Patents by Inventor Cornelis Lambertus Maria VAN WEERT

Cornelis Lambertus Maria VAN WEERT has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and method of irradiating at least two target portions
    Patent number: 8436984
    Abstract: A lithographic apparatus is disclosed that includes a table, at least two target portions on the table or on an object on the table, and a surface material between the at least two target portions. The apparatus further includes an optical system configured to project a beam of radiation, along an optical path towards the table, with a cross-section to irradiate the at least two target portions at the same time. The apparatus further includes a shield moveable into the optical path to restrict the cross-section of the beam of radiation to restrict illumination between the at least two target portions, wherein the surface material between the at least two target portions would degrade when irradiated with radiation from the optical system.
    Type: Grant
    Filed: December 16, 2009
    Date of Patent: May 7, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Cornelis Lambertus Maria Van Weert, Marcus Adrianus Van De Kerkhof, Bearrach Moest
  • LITHOGRAPHIC APPARATUS AND METHOD OF IRRADIATING AT LEAST TWO TARGET PORTIONS
    Publication number: 20100157271
    Abstract: A lithographic apparatus is disclosed that includes a table, at least two target portions on the table or on an object on the table, and a surface material between the at least two target portions. The apparatus further includes an optical system configured to project a beam of radiation, along an optical path towards the table, with a cross-section to irradiate the at least two target portions at the same time. The apparatus further includes a shield moveable into the optical path to restrict the cross-section of the beam of radiation to restrict illumination between the at least two target portions, wherein the surface material between the at least two target portions would degrade when irradiated with radiation from the optical system.
    Type: Application
    Filed: December 16, 2009
    Publication date: June 24, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Cornelis Lambertus Maria VAN WEERT, Marcus Adrianus Van De Kerkhof, Bearrach Moest