Patents by Inventor Colin LIU

Colin LIU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240140487
    Abstract: The present disclosure provides autonomous vehicle systems and methods that include or otherwise leverage a machine-learned yield model. In particular, the machine-learned yield model can be trained or otherwise configured to receive and process feature data descriptive of objects perceived by the autonomous vehicle and/or the surrounding environment and, in response to receipt of the feature data, provide yield decisions for the autonomous vehicle relative to the objects. For example, a yield decision for a first object can describe a yield behavior for the autonomous vehicle relative to the first object (e.g., yield to the first object or do not yield to the first object). Example objects include traffic signals, additional vehicles, or other objects. The motion of the autonomous vehicle can be controlled in accordance with the yield decisions provided by the machine-learned yield model.
    Type: Application
    Filed: October 17, 2023
    Publication date: May 2, 2024
    Inventors: Colin Jeffrey Green, Wei Liu, David McAllister Bradley, Vijay Subramanian
  • Patent number: 11963745
    Abstract: Various embodiments provide a wellness tracking device with a base plate that may be utilized as a combination electrode by a variety of sensors. The base plate may be a multi-material electrode that includes a conductor and a transparent or semi-transparent material to enable optical sensing. In certain embodiments, the base plate supports a plurality of different sensors, which may selectively utilize the base plate as an electrode.
    Type: Grant
    Filed: August 19, 2022
    Date of Patent: April 23, 2024
    Assignee: FITBIT, INC.
    Inventors: Jens Mitchell Nielsen, Jaclyn Leverett Wasson, Kyung Nim Noh, Man-Chi Liu, Alan Luu, Peter Colin Dess, Lindsey Michelle Sunden, Lukas Bielskis, Thomas Consolazio, Steven Thomas Woodward, Dennis Jacob McCray
  • Patent number: 11754927
    Abstract: Photoresist pattern trimming compositions comprise a polymer, an aromatic sulfonic acid, and an organic-based solvent system, wherein the aromatic sulfonic acid is of general formula (I): wherein: Ar1 represents an aromatic group; R1 independently represents a halogen atom, hydroxy, substituted or unsubstituted alkyl, substituted or unsubstituted heteroalkyl, substituted or unsubstituted carbocyclic aryl, substituted or unsubstituted heterocyclic aryl, substituted or unsubstituted alkoxy, or a combination thereof, wherein adjacent R1 groups together optionally form a fused ring structure with Ar1; a represents an integer of 2 or more; and b represents an integer of 1 or more, provided that a+b is at least 3 and is not greater than the total number of available aromatic carbon atoms of Ar1, and two or more of R1 are independently a fluorine atom or a fluoroalkyl group bonded directly to an aromatic ring carbon atom.
    Type: Grant
    Filed: May 11, 2020
    Date of Patent: September 12, 2023
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Irvinder Kaur, Colin Liu, Xisen Hou, Kevin Rowell, Mingqi Li, Cheng-Bai Xu
  • Publication number: 20210200084
    Abstract: A polymer comprising a first repeating unit derived from a monomer comprising a hydroxy-aryl group; a second repeating unit derived from a monomer comprising a hydroxy-aryl group protected with an acetal or ketal group; a third repeating unit derived from a (meth)acrylate monomer comprising a cycloaliphatic group; and a fourth repeating unit derived from a monomer comprising an acid-sensitive group, wherein the first, the second, the third, and the fourth repeating units are different from each other.
    Type: Application
    Filed: December 31, 2019
    Publication date: July 1, 2021
    Inventors: Jong Keun Park, Emad Aqad, Yang Song, Chunyi Wu, Colin Liu, Mingqi Li
  • Publication number: 20210108065
    Abstract: A polymer comprising: a first repeating unit comprising a tertiary ester acid labile group; and a second repeating unit of Formula (1): wherein R1 to R5 are as provided herein; R2 and R3 together do not form a ring; each A is independently a halogen, a carboxylic acid or ester, a thiol, a straight chain or branched C1-20 alkyl, a monocyclic or polycyclic C3-20 cycloalkyl, a monocyclic or polycyclic C3-20 fluorocycloalkenyl, a monocyclic or polycyclic C3-20 heterocycloalkyl, a monocyclic or polycyclic C6-20 aryl, or a monocyclic or polycyclic C4-20 heteroaryl, each of which is substituted or unsubstituted; and m is an integer of 0 to 4.
    Type: Application
    Filed: October 15, 2019
    Publication date: April 15, 2021
    Inventors: Yang SONG, Jong Keun PARK, Emad AQAD, Mingqi LI, Colin LIU, James W. THACKERAY, Peter TREFONAS, III
  • Publication number: 20200379353
    Abstract: Photoresist pattern trimming compositions comprise a polymer, an aromatic sulfonic acid, and an organic-based solvent system, wherein the aromatic sulfonic acid is of general formula (I): wherein: Ar1 represents an aromatic group; R1 independently represents a halogen atom, hydroxy, substituted or unsubstituted alkyl, substituted or unsubstituted heteroalkyl, substituted or unsubstituted carbocyclic aryl, substituted or unsubstituted heterocyclic aryl, substituted or unsubstituted alkoxy, or a combination thereof, wherein adjacent R1 groups together optionally form a fused ring structure with Ar1; a represents an integer of 2 or more; and b represents an integer of 1 or more, provided that a+b is at least 3 and is not greater than the total number of available aromatic carbon atoms of Ar1, and two or more of R1 are independently a fluorine atom or a fluoroalkyl group bonded directly to an aromatic ring carbon atom.
    Type: Application
    Filed: May 11, 2020
    Publication date: December 3, 2020
    Inventors: Irvinder KAUR, Colin LIU, Xisen Hou, Kevin Rowell, Mingqi LI, Cheng-Bai Xu