Patents by Inventor Corey O'Connor

Corey O'Connor has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10030165
    Abstract: Arylclobutene-containing multi-functional monomers are useful in the preparation of arylcyclobutene-based polymer coatings. Compositions comprising one or more arylclobutene-containing multi-functional monomers and one or more oligomers comprising as polymerized units one or more arylcyclobutene monomer provide arylcyclobutene-based polymer coatings having reduced stress. Such compositions are useful in the manufacture of electronic devices.
    Type: Grant
    Filed: August 8, 2016
    Date of Patent: July 24, 2018
    Assignees: Dow Global Technologies LLC, Rohm and Haas Electronic Materials LLC, Rohm and Haas Company
    Inventors: Duane R. Romer, Matthew M. Yonkey, Michael K. Gallagher, Kevin Y. Wang, Xiang Qian Liu, Raymond J. Thibault, Kim S. Ho, Gregory D. Prokopowicz, Corey O'Connor, Elissei Iagodkine, Robert K. Barr
  • Patent number: 9663715
    Abstract: An aqueous acidic composition which includes alkaline compounds, fluoride ions and oxidizing agents is provided for texturing polycrystalline semiconductors. Methods for texturing are also disclosed. The textured polycrystalline semiconductors have reduced reflectance of light incidence.
    Type: Grant
    Filed: April 23, 2012
    Date of Patent: May 30, 2017
    Assignee: Sun Chemical Corporation
    Inventors: Robert K. Barr, Corey O'Connor
  • Publication number: 20170081550
    Abstract: Arylclobutene-containing multi-functional monomers are useful in the preparation of arylcyclobutene-based polymer coatings. Compositions comprising one or more arylclobutene-containing multi-functional monomers and one or more oligomers comprising as polymerized units one or more arylcyclobutene monomer provide arylcyclobutene-based polymer coatings having reduced stress. Such compositions are useful in the manufacture of electronic devices.
    Type: Application
    Filed: August 8, 2016
    Publication date: March 23, 2017
    Inventors: Duane R. Romer, Matthew M. Yonkey, Michael K. Gallagher, Kevin Y. Wang, Xiang Qian Liu, Raymond J. Thibault, Kim S. Ho, Gregory D. Prokopowicz, Corey O'Connor, Elissei Iagodkine, Robert K. Barr
  • Patent number: 9441055
    Abstract: Arylclobutene-containing multi-functional monomers are useful in the preparation of arylcyclobutene-based polymer coatings. Compositions comprising one or more arylclobutene-containing multi-functional monomers and one or more oligomers comprising as polymerized units one or more arylcyclobutene monomer provide arylcyclobutene-based polymer coatings having reduced stress. Such compositions are useful in the manufacture of electronic devices.
    Type: Grant
    Filed: September 18, 2015
    Date of Patent: September 13, 2016
    Assignees: Dow Global Technologies LLC, Rohm and Haas Electronic Materials LLC, Rohm and Haas Company
    Inventors: Duane R. Romer, Matthew M. Yonkey, Michael K. Gallagher, Kevin Y. Wang, Xiang Qian Liu, Raymond J. Thibault, Kim S. Ho, Gregory D. Prokopowicz, Corey O'Connor, Elissei Iagodkine, Robert K. Barr
  • Patent number: 9303207
    Abstract: Monocrystalline semiconductor substrates are textured with alkaline solutions to form pyramid structures on their surfaces to reduce incident light reflectance and improve light absorption of the wafers. The alkaline baths include hydantoin compounds and derivatives thereof in combination with alkoxylated glycols to inhibit the formation of flat areas between pyramid structures to improve the light absorption.
    Type: Grant
    Filed: June 3, 2014
    Date of Patent: April 5, 2016
    Inventors: Michael P. Toben, Robert K. Barr, Corey O'Connor
  • Publication number: 20140284529
    Abstract: Monocrystalline semiconductor substrates are textured with alkaline solutions to form pyramid structures on their surfaces to reduce incident light reflectance and improve light absorption of the wafers. The alkaline baths include hydantoin compounds and derivatives thereof in combination with alkoxylated glycols to inhibit the formation of flat areas between pyramid structures to improve the light absorption.
    Type: Application
    Filed: June 3, 2014
    Publication date: September 25, 2014
    Inventors: Michael P. TOBEN, Robert K. BARR, Corey O'CONNOR
  • Patent number: 8765001
    Abstract: Monocrystalline semiconductor substrates are textured with alkaline solutions to form pyramid structures on their surfaces to reduce incident light reflectance and improve light absorption of the wafers. The alkaline baths include hydantoin compounds and derivatives thereof in combination with alkoxylated glycols to inhibit the formation of flat areas between pyramid structures to improve the light absorption.
    Type: Grant
    Filed: August 28, 2012
    Date of Patent: July 1, 2014
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Michael P. Toben, Robert K. Barr, Corey O'Connor
  • Publication number: 20140065836
    Abstract: Monocrystalline semiconductor substrates are textured with alkaline solutions to form pyramid structures on their surfaces to reduce incident light reflectance and improve light absorption of the wafers. The alkaline baths include hydantoin compounds and derivatives thereof in combination with alkoxylated glycols to inhibit the formation of flat areas between pyramid structures to improve the light absorption.
