Patents by Inventor Cornelius Antonius Van Den Huevel

Cornelius Antonius Van Den Huevel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Capacitive micro-machined transducer and method of manufacturing the same
    Patent number: 9607606
    Abstract: The present invention relates to a method of manufacturing a capacitive micro-machined transducer (100), in particular a CMUT, the method comprising depositing a first electrode layer (10) on a substrate (1), depositing a first dielectric film (20) on the first electrode layer (10), depositing a sacrificial layer (30) on the first dielectric film (20), the sacrificial layer (30) being removable for forming a cavity (35) of the transducer, depositing a second dielectric film (40) on the sacrificial layer (30), depositing a second electrode layer (50) on the second dielectric film (40), and patterning at least one of the deposited layers and films (10, 20, 30, 40, 50), wherein the depositing steps are performed by Atomic Layer Deposition. The present invention further relates to a capacitive micro-machined transducer (100), in particular a CMUT, manufactured by such method.
    Type: Grant
    Filed: November 6, 2013
    Date of Patent: March 28, 2017
    Assignee: KONINKIJKE PHILIPS N.V.
    Inventors: Johan Hendrik Klootwijk, Marcel Mulder, Nico Maris Adriaan De Wild, Koray Karakaya, Cornelius Antonius Van Den Huevel
  • CAPACITIVE MICRO-MACHINED TRANSDUCER AND METHOD OF MANUFACTURING THE SAME
    Publication number: 20150294663
    Abstract: The present invention relates to a method of manufacturing a capacitive micro-machined transducer (100), in particular a CMUT, the method comprising depositing a first electrode layer (10) on a substrate (1), depositing a first dielectric film (20) on the first electrode layer (10), depositing a sacrificial layer (30) on the first dielectric film (20), the sacrificial layer (30) being removable for forming a cavity (35) of the transducer, depositing a second dielectric film (40) on the sacrificial layer (30), depositing a second electrode layer (50) on the second dielectric film (40), and patterning at least one of the deposited layers and films (10, 20, 30, 40, 50), wherein the depositing steps are performed by Atomic Layer Deposition. The present invention further relates to a capacitive micro-machined transducer (100), in particular a CMUT, manufactured by such method.
    Type: Application
    Filed: November 6, 2013
    Publication date: October 15, 2015
    Inventors: Johan Hendrik Klootwijk, Marcel Mulder, Nico Maris Adriaan De Wild, Koray Karakaya, Cornelius Antonius Van Den Huevel