Patents by Inventor Cornelis J. van der Laan

Cornelis J. van der Laan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Optical correction plate, and its application in a lithographic projection apparatus
    Patent number: 6542219
    Abstract: A plate with substantially constant thickness is used to compensate for the residual distortion in the image projected by a high-quality projection lens for lithography. The two surfaces of the plate have an identical aspherical profile, whose shape has been calculated using the measured distortion map of the lithographic objective. The figuring process applied to the plate uses the principle of polishing in the presence of an elastic deformation, so as to achieve the desired aspherical shape on both sides.
    Type: Grant
    Filed: March 15, 2002
    Date of Patent: April 1, 2003
    Assignee: ASML Netherlands B.V.
    Inventors: Josephus J. M. Braat, Cornelis J. van der Laan
  • Optical correction plate, and its application in a lithographic projection apparatus
    Publication number: 20020126266
    Abstract: A plate with substantially constant thickness is used to compensate for the residual distortion in the image projected by a high-quality projection lens for lithography. The two surfaces of the plate have an identical aspherical profile, whose shape has been calculated using the measured distortion map of the lithographic objective. The figuring process applied to the plate uses the principle of polishing in the presence of an elastic deformation, so as to achieve the desired aspherical shape on both sides.
    Type: Application
    Filed: March 15, 2002
    Publication date: September 12, 2002
    Applicant: ASM Lithography B.V.
    Inventors: Josephus J.M. Braat, Cornelis J. van der Laan
  • Optical correction plate, and its application in a lithographic projection apparatus
    Patent number: 6373552
    Abstract: A plate with substantially constant thickness is used to compensate for the residual distortion in the image projected by a high-quality projection lens for lithography. The two surfaces of the plate have an identical aspherical profile, whose shape has been calculated using the measured distortion map of the lithographic objective. The figuring process applied to the plate uses the principle of polishing in the presence of an elastic deformation, so as to achieve the desired aspherical shape on both sides.
    Type: Grant
    Filed: January 18, 2000
    Date of Patent: April 16, 2002
    Assignee: ASM Lithography B.V.
    Inventors: Josephus J. M. Braat, Cornelis J. van der Laan