Patents by Inventor Cornel Bozdog

Cornel Bozdog has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10943907
    Abstract: Integrated circuitry comprising an array comprises a plurality of conductive vias. Individual of the vias comprise an upper horizontal perimeter comprising opposing end portions. One of the opposing end portions comprises opposing straight sidewalls. The other of the opposing end portions comprises opposing curved sidewalls that join with the opposing straight sidewalls of the one opposing end portion. Other embodiments, including methods, are disclosed.
    Type: Grant
    Filed: May 7, 2020
    Date of Patent: March 9, 2021
    Assignee: Micron Technology, Inc.
    Inventors: Cornel Bozdog, Abhilasha Bhardwaj, Byeung Chul Kim, Michael E. Koltonski, Gurtej S. Sandhu, Matthew Thorum
  • Patent number: 10876959
    Abstract: A method and system are presented for use in measuring on patterned samples, aimed at determining asymmetry in the pattern. A set of at least first and second measurements on a patterned region of a sample is performed, where each of the measurements comprises: directing illuminating light onto the patterned region along an illumination channel and collecting light reflected from the illuminated region propagating along a collection channel to be detected, such that detected light from the same patterned region has different polarization states which are different from polarization of the illuminating light, and generating a measured data piece indicative of the light detected in the measurement. Thus, at least first and second measured data pieces are generated for the at least first and second measurements on the same patterned region. The at least first and second measured data pieces are analyzed and output data is generated being indicative of a condition of asymmetry in the patterned region.
    Type: Grant
    Filed: July 23, 2018
    Date of Patent: December 29, 2020
    Assignee: NOVA MEASURING INSTRUMENTS LTD.
    Inventors: Dror Shafir, Gilad Barak, Shay Wolfling, Michal Haim Yachini, Matthew Sendelbach, Cornel Bozdog
  • Publication number: 20200266197
    Abstract: Integrated circuitry comprising an array comprises a plurality of conductive vias. Individual of the vias comprise an upper horizontal perimeter comprising opposing end portions. One of the opposing end portions comprises opposing straight sidewalls. The other of the opposing end portions comprises opposing curved sidewalls that join with the opposing straight sidewalls of the one opposing end portion. Other embodiments, including methods, are disclosed.
    Type: Application
    Filed: May 7, 2020
    Publication date: August 20, 2020
    Applicant: Micron Technology, Inc.
    Inventors: Cornel Bozdog, Abhilasha Bhardwaj, Byeung Chul Kim, Michael E. Koltonski, Gurtej S. Sandhu, Matthew Thorum
  • Patent number: 10707211
    Abstract: Integrated circuitry comprising an array comprises a plurality of conductive vias. Individual of the vias comprise an upper horizontal perimeter comprising opposing end portions. One of the opposing end portions comprises opposing straight sidewalls. The other of the opposing end portions comprises opposing curved sidewalls that join with the opposing straight sidewalls of the one opposing end portion. Other embodiments, including methods, are disclosed.
    Type: Grant
    Filed: September 24, 2018
    Date of Patent: July 7, 2020
    Assignee: Micron Technology, Inc.
    Inventors: Cornel Bozdog, Abhilasha Bhardwaj, Byeung Chul Kim, Michael E. Koltonski, Gurtej S. Sandhu, Matthew Thorum
  • Publication number: 20200191734
    Abstract: Determining a property of a layer of an integrated circuit (IC), the layer being formed over an underlayer, is implemented by performing the steps of: irradiating the IC to thereby eject electrons from the IC; collecting electrons emitted from the IC and determining the kinetic energy of the emitted electrons to thereby calculate emission intensity of electrons emitted from the layer and electrons emitted from the underlayer calculating a ratio of the emission intensity of electrons emitted from the layer and electrons emitted from the underlayer; and using the ratio to determine material composition or thickness of the layer. The steps of irradiating IC and collecting electrons may be performed using x-ray photoelectron spectroscopy (XPS) or x-ray fluorescence spectroscopy (XRF).
