Abstract: The present invention relates to a vaporization chamber for a hairstyling appliance that diffuses steam, comprising a hollow body defining a free interior space between at least one inlet for feeding liquid water to be vaporized and at least one outlet for the water in the form of steam, said steam chamber being characterized in that the inlet or inlets for feeding liquid water have, together, a plurality of orifices that open into the interior of the vaporization chamber and are spaced apart from one another.

Abstract: A device for treating the hair, having two hair treatment jaws that are movable relative to one another between a spaced-apart configuration and a moved-together configuration, an internal treatment member having an internal heating surface, which extends over one of the jaws towards the other of the jaws in the moved-together configuration and is configured to come into contact with the hair extending between the jaws, at least one internal treatment member having a first lateral edge and an opposite second lateral edge, the first lateral edge being configured such that an angle formed between a median plane of the device, extending between the jaws in the moved-together configuration of the jaws, and hair under mechanical tension, bearing on the first lateral edge, and on an outer surface of the corresponding jaw, adjacent to and separated from the internal treatment member, is less than or equal to 120°, and strictly greater than 90°.

Abstract: The present invention relates to particular photodimerizable polymers comprising at least one polyoxyalkylene group, and also to a composition comprising at least one of these polymers. The present invention also relates to a cosmetic process for treating keratin materials, in particular keratin fibres, preferably human keratin fibres such as the hair, comprising the application to said keratin materials of at least one of these particular photodimerizable polymers.

Abstract: Device (1) for steam treating the hair, in particular a hair brush, having-a treatment plate (2) intended to come into contact with the hair during the treatment,—a vaporization chamber (5) supplied with liquid water, where the liquid water is transformed into steam,—at least one dispensing chamber (6, 6a, 6b) for dispensing steam onto the hair, which is different to the vaporization chamber and is in fluid communication with the vaporization chamber, and a heating system (3) arranged between the treatment plate and the vaporization chamber and configured to heat the vaporization chamber to a temperature above or equal to the water vaporization temperature and to heat at least a portion of the treatment plate.

Abstract: The invention relates to a hair treatment brush (10), in particular for straightening, comprising: a plurality of teeth (23, 23a. 23b), at least one steam outlet (30) for emitting steam onto the hair, the brush (10) being configured to emit the steam through the steam outlet (30) at a speed of between 0.007 m/s and 15 m/s, preferably between 0.01 m/s and 3 m/s, and more preferably between 0.1 m/s and 1 m/s.

Abstract: The invention relates to a brush (10) for treating the hair, in particular for straightening, having: —at least one heated hair combing zone (C), without a steam outlet, in which the brush (10) has: o a plurality of teeth (23) and o heating means (35, 37) for heating at least two teeth of the plurality of teeth (23), —at least one steam outlet zone (V) in which the brush (10) has at least one steam outlet (30), the steam outlet zone (V) being separate from the heated hair combing zone or zones (C).

Abstract: The present invention relates to a process for treating keratin materials, especially human keratin fibers, comprising the application of a composition comprising i) at least one flavin derivative and ii) at least one polymerizable molecule, preferably a photopolymerizable molecule, and at least one step of exposing said materials to artificial or natural light radiation, in particular for caring for and/or repairing the keratin materials.

Abstract: A process for obtaining a material includes a substrate coated with a photocatalytic coating, the process including depositing on the substrate, by sputtering, a stack of thin layers successively including a first layer of titanium metal having a thickness of from 1 to 3 nm, an intermediate layer of at least partially oxidized titanium having a thickness of from 0.5 to 5 nm, and a second layer of titanium metal having a thickness of from 2 to 5 nm; and oxidizing the stack, with the aid of a heat treatment by laser radiation, wherein the stack is in contact with an oxidizing atmosphere.

Abstract: A solar protection and/or thermal insulation glazing including a substrate, in particular a glass substrate, provided with a stack of thin layers which act on solar radiation, the stack having the succession of the following layers, starting from the surface of the glass: an underlayer or a set of underlayers, the underlayer(s) having dielectric materials, a layer based on titanium oxide also having silicon, the overall Si/Ti atomic ratio in said layer being between 0.01 and 0.25, and in which Si and Ti represent at least 90% of the atoms other than oxygen, the thickness of the layer being between 20 and 70 nm, an overlayer or a set of overlayers, said overlayer(s) having dielectric materials.

