Abstract: An integrated circuit device that includes a plurality of multiple gate FinFETs (MuGFETs) is disclosed. Fins of different crystal orientations for PMOS and NMOS MuGFETs are formed through amorphization and crystal regrowth on a direct silicon bonded (DSB) hybrid orientation technology (HOT) substrate. PMOS MuGFET fins are formed with channels defined by fin sidewall surfaces having (110) crystal orientations. NMOS MuGFET fins are formed with channels defined by fin sidewall surfaces having (100) crystal orienations in a Manhattan layout with the sidewall channels of the different PMOS and NMOS MuGFETs aligned at 0° or 90° rotations.

Abstract: An integrated circuit device that includes a plurality of multiple gate FinFETs (MuGFETs) is disclosed. Fins of different crystal orientations for PMOS and NMOS MuGFETs are formed through amorphization and crystal regrowth on a direct silicon bonded (DSB) hybrid orientation technology (HOT) substrate. PMOS MuGFET fins are formed with channels defined by fin sidewall surfaces having (110) crystal orientations. NMOS MuGFET fins are formed with channels defined by fin sidewall surfaces having (100) crystal orienations in a Manhattan layout with the sidewall channels of the different PMOS and NMOS MuGFETs aligned at 0° or 90° rotations.

Abstract: An integrated circuit device that includes a plurality of multiple gate FinFETs (MuGFETs) is disclosed. Fins of different crystal orientations for PMOS and NMOS MuGFETs are formed through amorphization and crystal regrowth on a direct silicon bonded (DSB) hybrid orientation technology (HOT) substrate. PMOS MuGFET fins are formed with channels defined by fin sidewall surfaces having (110) crystal orientations. NMOS MuGFET fins are formed with channels defined by fin sidewall surfaces having (100) crystal orientations in a Manhattan layout with the sidewall channels of the different PMOS and NMOS MuGFETs aligned at 0° or 90° rotations.

Abstract: One embodiment of the present invention relates to a memory cell. The memory cell includes a multi-gate field effect transistor associated with a first region of a semiconductor fin. The memory cell also includes a fin capacitor coupled to a drain of the multi-gate field effect transistor and associated with a second region of the semiconductor fin, where the fin capacitor has an approximately degenerate doping concentration in the second region. Other devices and methods are also disclosed.

Abstract: An integrated circuit (IC), a method of testing an IC and a method of reading test results from an IC containing built-in self-test (BIST) circuitry. In one embodiment, the IC includes: (1) an external test bus interface, (2) read-write memory coupled to the external test bus interface, (3) other circuitry and (4) BIST circuitry, coupled to the external test bus interface, the read-write memory and the other circuitry and configured to test the read-write memory to identify a good data block therein, store in a predetermined data block in the read-write memory multiple instances of a pointer to the good data block, conduct a test of at least the other circuitry and store at least some results of the test in the good data block.

Abstract: An integrated circuit (IC), a method of testing an IC and a method of reading test results from an IC containing built-in self-test (BIST) circuitry. In one embodiment, the IC includes: (1) an external test bus interface, (2) read-write memory coupled to the external test bus interface, (3) other circuitry and (4) BIST circuitry, coupled to the external test bus interface, the read-write memory and the other circuitry and configured to test the read-write memory to identify a good data block therein, store in a predetermined data block in the read-write memory multiple instances of a pointer to the good data block, conduct a test of at least the other circuitry and store at least some results of the test in the good data block.

Abstract: An integrated circuit (IC), a method of testing an IC and a method of reading test results from an IC containing built-in self-test (BIST) circuitry. In one embodiment, the IC includes: (1) an external test bus interface, (2) read-write memory coupled to the external test bus interface, (3) other circuitry and (4) BIST circuitry, coupled to the external test bus interface, the read-write memory and the other circuitry and configured to test the read-write memory to identify a good data block therein, store in a predetermined data block in the read-write memory multiple instances of a pointer to the good data block, conduct a test of at least the other circuitry and store at least some results of the test in the good data block.

Abstract: An integrated circuit (IC), a method of testing an IC and a method of reading test results from an IC containing built-in self-test (BIST) circuitry. In one embodiment, the IC includes: (1) an external test bus interface, (2) read-write memory coupled to the external test bus interface, (3) other circuitry and (4) BIST circuitry, coupled to the external test bus interface, the read-write memory and the other circuitry and configured to test the read-write memory to identify a good data block therein, store in a predetermined data block in the read-write memory multiple instances of a pointer to the good data block, conduct a test of at least the other circuitry and store at least some results of the test in the good data block.

Abstract: Method of forming an antireflective coating on a face of a semiconductor which includes forming a metal oxide layer on the face, heating the oxide layer to a temperature sufficiently high to cause the migration of free metal atoms over the surface of the metal oxide and then sputtering a thin layer of aluminum or aluminum alloy on the oxide layer of a thickness such that bumps are formed which reduce the specularity of the surface. The aluminum atoms form bumps which reduce the specularity of the surface.