    Type: Application
    Filed: January 13, 2020
    Publication date: June 18, 2020
    Inventors: Wei Ti Lee, Heath Pois, Mark Klare, Cornel Bozdog
  • Publication number: 20200098761
    Abstract: Integrated circuitry comprising an array comprises a plurality of conductive vias. Individual of the vias comprise an upper horizontal perimeter comprising opposing end portions. One of the opposing end portions comprises opposing straight sidewalls. The other of the opposing end portions comprises opposing curved sidewalls that join with the opposing straight sidewalls of the one opposing end portion. Other embodiments, including methods, are disclosed.
    Type: Application
    Filed: September 24, 2018
    Publication date: March 26, 2020
    Applicant: Micron Technology, Inc.
    Inventors: Cornel Bozdog, Abhilasha Bhardwaj, Byeung Chul Kim, Michael E. Koltonski, Gurtej S. Sandhu, Matthew Thorum
  • Patent number: 10534275
    Abstract: A method and system are presented for use in controlling a multiple patterning process of n patterning stages subsequently applied to a sample to produce a target pattern thereon. The method comprises: providing intermediate measured data indicative of an optical response of the sample after being patterned by m-th patterning stage, 1?m<n; processing said intermediate measured data, determining at least a location parameter of a predetermined feature of the pattern, and generating measured data indicative of said at least one selected parameter; utilizing said at least location parameter of the predetermined feature for optimizing a data interpretation model for interpretation of measured data indicative of an optical response from the sample being patterned by k-th subsequent patterning stage, m<k?n.
    Type: Grant
    Filed: June 22, 2016
    Date of Patent: January 14, 2020
    Assignee: NOVA MEASURING INSTRUMENTS LTD.
    Inventors: Cornel Bozdog, Aron Cepler, Paul Isbester
  • Patent number: 10533961
    Abstract: Determining a property of a layer of an integrated circuit (IC), the layer being formed over an underlayer, is implemented by performing the steps of: irradiating the IC to thereby eject electrons from the IC; collecting electrons emitted from the IC and determining the kinetic energy of the emitted electrons to thereby calculate emission intensity of electrons emitted from the layer and electrons emitted from the underlayer calculating a ratio of the emission intensity of electrons emitted from the layer and electrons emitted from the underlayer; and using the ratio to determine material composition or thickness of the layer. The steps of irradiating IC and collecting electrons may be performed using x-ray photoelectron spectroscopy (XPS) or x-ray fluorescence spectroscopy (XRF).
    Type: Grant
    Filed: November 2, 2016
    Date of Patent: January 14, 2020
    Assignee: NOVA MEASURING INSTRUMENTS, INC.
    Inventors: Wei Ti Lee, Heath Pois, Mark Klare, Cornel Bozdog
  • Patent number: 10302414
    Abstract: A method and system are presented for use in model-based optical measurements in patterned structures. The method comprises: selecting an optimal optical model for interpretation of optical measured data indicative of optical response of the structure under measurements. The selection of the optimal optical model comprises: creating a complete optical model with floating parameters defining multiple configurations of said complete model including one or more model configurations describing an optical response of the structure under measurements, utilizing the complete model for predicting a reference optical response from the structure and generating corresponding virtual reference data, and using the virtual reference data for selecting the optimal optical model for interpretation of the optical measured data.
    Type: Grant
    Filed: September 14, 2015
    Date of Patent: May 28, 2019
    Assignees: NOVA MEASURING INSTRUMENTS LTD., GLOBALFOUNDRIES INC.
    Inventors: Gilad Wainreb, Etai Littwin, Alok Vaid, Michael Klots, Cornel Bozdog, Matthew Sendelbach
  • Patent number: 10209206
    Abstract: A control system is presented for use in measuring one or more parameters of a sample. The control system comprises an input utility and a processor utility. The input utility is configured for receiving input data including first data comprising X-ray Diffraction or High-Resolution X-ray Diffraction (XRD) response data of the sample indicative of a material distribution in the sample, and second data comprising optical response data of the sample to incident light indicative of at least a geometry of the sample. The processor utility is configured and operable for processing and analyzing one of the first and second data for optimizing the other one of the first and second data, and utilizing the optimized data for determining said one or more parameters of the sample including a strain distribution in the sample.