    Type: Application
    Filed: August 28, 2012
    Publication date: March 6, 2014
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Michael P. TOBEN, Robert K. Barr, Corey O'Connor
  • Publication number: 20140004701
    Abstract: Monocrystalline semiconductor substrates are textured with alkaline solutions to form pyramid structures on their surfaces to reduce incident light reflectance and improve light absorption of the wafers. The alkaline baths include compounds which inhibit the formation of flat areas between pyramid structures to improve the light adsorption.
    Type: Application
    Filed: June 27, 2012
    Publication date: January 2, 2014
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. Barr, Corey O'Connor, Peter W. Hinkley, George R. Allardyce
  • Patent number: 8053160
    Abstract: An imaging composition, article and method of imaging are disclosed. The imaging composition is energy sensitive such that upon application of a sufficient amount of energy to the composition a color or shade change is affected. The imaging composition is coated on an article to form an energy sensitive article, which may be used in marking work pieces.
    Type: Grant
    Filed: July 13, 2005
    Date of Patent: November 8, 2011
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. Barr, James T. Fahey, Corey O'Connor, James G. Shelnut
  • Patent number: 8048606
    Abstract: An imaging method is disclosed. An imaging composition is coated on a work piece followed by applying a sufficient amount of energy from a 3-D imaging system to form an image on the coated work piece. The image may be a logo or marker for alignment of parts.
    Type: Grant
    Filed: March 17, 2006
    Date of Patent: November 1, 2011
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. Barr, James T. Fahey, Corey O'Connor, James G. Shelnut
  • Patent number: 7977026
    Abstract: An imaging method is disclosed. An imaging composition is coated on a work piece followed by applying a sufficient amount of energy from a 3-D imaging system to form an image on the coated work piece. The image may be a logo or marker for alignment of parts.
    Type: Grant
    Filed: February 6, 2004
    Date of Patent: July 12, 2011
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. Barr, James T. Fahey, Corey O'Connor, James G. Shelnut
  • Publication number: 20110151671
    Abstract: Semiconductor substrates are cleaned and subsequently oxidized. After the semiconductor is oxidized it is textured to reduce incident light reflectance. The textured semiconductors can be used in the manufacture of photovoltaic devices.
    Type: Application
    Filed: December 17, 2010
    Publication date: June 23, 2011
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. BARR, Corey O' Connor
  • Patent number: 7955989
    Abstract: Semiconductors are textured with aqueous solutions containing non-volatile alkoxylated glycols, their ethers and ether acetate derivatives having molecular weights of 170 or greater and flash points of 75° C. or greater. The textured semiconductors can be used in the manufacture of photovoltaic devices.
    Type: Grant
    Filed: September 22, 2010
    Date of Patent: June 7, 2011
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. Barr, Corey O'Connor
  • Publication number: 20110081742
    Abstract: Semiconductors are textured with aqueous solutions containing non-volatile alkoxylated glycols, their ethers and ether acetate derivatives having molecular weights of 170 or greater and flash points of 75° C. or greater. The textured semiconductors can be used in the manufacture of photovoltaic devices.
    Type: Application
    Filed: September 22, 2010
    Publication date: April 7, 2011
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. Barr, Corey O'Connor
  • Patent number: 7749685
    Abstract: An imaging method is disclosed. An imaging composition is coated on a work piece followed by applying a sufficient amount of energy from a 3-D imaging system to form an image on the coated work piece. The image may be a logo or marker for alignment of parts.
    Type: Grant
    Filed: March 17, 2006
    Date of Patent: July 6, 2010
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. Barr, James T. Fahey, Corey O'Connor, James G. Shelnut
  • Patent number: 7615335
    Abstract: An imaging method is disclosed. An imaging composition is coated on a work piece followed by applying a sufficient amount of energy from a 3-D imaging system to form an image on the coated work piece. The image may be a logo or marker for alignment of parts.
    Type: Grant
    Filed: March 17, 2006
    Date of Patent: November 10, 2009
    Assignee: Rohm & Haas Electronic Materials LLC
    Inventors: Robert K. Barr, James T. Fahey, Corey O'Connor, James G. Shelnut
  • Patent number: 7270932
    Abstract: Imaging compositions and methods of using the compositions are disclosed. The imaging compositions are sensitive to low levels of energy such that upon application of the low levels of energy the compositions change color or shade. The compositions may be used in methods of marking.
    Type: Grant
    Filed: February 6, 2004
    Date of Patent: September 18, 2007
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. Barr, James T. Fahey, Corey O'Connor, James G. Shelnut, John J. Piskorski
  • Patent number: 7223519
    Abstract: Imaging compositions and methods of using the compositions are disclosed. The imaging compositions are sensitive to low levels of energy such that upon application of the low levels of energy the compositions change color or shade. The compositions may be applied to a work piece to mark it and removed from the work piece by peeling.
    Type: Grant
    Filed: July 13, 2005
    Date of Patent: May 29, 2007
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. Barr, Corey O'Connor
  • Publication number: 20070117042
    Abstract: Methods of imaging are disclosed. Imaging compositions which are sensitive to low levels of energy are applied to a work piece. Energy is applied to the imaging compositions to cause a color or shade change such that workers may modify the work piece based on the color or shade change.
    Type: Application
    Filed: November 23, 2005
    Publication date: May 24, 2007
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Robert Barr, Corey O'Connor