Patents by Inventor Cooper H. Langford

Cooper H. Langford has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6736976
    Abstract: A fluid treatment device for reducing the level of a chemical compound in a fluid. The device comprises: a fluid inlet; a fluid outlet; a flow-through fluid treatment zone having comprising: a radiation source, an adsorbent and a photocatalyst. The fluid treatment zone is reversibly operable between: (i) a first mode in which the fluid flows in a first direction and at least a portion of the chemical compound is adsorbed on the adsorbent; and (ii) a second mode in which the fluid flows in a second direction different from the first direction in which the absorbed chemical compound is exposed to radiation from the radiation resulting in photooxidation of the chemical compound.
    Type: Grant
    Filed: April 19, 2001
    Date of Patent: May 18, 2004
    Inventors: Apostolos Kantzas, Cooper H. Langford, Amit Bhargava, Alex Starosud
  • Publication number: 20020040874
    Abstract: A fluid treatment device for reducing the level of a chemical compound in a fluid. The device comprises: a fluid inlet; a fluid outlet; a flow-through fluid treatment zone having comprising: a radiation source, an adsorbent and a photocatalyst. The fluid treatment zone is reversibly operable between: (i) a first mode in which the fluid flows in a first direction and at least a portion of the chemical compound is adsorbed on the adsorbent; and (ii) a second mode in which the fluid flows in a second direction different from the first direction in which the adsorbed chemical compound is exposed to radiation from the radiation resulting in photooxidation of the chemical compound.
    Type: Application
    Filed: April 19, 2001
    Publication date: April 11, 2002
    Inventors: Apostolos Kantzas, Cooper H. Langford, Amit Bhargava, Alex Starosud
  • Patent number: 5981426
    Abstract: A photocatalyst compound comprising: (i) a photocatalyst selected from the group consisting of TiO.sub.2, WO.sub.3 and mixtures thereof, the photocatalyst being substantially free of sharp, narrow band X-ray reflections at angles corresponding those of crystalline TiO.sub.2, WO.sub.3 and mixtures thereof, and (ii) a porous, crystalline, adsorbent support material. A process for producing the photocatalyst compound is also disclosed. The process comprises: (i) hydrolysing a non-ionic titanium compound to produce a colloidal suspension having an average particle size of less than about 250 .ANG.; (ii) contacting a porous, crystalline, adsorbent support material with the colloidal suspension to produce an impregnated support; and (iii) calcining the impregnated support to produce the photocatalyst compound. The photocatalyst compound is useful, in the treatment of a fluid containing an organic pollutant.
    Type: Grant
    Filed: August 29, 1997
    Date of Patent: November 9, 1999
    Assignee: University Technologies International Inc.
    Inventors: Cooper H. Langford, Yiming Xu
  • Patent number: 5686372
    Abstract: A photocatalyst compound comprising a silica-based support material having bound thereto a photocatalyst selected from the group consisting of TiO.sub.2, WO.sub.3 and mixtures thereof, the photocatalyst compound having been derivatized by reaction with an alcohol compound. The process for producing the photocatalyst compound comprises the steps of: (i) contacting a silica-based support material having bound thereto a photocatalyst selected from the group consisting of TiO.sub.2, WO.sub.
    Type: Grant
    Filed: May 26, 1995
    Date of Patent: November 11, 1997
    Assignee: University Technologies International Inc.
    Inventors: Cooper H. Langford, Giuseppe P. Lepore, Lalchan Persaud
  • Patent number: 5118429
    Abstract: There is disclosed a process for destroying halogenated hydrocarbons such as PCBs and PCBs in PCB containing fluids (e.g., Askarel) and oils (e.g., paraffin oil, transformer oil, etc.) at ambient temperature. The process comprises reacting halogenated hydrocarbons, such as PCB containing fluids or oils with a solid oxidant in the presence of a concentrated acid. Preferably, the solid oxidant is potassium permanganate and the concentrated acid is sulfuric acid. Destruction efficiency is as high as 99.95%.
    Type: Grant
    Filed: October 29, 1990
    Date of Patent: June 2, 1992
    Assignee: Concordia University
    Inventors: Perry D. Anderson, Bhuvan C. Pant, Zhendi Wang, Cooper H. Langford, Prasad Aysola
  • Patent number: 4980039
    Abstract: This is disclosed a process for the decomposition of halogenated hydrocarbons including polychlorinated biphenyls (PCB) and chlorinated pesticides, as DDT and DDE. The process comprises microwave-mediated wet-ashing of the halogenated hydrocarbons(s) in controlled conditions to avoid an emission of noxious fumes from the reaction mixture. Preferably, the wet-ashing reagent is a 1:1 mixture of nitric acid and sulfuric acid.
    Type: Grant
    Filed: September 13, 1989
    Date of Patent: December 25, 1990
    Assignee: Canadian Patents & Development Ltd.
    Inventors: Prasad Aysola, Perry D. Anderson, Cooper H. Langford
  • Patent number: 4806514
    Abstract: A composite photocatalyst for refractory waste treatment comprising particles of a wide band gap semiconductor material selected from the group consisting of titanium oxide, cadmium sulfide and cadmium selenide, the particles being coated with a polymer film capable of absorbing a refractory waste substrate to be treated and comprising a pyridine-containing polymer and a divalent metal porphyrin or phthalocyanine-based dye. The dye is molecularly dispersed throughout the film and chemically bonded to the pyridine-containing polymer. Upon mixing of the photocatalyst with the refractory waste substrate and irradiation with light having a wavelength of about 300 to about 400 nm, the photocalyst of the invention generates in the polymer film thereof reactive species which are sufficiently oxidizing to degrade the refractory waste substrate absorbed in the polymer film.
    Type: Grant
    Filed: September 30, 1987
    Date of Patent: February 21, 1989
    Assignee: Canadian Patents and Development Limited -Societe Canadienne des Brevets et D'Exploitation Limitee
    Inventors: Cooper H. Langford, Mark K. S. Mak, Andrew M. Crouch