Abstract: A solar protection and/or thermal insulation glazing including a substrate, in particular a glass substrate, provided with a stack of thin layers which act on solar radiation, the stack having the succession of the following layers, starting from the surface of the glass: an underlayer or a set of underlayers, the underlayer(s) having dielectric materials, a layer based on titanium oxide also having silicon, the overall Si/Ti atomic ratio in said layer being between 0.01 and 0.25, and in which Si and Ti represent at least 90% of the atoms other than oxygen, the thickness of the layer being between 20 and 70 nm, an overlayer or a set of overlayers, said overlayer(s) having dielectric materials.

Abstract: A process for forming an array of irregularities or features that are submicron-size in height and that have a characteristic lateral dimension that is micron- or submicron-size, over a surface of a material by reactive-ion etching, the process including: supplying the material with a thickness at least equal to 100 nm, the material being a solid hybrid material that includes: a simple silicon oxide or a mixed silicon oxide, most of the oxides in the case of a mixed oxide being silicon oxide, an oxide molar percentage in the material being at least 40%; and a species, of a different nature to the silicon of the oxide, a molar percentage of the species in the material ranging from 1 mol % or even up to 50 mol % while remaining below the percentage of the silicon oxide, at least most of the species having a largest characteristic dimension smaller than 50 nm, optionally heating the hybrid material before the etching; structuring the surface of the hybrid material, without masking, with etching that lasts less t

Abstract: A process for forming an array of irregularities or features that are submicron-size in height and that have a characteristic lateral dimension that is micron- or submicron-size, over a surface of a material, by ion erosion, the process including: supplying the material with a thickness at least equal to 100 nm, the material being a solid hybrid material that includes: a simple oxide or a mixed oxide of one or more elements, an oxide molar percentage in the material being at least 40%; and a species, of a different nature to the one or more elements of the oxide, a molar percentage of the species in the material ranging from 6 mol % up to 50 mol % while remaining below the percentage of the oxide, most of the species having a largest characteristic dimension smaller than 50 nm, optionally heating the hybrid material before the erosion; structuring the surface of the hybrid material with an erosion that lasts less than one hour over an erosion area greater than 1 cm2, until the array of features is formed, the

Abstract: A process for forming an array of irregularities or features that are submicron-size in height and that have a characteristic lateral dimension that is micron- or submicron-size, over a surface of a material, by ion erosion, the process including: supplying the material with a thickness at least equal to 100 nm, the material being a solid hybrid material that includes: a simple oxide or a mixed oxide of one or more elements, an oxide molar percentage in the material being at least 40%; and a species, of a different nature to the one or more elements of the oxide, a molar percentage of the species in the material ranging from 6 mol % up to 50 mol % while remaining below the percentage of the oxide, most of the species having a largest characteristic dimension smaller than 50 nm, optionally heating the hybrid material before the erosion; structuring the surface of the hybrid material with an erosion that lasts less than one hour over an erosion area greater than 1 cm2, until the array of features is formed, the

Abstract: A process for forming an array of irregularities or features that are submicron-size in height and that have a characteristic lateral dimension that is micron- or submicron-size, over a surface of a material by reactive-ion etching, the process including: supplying the material with a thickness at least equal to 100 nm, the material being a solid hybrid material that includes: a simple silicon oxide or a mixed silicon oxide, most of the oxides in the case of a mixed oxide being silicon oxide, an oxide molar percentage in the material being at least 40%; and a species, of a different nature to the silicon of the oxide, a molar percentage of the species in the material ranging from 1 mol % or even up to 50 mol % while remaining below the percentage of the silicon oxide, at least most of the species having a largest characteristic dimension smaller than 50 nm, optionally heating the hybrid material before the etching; structuring the surface of the hybrid material, without masking, with etching that lasts less t