Patents by Inventor Coen Hubertus Matheus BALTIS

Coen Hubertus Matheus BALTIS has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate table, lithographic apparatus and method of operating a lithographic apparatus
    Patent number: 10317804
    Abstract: A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface, wherein at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.
    Type: Grant
    Filed: November 2, 2016
    Date of Patent: June 11, 2019
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Daan Daniel Johannes Antonius Van Sommeren, Coen Hubertus Matheus Baltis, Harold Sebastiaan Buddenberg, Giovanni Luca Gattobigio, Johannes Cornelis Paulus Melman, Günes Nakiboglu, Theodorus Wilhelmus Polet, Walter Theodorus Matheus Stals, Yuri Johannes Gabriël Van De Vijver, Josephus Peter Van Lieshout, Jorge Alberto Vieyra Salas, Aleksandar Nikolov Zdravkov
  • EXTRACTION BODY FOR LITHOGRAPHIC APPARATUS
    Publication number: 20190163066
    Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.
    Type: Application
    Filed: April 5, 2017
    Publication date: May 30, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Gijs KRAMER, Martijn HOUBEN, Nicholas Peter WATERSON, Thibault Simon Mathieu LAURENT, Yuri Johannes Gabriël VAN DE VIJVER, Marcus Martinus Petrus Adrianus VERMEULEN, Simon Karel RAVENSBERGEN, Vincentius Fransiscus CLOOSTERMAN, Siegfried Alexander TROMP, Coen Hubertus Matheus BALTIS, Justin Johannes Hermanus GERRITZEN, Niek Jacobus Johannes ROSET
  • LITHOGRAPHIC APPARATUS, METHOD FOR UNLOADING A SUBSTRATE AND METHOD FOR LOADING A SUBSTRATE
    Publication number: 20190043749
    Abstract: A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.
    Type: Application
    Filed: December 22, 2016
    Publication date: February 7, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Andre Bernardus JEUNINK, Robby Franciscus Josephus MARTENS, Youssef Karel Maria DE VOS, Ringo Petrus Cornelis VAN DORST, Gerhard Albert TEN BRINKE, Dirk Jerome Andre SENDEN, Coen Hubertus Matheus BALTIS, Justin Johannes Hermanus GERRITZEN, Jelmer Mattheüs KAMMINGA, Evelyn Wallis PACITTI, Thomas POIESZ, Arie Cornelis SCHEIBERLICH, Bert Dirk SCHOLTEN, André SCHREUDER, Abraham Alexander SOETHOUDT, Siegfried Alexander TROMP, Yuri Johannes Gabriël VAN DE VIJVER
  • SUBSTRATE TABLE, LITHOGRAPHIC APPARATUS AND METHOD OF OPERATING A LITHOGRAPHIC APPARATUS
    Publication number: 20180364584
    Abstract: A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface, wherein at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.
    Type: Application
    Filed: November 2, 2016
    Publication date: December 20, 2018
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Daan Daniel Johannes Antonius VAN SOMMEREN, Coen Hubertus Matheus BALTIS, Harold Sebastiaan BUDDENBERG, Giovanni Luca GATTOBIGIO, Johannes Cornelis Paulus MELMAN, Günes NAKIBOGLU, Theodorus Wilhelmus POLET, Walter Theodorus Matheus STALS, Yuri Johannes Gabriël VAN DE VIJVER, Josephus Peter VAN LIESHOUT, Jorge Alverto VIEYRA SALAS, Aleksandar Nikolov ZDRAVKOV