    Type: Grant
    Filed: July 8, 2014
    Date of Patent: February 19, 2019
    Assignee: NOVA MEASURING INSTRUMENTS LTD.
    Inventors: Gilad Barak, Shay Wolfling, Cornel Bozdog, Matthew Sendelbach
  • Patent number: 10197506
    Abstract: A method and system are presented for use in controlling a process applied to a patterned structure having regions of different layered stacks. The method comprises: sequentially receiving measured data indicative of optical response of the structure being processed during a predetermined processing time, and generating a corresponding sequence of data pieces measured over time; and analyzing and processing the sequence of the data pieces and determining at least one main parameter of the structure.
    Type: Grant
    Filed: March 8, 2018
    Date of Patent: February 5, 2019
    Assignee: NOVA MEASURING INSTRUMENTS LTD.
    Inventors: Igor Turovets, Cornel Bozdog, Dario Elyasi
  • Publication number: 20180328871
    Abstract: Determining a property of a layer of an integrated circuit (IC), the layer being formed over an underlayer, is implemented by performing the steps of: irradiating the IC to thereby eject electrons from the IC; collecting electrons emitted from the IC and determining the kinetic energy of the emitted electrons to thereby calculate emission intensity of electrons emitted from the layer and electrons emitted from the underlayer calculating a ratio of the emission intensity of electrons emitted from the layer and electrons emitted from the underlayer; and using the ratio to determine material composition or thickness of the layer. The steps of irradiating IC and collecting electrons may be performed using x-ray photoelectron spectroscopy (XPS) or x-ray fluorescence spectroscopy (XRF).
    Type: Application
    Filed: November 2, 2016
    Publication date: November 15, 2018
    Inventors: Wei Ti Lee, Heath Pois, Mark Klare, Cornel Bozdog
  • Publication number: 20180328837
    Abstract: A method and system are presented for use in measuring on patterned samples, aimed at determining asymmetry in the pattern. A set of at least first and second measurements on a patterned region of a sample is performed, where each of the measurements comprises: directing illuminating light onto the patterned region along an illumination channel and collecting light reflected from the illuminated region propagating along a collection channel to be detected, such that detected light from the same patterned region has different polarization states which are different from polarization of the illuminating light, and generating a measured data piece indicative of the light detected in the measurement. Thus, at least first and second measured data pieces are generated for the at least first and second measurements on the same patterned region. The at least first and second measured data pieces are analyzed and output data is generated being indicative of a condition of asymmetry in the patterned region.
    Type: Application
    Filed: July 23, 2018
    Publication date: November 15, 2018
    Inventors: Dror SHAFIR, Gilad BARAK, Shay WOLFLING, Michal Haim YACHINI, Matthew SENDELBACH, Cornel BOZDOG
  • Patent number: 10030971
    Abstract: A measurement method and system are presented for in-line measurements of one or more parameters of thin films in structures progressing on a production line. First measured data and second measured data are provided from multiple measurements sites on the thin film being measured, wherein the first measured data corresponds to first type measurements from a first selected set of a relatively small number of the measurement sites, and the second measured data corresponds to second type optical measurements from a second set of significantly higher number of the measurements sites. The first measured data is processed for determining at least one value of at least one parameter of the thin film in each of the measurement sites of said first set. Such at least one parameter value is utilized for interpreting the second measured data, thereby obtaining data indicative of distribution of values of said at least one parameter within said second set of measurement sites.
    Type: Grant
    Filed: August 4, 2016
    Date of Patent: July 24, 2018
    Assignees: Globalfoundries, Inc., Nova Measuring Instruments Ltd.
    Inventors: Cornel Bozdog, Alok Vaid, Sridhar Mahendrakar, Mainul Hossain, Taher Kagalwala
  • Publication number: 20180195975
    Abstract: A method and system are presented for use in controlling a process applied to a patterned structure having regions of different layered stacks. The method comprises: sequentially receiving measured data indicative of optical response of the structure being processed during a predetermined processing time, and generating a corresponding sequence of data pieces measured over time; and analyzing and processing the sequence of the data pieces and determining at least one main parameter of the structure.
