Patents by Inventor Costel Biloiu
Costel Biloiu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240128052Abstract: An antenna assembly, comprising: an antenna; a dielectric enclosure surrounding the antenna; and a Faraday shield, disposed around the antenna, and arranged between the antenna and the dielectric enclosure, wherein the Faraday shield comprises a non-uniform opacity along an antenna axis of the antenna, wherein a first opacity of the Faraday shield at a first position along the antenna axis is greater than a second opacity of the Faraday shield at a second position along the antenna axis of the antenna.Type: ApplicationFiled: October 12, 2022Publication date: April 18, 2024Applicant: Applied Materials, Inc.Inventors: Costel Biloiu, Adam Calkins, Benjamin Alexandrovich, Solomon Belangedi Basame, Kevin M. Daniels
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Patent number: 11948781Abstract: A processing system may include a plasma chamber operable to generate a plasma, and an extraction assembly, arranged along a side of the plasma chamber. The extraction assembly may include an extraction plate including an extraction aperture, the extraction plate having a non-planar shape, and generating an extracted ion beam at a high angle of incidence with respect to a perpendicular to a plane of a substrate, when the plane of the substrate is arranged parallel to the side of the plasma chamber.Type: GrantFiled: January 27, 2021Date of Patent: April 2, 2024Assignee: Applied Materials, Inc.Inventors: Christopher Campbell, Costel Biloiu, Peter F. Kurunczi, Jay R. Wallace, Kevin M. Daniels, Kevin T. Ryan, Minab B. Teferi, Frank Sinclair, Joseph C. Olson
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Publication number: 20240032183Abstract: An exciter for a high frequency resonator. The exciter may include an exciter coil inner portion, extending along an exciter axis, an exciter coil loop, disposed at a distal end of the exciter coil inner portion. The exciter may also include a drive mechanism, including at least a rotation component to rotate the exciter coil loop around the exciter axis.Type: ApplicationFiled: September 26, 2023Publication date: January 25, 2024Applicant: Applied Materials, Inc.Inventors: Costel BILOIU, David T. BLAHNIK, Wai-Ming TAM, Charles T. CARLSON, Frank SINCLAIR
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Patent number: 11818830Abstract: An apparatus may include a drift tube assembly, the drift tube assembly defining a triple gap configuration, and arranged to accelerate and transmit an ion beam along abeam path. The apparatus may include a resonator, to output an RF signal to the drift tube assembly, and an RF quadrupole triplet, connected to the drift tube assembly, and arranged circumferentially around the beam path.Type: GrantFiled: January 29, 2021Date of Patent: November 14, 2023Assignee: Applied Materials, Inc.Inventors: Frank Sinclair, Wai-Ming Tam, Costel Biloiu, William Davis Lee
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Patent number: 11812539Abstract: An exciter for a high frequency resonator. The exciter may include an exciter coil inner portion, extending along an exciter axis, an exciter coil loop, disposed at a distal end of the exciter coil inner portion. The exciter may also include a drive mechanism, including at least a rotation component to rotate the exciter coil loop around the exciter axis.Type: GrantFiled: October 20, 2021Date of Patent: November 7, 2023Assignee: Applied Materials, Inc.Inventors: Costel Biloiu, David T. Blahnik, Wai-Ming Tam, Charles T. Carlson, Frank Sinclair
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Patent number: 11710617Abstract: Embodiments herein are directed to a resonator for an ion implanter. In some embodiments, a resonator may include a housing, and a first coil and a second coil partially disposed within the housing. Each of the first and second coils may include a first end including an opening for receiving an ion beam, and a central section extending helically about a central axis, wherein the central axis is parallel to a beamline of the ion beam, and wherein an inner side of the central section has a flattened surface.Type: GrantFiled: July 16, 2021Date of Patent: July 25, 2023Assignee: APPLIED Materials, Inc.Inventors: Costel Biloiu, Michael Honan, Robert B. Vopat, David Blahnik, Charles T. Carlson, Frank Sinclair, Paul Murphy
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Publication number: 20230124350Abstract: An exciter for a high frequency resonator. The exciter may include an exciter coil inner portion, extending along an exciter axis, an exciter coil loop, disposed at a distal end of the exciter coil inner portion. The exciter may also include a drive mechanism, including at least a rotation component to rotate the exciter coil loop around the exciter axis.Type: ApplicationFiled: October 20, 2021Publication date: April 20, 2023Applicant: Applied Materials, Inc.Inventors: Costel Biloiu, David T. Blahnik, Wai-Ming Tam, Charles T. Carlson, Frank Sinclair
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Publication number: 20230124509Abstract: An extraction assembly may include an extraction plate for placement along a side of a plasma chamber, and having an extraction aperture, elongated along a first direction, and having an aperture height, extending along a second direction, perpendicular to the first direction. The extraction plate defines an inner surface along the extraction aperture, lying in a first plane. A beam blocker is disposed over the extraction aperture, and has an outer surface, disposed in a second plane, different than the first plane. As such, the beam blocker overlaps with the extraction plate along a first edge of the extraction aperture by a first overlap distance, and overlaps with the extraction plate along a second edge of the extraction aperture by a second overlap distance, so as to define a first extraction slit, along the first edge, and a second extraction slit along the second edge.Type: ApplicationFiled: October 17, 2021Publication date: April 20, 2023Applicant: Applied Materials, Inc.Inventors: Costel Biloiu, Jay R. Wallace, Solomon Belangedi Basame, Kevin R. Anglin, Tyler Rockwell
