Abstract: A display panel and a display device are provided. The display panel includes an array substrate, a first electrode, a pixel defining block, an organic common layer, a second electrode, an adhesive layer, and a thin film encapsulation layer. The organic common layer corresponding to the pixel defining block is defined with a through hole, and the adhesive layer is filled, which realizes a strong adhesion between the second electrode and the pixel defining block, and reduces a risk of peeling between layers of the organic common layer.

Abstract: The present disclosure provides a mask pattern for a semiconductor photolithography process and a semiconductor photolithography process. The mask pattern comprises: a pattern, the pattern comprising a light-transmitting area and a light-shielding area which are alternately arranged, the pattern having a boundary formed by an end portion of the light-transmitting area and an end portion of the light-shielding area, and an edge light-transmitting area being formed at the boundary. By the mask pattern of the present disclosure, a pattern with smooth edges can be formed on a wafer, and the edge roughness of the pattern is low, which meets the design requirements, thereby improving product quality and yield.

Abstract: A display panel and a display device are provided. The display panel comprises an array substrate, a first electrode, a pixel defining block, an organic common layer, a second electrode, an adhesive layer, and a thin film encapsulation layer. The organic common layer corresponding to the pixel defining block is defined with a through hole, and the adhesive layer is filled, which realizes a strong adhesion between the second electrode and the pixel defining block, and reduces a risk of peeling between layers of the organic common layer.

Abstract: The present application provides a mask applied to semiconductor photolithography and a photolithographic method, and the mask includes at least one pattern group, each pattern group including at least one light-transmitting region and at least one shielding region, the light-transmitting regions and the shielding regions being arranged at intervals, and after exposure, each pattern group forming an independent mark on a wafer. The present application has the following advantages. The independent mark formed on the wafer according to the mask has the same shape as a contour of a pattern of the mask, and does not have a pattern defect, which improves accuracy of an independent mark pattern formed on the wafer, and then alignment precision of the semiconductor photolithography as well as overlaying accuracy in a following semiconductor process, thus increasing a quality and a yield of products.

Abstract: The present disclosure provides a display panel and a manufacturing method thereof. The display panel includes a display area, a plurality of light-emitting units uniformly distributed in the display area, and at least one organic photodetection unit arranged at an edge or a corner of the display area.

Abstract: Disclosed are a display panel and a display apparatus. The display panel includes a plurality of display units arranged in an array, each of the display units including: a display device and a photosensitive device arranged in a same layer, wherein a light reflecting unit is provided at a side of each of the display units and is configured to partially reflect light emitted by the display device, to the photosensitive device to detect the light emitted by the display device to obtain brightness data.