Abstract: A material includes a transparent substrate coated with a stack including at least one functional metal layer based on silver and at least two dielectric coatings, each dielectric coating including at least one dielectric layer, in such a way that each functional metal layer is positioned between two dielectric coatings, wherein the stack includes a layer based on silicon oxide having a thickness of greater than or equal to 12 nm located directly in contact with the substrate.

Abstract: A material includes a substrate coated with a stack including at least one silver-based functional metal layer and at least two dielectric coatings, each dielectric coating including at least one dielectric layer, so that each functional metal layer is between two dielectric coatings, wherein the dielectric coating located in contact with the substrate includes a layer including silicon selected from silicon oxynitride or nitride-based layers located in contact with the substrate; a layer based on zinc oxide and tin including at least 20% by mass of tin relative to the total mass of zinc and tin located in contact with the layer including silicon, the sum of thicknesses of all oxide-based layers present in the dielectric coating located between the substrate and the first functional metal layer and/or in each dielectric coating located above the first functional layer is greater than 50% of the total thickness of the dielectric coating.

Abstract: A material includes a transparent substrate coated with a stack including at least one silver-based functional metal layer and at least two dielectric coatings, each dielectric coating including at least one dielectric layer, so that each functional metal layer is placed between two dielectric coatings, wherein the dielectric coating located in contact with the substrate includes an intermediate coating including two different layers containing silicon, the two layers containing silicon consist of different chemical elements or composed of the same elements in different proportions.

Abstract: The purpose of the invention is a process for obtaining a material comprising a substrate at least part of whose surface and at least one of whose faces is based on organic compounds, the said process being implemented at atmospheric pressure comprises moreover the following stages: In the immediate vicinity of the substrate, a zone containing active species of a non-thermal plasma is created; into the said zone is injected at least one precursor of a chemical element so as to deposit upon at least one face of the said substrate (at least part of whose surface comprises an organic compound base), a first thin layer capable of protecting the said substrate against oxidation reactions, specifically those due to radicals. A further purpose of the invention is the material obtainable according to this process.

Abstract: The purpose of the invention is a process for obtaining a material comprising a substrate at least part of whose surface and at least one of whose faces is based on organic compounds, the said process being implemented at atmospheric pressure comprises moreover the following stages: In the immediate vicinity of the said substrate a zone containing active species of a non-thermal plasma is created; into the said zone is injected at least one precursor of a chemical element so as to deposit upon at least one face of the said substrate (at least part of whose surface comprises an organic compound base), a first thin layer capable of protecting the said substrate against oxidation reactions, specifically those due to radicals. A further purpose of the invention is the material obtainable according to this process.

Abstract: Process for depositing, on a substrate, a coating based on titanium oxide, which is characterized in that the coating with photocatalytic properties is deposited by chemical vapor deposition, especially from a gas mixture comprising at least one organometallic precursor and/or a metal halide of said metal oxide, the deposition being enhanced by a plasma source.

Abstract: The purpose of the invention is a process for obtaining a material comprising a substrate at least part of whose surface and at least one of whose faces is based on organic compounds, the said process being implemented at atmospheric pressure comprises moreover the following stages: In the immediate vicinity of the said substrate a zone containing active species of a non-thermal plasma is created; into the said zone is injected at least one precursor of a chemical element so as to deposit upon at least one face of the said substrate (at least part of whose surface comprises an organic compound base), a first thin layer capable of protecting the said substrate against oxidation reactions, specifically those due to radicals. A further purpose of the invention is the material obtainable according to this process.

Abstract: The purpose of the invention is a process for obtaining a material comprising a substrate at least part of whose surface and at least one of whose faces is based on organic compounds, the said process being implemented at atmospheric pressure comprises moreover the following stages. In the immediate vicinity of the said substrate a zone containing active species of a non-thermal plasma is created; into the said zone is injected at least one precursor of a chemical element so as to deposit upon at least one face of the said substrate (at least part of whose surface comprises an organic compound base), a first thin layer capable of protecting the said substrate against oxidation reactions, specifically those due to radicals. A further purpose of the invention is the material obtainable according to this process.

Abstract: The purpose of the invention is a process for obtaining a material comprising a substrate at least part of whose surface and at least one of whose faces is based on organic compounds, the said process being implemented at atmospheric pressure and without heating the entire substrate. The said process comprises moreover the following stages: In the immediate vicinity of the said substrate a zone containing active species of a non-thermal plasma is created. Into the said zone is injected at least one precursor of a chemical element so as to deposit upon at least one face of the said substrate (at least part of whose surface comprises an organic compound base), a first thin layer capable of protecting the said substrate against oxidation reactions, specifically those due to radicals. A further purpose of the invention is the material obtainable according to this process.

Abstract: Process for depositing, on a substrate, a coating based on titanium oxide, which is characterized in that the coating with photocatalytic properties is deposited by chemical vapor deposition, especially from a gas mixture comprising at least one organometallic precursor and/or a metal halide of said metal oxide, the deposition being enhanced by a plasma source.