, the water vapor is able to equally distribute itself throughout the volume of the chamber so that an equally distributed plasma can be produced upon application of the electromagnetic radiation energy.
    Type: Application
    Filed: December 6, 2000
    Publication date: September 27, 2001
    Inventors: Clinton G. Graves, Clinton G. Graves II
  • Methods and apparatus for the treatment of hazardous biological waste materials
    Patent number: 6159422
    Abstract: The invention provides methods and apparatus for treating hazardous biological wastes. According to one exemplary method, a biological waste material is placed into a chamber and a vacuum is applied to the chamber. After the pressure within the chamber is sufficiently reduced, water vapor is introduced into the chamber and electromagnetic radiation energy is applied to produce a plasma. In one particularly preferable aspect, the chamber is allowed to reach a static condition before the water vapor is introduced. In this way, the water vapor is able to equally distribute itself throughout the volume of the chamber so that an equally distributed plasma can be produced upon application of the electromagnetic radiation energy.
    Type: Grant
    Filed: November 20, 1998
    Date of Patent: December 12, 2000
    Assignee: Graves' Trust Group
    Inventors: Clinton G. Graves, Clinton G. Graves, II
  • Method for the treatment of substrates
    Patent number: 5920799
    Abstract: The invention provides methods and apparatus for treating substrates and hazardous biological wastes. According to one exemplary method, at least one substrate is placed into a chamber and a vacuum is applied to the chamber. After the pressure within the chamber is sufficiently reduced, water vapor is introduced into the chamber and electromagnetic radiation energy is applied to produce a plasma. In one particularly preferable aspect, the chamber is allowed to reach a static condition before the water vapor is introduced. In this way, the water vapor is able to equally distribute itself throughout the volume of the chamber so that an equally distributed plasma can be produced upon application of the electromagnetic radiation energy.
    Type: Grant
    Filed: December 18, 1996
    Date of Patent: July 6, 1999
    Assignee: Graves'Trust Group
    Inventors: Clinton G. Graves, Clinton G. Graves, II
  • Device and methods for plasma sterilization
    Patent number: 5633424
    Abstract: The invention provides methods and apparatus for sterilizing articles. According to one exemplary method, at least one article is placed into a chamber and a vacuum is applied to the chamber. After the pressure within the chamber is sufficiently reduced, water vapor is introduced into the chamber and electromagnetic radiation energy is applied to produce a plasma. In one particularly preferable aspect, the chamber is allowed to reach a static condition before the water vapor is introduced. In this way, the water vapor is able to equally distribute itself throughout the volume of the chamber so that an equally distributed plasma can be produced upon application of the electromagnetic radiation energy.
    Type: Grant
    Filed: December 29, 1994
    Date of Patent: May 27, 1997
    Inventors: Clinton G. Graves, Clinton G. Graves, II
  • Method of etching silicon and polysilicon substrates
    Patent number: 4364793
    Abstract: A method for etching silicon or polysilicon substrates wherein the substrates are exposed to a plasma formed by a conventional etchant enhanced by a metal halide.
    Type: Grant
    Filed: August 28, 1981
    Date of Patent: December 21, 1982
    Inventor: Clinton G. Graves