Patents by Inventor Connie L. Gordon

Connie L. Gordon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Source reagent compositions and method for forming metal films on a substrate by chemical vapor deposition
    Patent number: 8299286
    Abstract: A ?-diketonate alkoxide metal compound and a source reagent composition are provided. The ?-diketonate alkoxide metal compound may include a metal M selected from Mg, Ca, Sr, Ba, Sc, Y, La, Ce, Ti, Zr, Hf, Pr, V, Nb, Ta, Nd, Cr, W, Pm, Mn, Re, Sm, Fe, Ru, Eu, Co, Rh, Ir, Gd, Ni, Tb, Cu, Dy, Ho, Al, Tl, Er, Sn, Pb, Tm, Bi, Lu, Th, Pd, Pt, Ga, In, Au, Ag, Li, Na, K, Rb, Cs, Mo, and Yb. The metal may be complexed to at least one alkoxide ligand and one ?-diketonate ligand.
    Type: Grant
    Filed: December 4, 2007
    Date of Patent: October 30, 2012
    Assignee: Advanced Technology Materials, Inc.
    Inventors: Robin A. Gardiner, Thomas H. Baum, Douglas Cameron Gordon, Connie L. Gordon, legal representative, Timothy E. Glassman, Sofia Pombrik, Brian A. Vaartstra, Peter S. Kirlin
  • SOURCE REAGENT COMPOSITIONS AND METHOD FOR FORMING METAL FILMS ON A SUBSTRATE BY CHEMICAL VAPOR DEPOSITION
    Publication number: 20110171382
    Abstract: A metalorganic complex composition comprising a metalorganic complex selected from the group consisting of: metalorganic complexes comprising one or more metal central atoms coordinated to one or more monodentate or multidentate organic ligands, and complexed with one or more complexing monodentate or multidentate ligands containing one or more atoms independently selected from the group consisting of atoms of the elements C, N, H, S, O and F; wherein when the number of metal atoms is one and concurrently the number of complexing monodentate or multidentate ligands is one, then the complexing monodentate or multidentate ligand of the metalorganic complex is selected from the group consisting of beta-ketoiminates, beta-diiminates, C2-C10 alkenyl, C2-C15 cycloalkenyl and C6-C10 aryl.
    Type: Application
    Filed: December 4, 2007
    Publication date: July 14, 2011
    Applicant: ADVANCED TECHNOLOGY MATERIALS, INC.
    Inventors: Robin A. Gardiner, Peter S. Kirlin, Thomas H. Baum, Douglas Gordon, Connie L. Gordon, Timothy E. Glassman, Sophia Pombrik, Brian A. Vaarstra
  • Source reagent compositions and method for forming metal films on a substrate by chemical vapor deposition
    Patent number: 7323581
    Abstract: A metalorganic complex composition comprising a metalorganic complex selected from the group consisting of: metalorganic complexes comprising one or more metal central atoms coordinated to one or more monodentate or multidentate organic ligands, and complexed with one or more complexing monodentate or multidentate ligands containing one or more atoms independently selected from the group consisting of atoms of the elements C, N, H, S, O and F; wherein when the number of metal atoms is one and concurrently the number of complexing monodentate or multidentate ligands is one, then the complexing monodentate or multidentate ligand of the metalorganic complex is selected from the group consisting of beta-ketoiminates, beta-diiminates, C2-C10 alkenyl, C2-C15 cycloalkenyl and C6-C10 aryl.
    Type: Grant
    Filed: August 28, 2000
    Date of Patent: January 29, 2008
    Assignee: Advanced Technology Materials, Inc.
    Inventors: Robin A. Gardiner, Thomas H. Baum, Connie L. Gordon, legal representative, Timothy E. Glassman, Sophia Pombrik, Brian A. Vaastra, Peter S. Kirlin, Douglas Cameron Gordon, deceased