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Patent number: 11596051Abstract: An apparatus may include a drift tube assembly, arranged to transmit an ion beam. The drift tube assembly may include a first ground electrode; an RF drift tube assembly, disposed downstream of the first ground electrode; and a second ground electrode, disposed downstream of the RF drift tube assembly. The RF drift tube assembly may define a triple gap configuration. The apparatus may include a resonator, where the resonator comprises a toroidal coil, having a first end, connected to a first RF drift tube of the RF drift tube assembly, and a second end, connected to a second RF drift tube of the RF drift tube assembly.Type: GrantFiled: December 1, 2020Date of Patent: February 28, 2023Assignee: Applied Materials, Inc.Inventors: Costel Biloiu, Charles T. Carlson, Frank Sinclair, Paul J. Murphy, David T. Blahnik
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Patent number: 11574800Abstract: A workpiece processing apparatus allowing independent control of the voltage applied to the shield ring and the workpiece is disclosed. The workpiece processing apparatus includes a platen. The platen includes a dielectric material on which a workpiece is disposed. A bias electrode is disposed beneath the dielectric material. A shield ring, which is constructed from a metal, ceramic, semiconductor or dielectric material, is arranged around the perimeter of the workpiece. A ring electrode is disposed beneath the shield ring. The ring electrode and the bias electrode may be separately powered. This allows the surface voltage of the shield ring to match that of the workpiece, which causes the plasma sheath to be flat. Additionally, the voltage applied to the shield ring may be made different from that of the workpiece to compensate for mismatches in geometries. This improves uniformity of incident angles along the outer edge of the workpiece.Type: GrantFiled: April 17, 2020Date of Patent: February 7, 2023Assignee: Varian Semiconductor Equipment Associates, Inc.Inventors: Alexandre Likhanskii, Maureen Petterson, John Hautala, Anthony Renau, Christopher A. Rowland, Costel Biloiu
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Patent number: 11495430Abstract: An ion beam processing system including a plasma chamber, a plasma plate, disposed alongside the plasma chamber, the plasma plate defining a first extraction aperture, a beam blocker, disposed within the plasma chamber and facing the extraction aperture, a blocker electrode, disposed on a surface of the beam blocker outside of the plasma chamber, and an extraction electrode disposed on a surface of the plasma plate outside of the plasma chamber.Type: GrantFiled: July 15, 2020Date of Patent: November 8, 2022Assignee: Applied Materials, Inc.Inventors: Jay R. Wallace, Costel Biloiu, Kevin M. Daniels
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Patent number: 11424112Abstract: Embodiments herein include a transparent halo assembly for reducing an amount of sputtered material to minimize particle defects impacting a workpiece. In some embodiments, a halo assembly may include a first halo arranged around a semiconductor workpiece, and a mounting assembly coupling the first halo to a roplat. The first halo may include a first side opposite a second side, and a first end opposite a second end, wherein the first side is operable to receive an ion beam from an ion source. The first halo may further include a plurality of apertures extending between the first and second sides, wherein the plurality of apertures permit passage of a portion of the ion beam to pass therethrough, towards the mounting assembly. In some embodiments, the halo assembly may include a second halo positioned proximate the first halo, and a third halo disposed between the first halo and the mounting assembly.Type: GrantFiled: November 3, 2017Date of Patent: August 23, 2022Assignee: Varian Semiconductor Equipment Associates, Inc.Inventors: Ernest E. Allen, Costel Biloiu, Daniel McGillicuddy
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Publication number: 20220248523Abstract: An apparatus may include a drift tube assembly, the drift tube assembly defining a triple gap configuration, and arranged to accelerate and transmit an ion beam along abeam path. The apparatus may include a resonator, to output an RF signal to the drift tube assembly, and an RF quadrupole triplet, connected to the drift tube assembly, and arranged circumferentially around the beam path.Type: ApplicationFiled: January 29, 2021Publication date: August 4, 2022Applicant: Applied Materials, Inc.Inventors: Frank Sinclair, Wai-Ming Tam, Costel Biloiu, William Davis Lee
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Patent number: 11361935Abstract: An extraction plate for an ion beam system. The extraction plate may include an insulator body that includes a peripheral portion, to connect to a first side of a plasma chamber, and further includes a central portion, defining a concave shape. As such, an extraction aperture may be arranged along a first surface of the central portion, where the first surface is oriented at a high angle with respect to the first side. The extraction plate may further include a patterned electrode, comprising a first portion and a second portion, affixed to an outer side of the insulator body, facing away from the plasma chamber, wherein the first portion is separated from the second portion by an insulating gap.Type: GrantFiled: November 7, 2020Date of Patent: June 14, 2022Assignee: Applied Materials, Inc.Inventors: Costel Biloiu, Jay R. Wallace, Kevin M. Daniels, Frank Sinclair, Christopher Campbell
