Abstract: A dual sided display includes a display projector. The display projector includes a lamp and a display projector image. The display projector image has pixels and the pixels produce light as light rays. The display includes a display panel that has an upper edge, a lower edge, a left edge and a right edge. The display panel is formed of a substrate that is translucent or transparent. A display panel first viewing surface is formed on the first side of the display panel. A display panel second viewing surface is formed on the second side of the display panel. The wherein the display panel first viewing surface is parallel to and opposing the display panel second viewing surface. The display panel has a thickness. A displayed image is displayed on the display panel first viewing surface and the display panel second viewing surface simultaneously.

Abstract: A desalination and lithium collection system has a primary brine chamber receiving brine from a brine inlet. A charged metal has anodes and cathodes, submerged in the brine in the primary brine chamber. Electrical power applied is to the charged metal as alternating current having a frequency of less than 2kHz for conducting a primary electrolysis. A water vapor collection chamber fluidly connected to the primary brine chamber and configured to collect water vapor generated from the charged metal. A condenser chamber is fluidly connected to the water vapor collection chamber and configured to condense water vapor. A freshwater chamber is fluidly connected to the condenser and configured to collect freshwater.

Abstract: A spray cleaning device having an atomizing unit with at least one gas passage and at least one cleaning fluid passage converging into a atomizing area. The gas flowing though the gas passage and the cleaning fluid flowing through the cleaning fluid passages combine to form a mixture at the atomizing area. The accelerating unit has an acceleration passage for spraying the mixture onto a substrate surface. The gas passages are preferably angled with respect to the cleaning acceleration passage.

Abstract: A single-substrate cleaning apparatus and method of use are described. In an embodiment of the present invention, a liquid cleaning solution is dispensed in small volumes to form a substantially uniform static liquid layer over a substrate surface by atomizing the viscous liquid with an inert gas in a two-phase nozzle. In another embodiment of the present invention, after a layer of the cleaning solution is formed over the substrate to be cleaned, acoustic energy is applied to the substrate to improve the cleaning efficiency. In a further embodiment, cleaning solution precipitates are avoided by dispensing de-ionized water with a spray nozzle to gradually dilute the cleaning solution prior to dispensing de-ionized water with a stream nozzle.

Abstract: A system and method of processing a substrate. The method and system applies a liquid to a surface of the substrate so as to form a film of the liquid on the surface of the substrate, wherein a boundary layer exists at the interface of the surface and the film of the liquid. The cleaning system then applies a force that penetrates the boundary layer so as to create a localized area on the surface of the substrate that is substantially free of the liquid. The application of the force in combination with the liquid removes particles from the surface of the substrate.

Abstract: An apparatus, system and method for processing a substrate utilizing sonic energy. In one aspect, the invention utilizes a transmitter having through holes to dampen sonic energy that may damage the substrate. In other aspects, the through holes of the transmitter can be adapted to introduce a liquid solution having bubbles of a controlled size into the meniscus that couples the transmitter to the surface of a substrate to be cleaned to further dampen the sonic energy.

Abstract: A spray cleaning device having an atomizing unit with at least one gas passage and at least one cleaning fluid passage converging into a atomizing area. The gas flowing though the gas passage and the cleaning fluid flowing through the cleaning fluid passages combine to form a mixture at the atomizing area. The accelerating unit has an acceleration passage for spraying the mixture onto a substrate surface. The gas passages are preferably angled with respect to the cleaning acceleration passage.

Abstract: A system and method of cleaning a substrate utilizing sonic energy and a film of subambient gasified process solution that assists in reducing damage to the substrate. In one aspect, the invention is a method comprising: a) supporting a substrate in a substantially horizontal orientation; b) applying a solution comprising a liquid and a dissolved gas to a surface of the substrate so as to form a film of the solution on the surface of the substrate, the solution being at a subambient temperature; c) coupling a transmitter to the film of the solution, the transmitter acoustically coupled to a transducer for generating sonic energy; and d) applying sonic energy through the film of the solution and to the surface of the substrate via the transmitter. The method is especially useful in minimizing damage when cleaning substrates with a surface comprising a topography having technology nodes with a width less than 100 nanometers.

Abstract: An acoustic energy cleaning system and method which fosters micro-bubble formation for effective cleaning while buffering micro-bubble growth which would otherwise damage the wafer. In one embodiment, the invention includes combining a first frequency signal and a second frequency signal having a positive amplitude bias component so as to form a combined signal. The combined signal, which has a positive amplitude offset, is applied to a transducer system that converts the combined signal into acoustic waves. The acoustic waves can be applied to the object to be cleaned in a cleaning fluid.

Abstract: A method and system for the megasonic cleaning of one or more substrates that reduces damage to the substrate(s) resulting from the megasonic energy. The substrates are supported in a process chamber and contacted with a cleaning solution comprising a cleaning liquid having carbon dioxide gas dissolved in the cleaning liquid in such amounts that the carbon dioxide gas is at a supersaturated concentration for the conditions within the process chamber. Megasonic energy is then transmitted to the substrate. The cleaning solution provides protection from damage resulting from the application of megasonic/acoustical energy. In another aspect, the invention is a system for carrying out the method. The invention is not limited to carbon dioxide but can be used in conjunction with any gas that, when so dissolved in a cleaning liquid, protects substrates from being damaged by the application of megasonic/acoustical energy.