Abstract: Methods of fabricating nano-structures on a substrate surface are provided including the use of small initial pilot nano-structures patterned in a writing layer which are enlarged upon transfer to a pattern transfer layer among process layers applied to the substrate material, before removal of the writing layer to reveal the enlarged nano-structures. Enlarged nano-structures are transferred to the substrate by etch techniques to produce desired final enlarged nano-structures in the substrate surface. Raised out of plane and etched-in-plane nano-structures may be produced. Multiple geometries, configurations and spacings of 2D (such as in-plane nano-structures) and/or 3D (such as out of plane nano-structures) nano-structures and/or grids or arrays thereof may be fabricated on a surface of a substrate according to a single fabrication process.