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Publication number: 20220174810Abstract: An apparatus may include a drift tube assembly, arranged to transmit an ion beam. The drift tube assembly may include a first ground electrode; an RF drift tube assembly, disposed downstream of the first ground electrode; and a second ground electrode, disposed downstream of the RF drift tube assembly. The RF drift tube assembly may define a triple gap configuration. The apparatus may include a resonator, where the resonator comprises a toroidal coil, having a first end, connected to a first RF drift tube of the RF drift tube assembly, and a second end, connected to a second RF drift tube of the RF drift tube assembly.Type: ApplicationFiled: December 1, 2020Publication date: June 2, 2022Applicant: Applied Materials, Inc.Inventors: Costel Biloiu, Charles T. Carlson, Frank Sinclair, Paul J. Murphy, David T. Blahnik
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Publication number: 20220148843Abstract: An extraction plate for an ion beam system. The extraction plate may include an insulator body that includes a peripheral portion, to connect to a first side of a plasma chamber, and further includes a central portion, defining a concave shape. As such, an extraction aperture may be arranged along a first surface of the central portion, where the first surface is oriented at a high angle with respect to the first side. The extraction plate may further include a patterned electrode, comprising a first portion and a second portion, affixed to an outer side of the insulator body, facing away from the plasma chamber, wherein the first portion is separated from the second portion by an insulating gap.Type: ApplicationFiled: November 7, 2020Publication date: May 12, 2022Applicant: Applied Materials, Inc.Inventors: Costel Biloiu, Jay R. Wallace, Kevin M. Daniels, Frank Sinclair, Christopher Campbell
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Patent number: 11270864Abstract: Disclosed herein are approaches for adjusting extraction slits of an extraction plate using a set of adjustable beam blockers. In one approach, an ion extraction optics may include an extraction plate including a first opening and a second opening, and a first beam blocker extending over the first opening and a second beam blocker extending over the second opening. Each of the first and second beam blockers may include an inner slit defined by a first distance between an inner edge and the extraction plate, and an outer slit defined by a second distance between an outer edge and the extraction plate, wherein the first and second beam blockers are movable to vary at least one of the first distance and the second distance. As a result, extraction through the inner and outer slits of ion beamlets characterized by similar mean angles may be achieved.Type: GrantFiled: March 24, 2020Date of Patent: March 8, 2022Assignee: Applied Materials, Inc.Inventors: Costel Biloiu, Adam Calkins, Alexander C. Kontos, James J. Howarth
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Publication number: 20220020557Abstract: An ion beam processing system including a plasma chamber, a plasma plate, disposed alongside the plasma chamber, the plasma plate defining a first extraction aperture, a beam blocker, disposed within the plasma chamber and facing the extraction aperture, a blocker electrode, disposed on a surface of the beam blocker outside of the plasma chamber, and an extraction electrode disposed on a surface of the plasma plate outside of the plasma chamber.Type: ApplicationFiled: July 15, 2020Publication date: January 20, 2022Applicant: Applied Materials, Inc.Inventors: Jay R. Wallace, Costel Biloiu, Kevin M. Daniels
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Patent number: 11226439Abstract: Optical grating components and methods of forming are provided. In some embodiments, a method includes providing a substrate, and etching a plurality of trenches into the substrate to form an optical grating. The optical grating may include a plurality of angled trenches, wherein a depth of a first trench of the plurality of trenches varies between at least one of the following: a first lengthwise end of the first trench and a second lengthwise end of the first trench, and between a first side of the first trench and a second side of the first trench.Type: GrantFiled: December 20, 2018Date of Patent: January 18, 2022Assignee: APPLIED Materials, Inc.Inventors: Joseph C. Olson, Ludovic Godet, Costel Biloiu
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Publication number: 20210391155Abstract: A processing system may include a plasma chamber operable to generate a plasma, and an extraction assembly, arranged along a side of the plasma chamber. The extraction assembly may include an extraction plate including an extraction aperture, the extraction plate having a non-planar shape, and generating an extracted ion beam at a high angle of incidence with respect to a perpendicular to a plane of a substrate, when the plane of the substrate is arranged parallel to the side of the plasma chamber.Type: ApplicationFiled: January 27, 2021Publication date: December 16, 2021Applicant: Applied Materials, Inc.Inventors: Christopher Campbell, Costel Biloiu, Peter F. Kurunczi, Jay R. Wallace, Kevin M. Daniels, Kevin T. Ryan, Minab B. Teferi, Frank Sinclair, Joseph C. Olson