    Type: Application
    Filed: March 8, 2018
    Publication date: July 12, 2018
    Inventors: Igor TUROVETS, Cornel BOZDOG, Dario ELYASI
  • Publication number: 20180196356
    Abstract: A method and system are presented for use in controlling a multiple patterning process of n patterning stages subsequently applied to a sample to produce a target pattern thereon. The method comprises: providing intermediate measured data indicative of an optical response of the sample after being patterned by m-th patterning stage, 1?m<n; processing said intermediate measured data, determining at least a location parameter of a predetermined feature of the pattern, and generating measured data indicative of said at least one selected parameter; utilizing said at least location parameter of the predetermined feature for optimizing a data interpretation model for interpretation of measured data indicative of an optical response from the sample being patterned by k-th subsequent patterning stage, m<k?n.
    Type: Application
    Filed: June 22, 2016
    Publication date: July 12, 2018
    Inventors: Cornel BOZDOG, Aron CEPLER, Paul ISBESTER
  • Publication number: 20180172609
    Abstract: A monitoring system and method are provided for determining at least one property of an integrated circuit (IC) comprising a multi-layer structure formed by at least a layer on top of an underlayer. The monitoring system receives measured data comprising data indicative of optical measurements performed on the IC, data indicative of x-ray photoelectron spectroscopy (XPS) measurements performed on the IC and data indicative of x-ray fluorescence spectroscopy (XRF) measurements performed on the IC. An optical data analyzer module analyzes the data indicative of the optical measurements and generates geometrical data indicative of one or more geometrical parameters of the multi-layer structure formed by at least the layer on top of the underlayer.
    Type: Application
    Filed: December 18, 2017
    Publication date: June 21, 2018
    Inventors: Wei Ti LEE, Heath A. POIS, Mark KLARE, Cornel BOZDOG, Alok VAID
  • Patent number: 9915624
    Abstract: A method and system are presented for use in controlling a process applied to a patterned structure having regions of different layered stacks. The method comprises: sequentially receiving measured data indicative of optical response of the structure being processed during a predetermined processing time, and generating a corresponding sequence of data pieces measured over time; and analyzing and processing the sequence of the data pieces and determining at least one main parameter of the structure.
    Type: Grant
    Filed: December 20, 2016
    Date of Patent: March 13, 2018
    Assignee: NOVA MEASURING INSTRUMENTS, LTD.
    Inventors: Igor Turovets, Cornel Bozdog, Dario Elyasi
  • Publication number: 20170167987
    Abstract: A method and system are presented for use in controlling a process applied to a patterned structure having regions of different layered stacks. The method comprises: sequentially receiving measured data indicative of optical response of the structure being processed during a predetermined processing time, and generating a corresponding sequence of data pieces measured over time; and analyzing and processing the sequence of the data pieces and determining at least one main parameter of the structure.
    Type: Application
    Filed: December 20, 2016
    Publication date: June 15, 2017
    Inventors: Igor TUROVETS, Cornel BOZDOG, Dario ELYASI
  • Publication number: 20170038201
    Abstract: A measurement method and system are presented for in-line measurements of one or more parameters of thin films in structures progressing on a production line. First measured data and second measured data are provided from multiple measurements sites on the thin film being measured, wherein the first measured data corresponds to first type measurements from a first selected set of a relatively small number of the measurement sites, and the second measured data corresponds to second type optical measurements from a second set of significantly higher number of the measurements sites. The first measured data is processed for determining at least one value of at least one parameter of the thin film in each of the measurement sites of said first set. Such at least one parameter value is utilized for interpreting the second measured data, thereby obtaining data indicative of distribution of values of said at least one parameter within said second set of measurement sites.
    Type: Application
    Filed: August 4, 2016
    Publication date: February 9, 2017
    Inventors: Cornel Bozdog, Alok Vaid, Sridhar Mahendrakar, Mainul Hossain, Taher Kagalwala