Abstract: A system can include multiple WiFi-enabled commercial off the shelf (COTS) Internet of Things (IoT) devices disposed within an environment and configured to be a transmitter (TX) or a received (RX) to send or receive data over a WiFi radio frequency communication link. A server can be configured to receive and parse the CSI data transmitted from the RX, store the CSI data with a corresponding human identity label collected for training, train a human identification classifier using a Convex Clustered Concurrent Shapelet Learning (C3SL) method, and estimate an identification of a user based on the CSI data and the C3SL method.

Abstract: An Internet of Things (IoT) device can include a switch module configured to control a power supply for at least one powered device, a WiFi module configured to perform wireless communication and occupancy activity sensing, and a processor configured to determine human activity recognition WiFi measurements from the WiFi module based on the occupancy activity sensing and generate corresponding commands for the switch module based on the determined human activity recognition WiFi measurements.

Abstract: A mobile device and user association system can include wireless routers to execute software for capturing data including received signal strength (RSS) values and media access controller (MAC) addresses for a number of mobile devices (MDs) from existing wireless fidelity (WiFi) traffic. The system can also include a server to receive the RSS values and MAC addresses of the MDs to estimate a location of each MD and generate historical location data of each MD, identify and filter out temporary MDs, classify each non-temporary MDs as either a static device (SD) or a mobile phone (MP), and associate a user with each SD and MP.

Abstract: One aspect of the present invention is a method of monitoring processes, optimizing processes, and diagnosing problems in the performance of a process tool for processing a workpiece. Another aspect of the present invention is a system configured for monitoring processes, optimizing processes, and diagnosing problems in the performance of a process tool for processing a workpiece. One embodiment of the present invention includes a software program that can be implemented in a computer for optimizing the performance of a process tool for processing a workpiece.

Abstract: A sensor apparatus for measuring a plasma process parameter for processing a workpiece. The sensor apparatus includes a base, an information processor supported on or in the base, and at least one sensor supported on or in the base. The at least one sensor includes at least one sensing element configured for measuring an electrical property of a plasma and at least one transducer coupled to the at least one sensing element. The transducer is configured so as to receive a signal from the sensing element and converting the signal into a second signal for input to the information processor.

Abstract: Presented are methods, systems, and apparatuses for managing and maintaining an electronic device such as a sensor apparatus.

Abstract: Presented are methods and apparatus for controlling the processing of a substrate during a process step that is sensitive to one or more process conditions. One embodiment includes a method performed with corresponding apparatus that includes a controller. One step includes constructing a perturbation model relating changes in control parameters for the apparatus to one or more resulting changes in the process. The method also includes the step of using the perturbation model with at least one of a performance objective and a constraint to derive optimized control parameters for the controller. Another step in the method includes operating the controller with the optimized control parameters. Another embodiment includes an apparatus for processing substrates where the apparatus comprises optimized control parameters.

Abstract: This invention seeks to provide methods and apparatus that can improve the accuracy of measured parameter data used for processing workpieces. One aspect of the present invention includes methods of measuring process conditions with low distortion of the measurements caused by the measuring apparatus. The measurements include data for applications such as data for monitoring, controlling, and optimizing processes and process tools. Another aspect of the present invention includes apparatus for measuring substantially correct data for applications such as generating data for monitoring, controlling, and optimizing processes and process tools.

Abstract: Described are methods and apparatus for a sensor apparatus for collecting measured parameter data for such applications as deriving response models and information required for developing and maintaining processes and process tools.