Patents by Inventor Coen Van De Vin

Coen Van De Vin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for measuring information about a substrate, and a substrate for use in a lithographic apparatus
    Patent number: 7355675
    Abstract: A method for measuring information provided by a substrate. The substrate includes a feature that has been created by a lithographic apparatus. The method includes projecting a beam of light onto a marker disposed above and/or near the feature on the substrate, and detecting information provided by the marker with a sensor. A coating is disposed on the substrate so that the coating lies between the beam of light and the feature to substantially prevent the beam of light from being reflected by the feature and causing an inaccurate readout of the information provided by the marker.
    Type: Grant
    Filed: May 24, 2005
    Date of Patent: April 8, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Sanjay Lalbahadoersing, Marco Johannes Annemarie Pieters, Jan Hauschild, Coen Van De Vin
  • Lithographic apparatus focus test method and system, and device manufacturing method
    Patent number: 7209214
    Abstract: A method and system for performing a focus test in a lithographic apparatus. According to the method, a substrate is provided with a layer of radiation sensitive material, the substrate is illuminated in the lithographic apparatus using a first focus sensitive feature and a second focus feature, and the substrate is analyzed to provide results of the focus test using the first focus sensitive feature as imaged on the substrate. The focus test is performed on a regular production wafer, and the results of the focus test are allowed if predetermined statistic properties associated with the second focus feature as imaged on the substrate are within predetermined limits. The second focus feature may be focus sensitive or focus insensitive.
    Type: Grant
    Filed: December 21, 2004
    Date of Patent: April 24, 2007
    Assignee: ASML Netherlands B.V.
    Inventors: Jan Hauschild, Marco Pieters, Coen Van De Vin
  • Method for measuring information about a substrate, and a substrate for use in a lithographic apparatus
    Publication number: 20060138410
    Abstract: A method for measuring information provided by a substrate is disclosed. The substrate includes a feature that has been created by a lithographic apparatus. The method includes projecting a beam of light onto a marker disposed above and/or near the feature on the substrate, and detecting information provided by the marker with a sensor. A coating is disposed on the substrate so that the coating lies between the beam of light and the feature to substantially prevent the beam of light from being reflected by the feature and causing an inaccurate readout of the information provided by the marker.
    Type: Application
    Filed: May 24, 2005
    Publication date: June 29, 2006
    Applicant: ASML Netherlands B.V.
    Inventors: Sanjay Lalbahadoersing, Marco Johannes Pieters, Jan Hauschild, Coen Van De Vin
  • Lithographic apparatus focus test method and system, and device manufacturing method
    Publication number: 20060132744
    Abstract: A method and system for performing a focus test in a lithographic apparatus. According to the method, a substrate is provided with a layer of radiation sensitive material, the substrate is illuminated in the lithographic apparatus using a first focus sensitive feature and a second focus feature, and the substrate is analyzed to provide results of the focus test using the first focus sensitive feature as imaged on the substrate. The focus test is performed on a regular production wafer, and the results of the focus test are allowed if predetermined statistic properties associated with the second focus feature as imaged on the substrate are within predetermined limits. The second focus feature may be focus sensitive or focus insensitive.
    Type: Application
    Filed: December 21, 2004
    Publication date: June 22, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jan Hauschild, Marco Pieters, Coen Van De Vin