Patents by Inventor Cornelis Petrus Andreas Maria Luijkx

Cornelis Petrus Andreas Maria Luijkx has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus, radiation system, contaminant trap, device manufacturing method, and method for trapping contaminants in a contaminant trap
    Patent number: 7307263
    Abstract: A lithographic apparatus includes a radiation system that includes a source for producing a radiation beam, a contaminant trap arranged in a path of the radiation beam, and an illumination system configured to condition the radiation beam produced by the source, and a support for supporting a patterning device. The patterning device serves to impart the conditioned radiation beam with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, and a projection system for projecting the patterned radiation beam onto a target portion of the substrate. The contaminant trap includes a plurality of foils that define channels that are arranged substantially parallel to the direction of propagation of the radiation beam. The trap is provided with a gas supply system that is arranged to inject gas into at least one of the channels of the trap.
    Type: Grant
    Filed: July 14, 2004
    Date of Patent: December 11, 2007
    Assignee: ASML Netherlands B.V.
    Inventors: Levinus Pieter Bakker, Vadim Yevgenyevich Banine, Cornelis Petrus Andreas Maria Luijkx, Frank Jeroen Pieter Schuurmans