Patents by Inventor Colin NEIKIRK

Colin NEIKIRK has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods for depositing polymer layer for sensor applications via hot wire chemical vapor deposition
    Patent number: 10794853
    Abstract: The present disclosure relates to a method of depositing a polymer layer, including: providing a substrate, having a sensor structure disposed on the substrate, to a substrate support within a hot wire chemical vapor deposition (HWCVD) chamber; providing a process gas comprising an initiator gas and a monomer gas and a carrier gas to the HWCVD chamber; heating a plurality of filaments disposed in the HWCVD chamber to a first temperature sufficient to activate the initiator gas without decomposing the monomer gas; and exposing the substrate to initiator radicals from the activated initiator gas and to the monomer gas to deposit a polymer layer atop the sensor structure.
    Type: Grant
    Filed: December 6, 2017
    Date of Patent: October 6, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Colin Neikirk, Yuriy Melnik, Pravin K. Narwankar
  • METHODS FOR DEPOSITING POLYMER LAYER FOR SENSOR APPLICATIONS VIA HOT WIRE CHEMICAL VAPOR DEPOSITION
    Publication number: 20180164245
    Abstract: The present disclosure relates to a method of depositing a polymer layer, including: providing a substrate, having a sensor structure disposed on the substrate, to a substrate support within a hot wire chemical vapor deposition (HWCVD) chamber; providing a process gas comprising an initiator gas and a monomer gas and a carrier gas to the HWCVD chamber; heating a plurality of filaments disposed in the HWCVD chamber to a first temperature sufficient to activate the initiator gas without decomposing the monomer gas; and exposing the substrate to initiator radicals from the activated initiator gas and to the monomer gas to deposit a polymer layer atop the sensor structure.
    Type: Application
    Filed: December 6, 2017
    Publication date: June 14, 2018
    Inventors: Colin NEIKIRK, Yuriy MELNIK, Pravin K. NARWANKAR