Patents by Inventor Craig B. Hickson

Craig B. Hickson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • High temperature ALD inlet manifold
    Patent number: 8372201
    Abstract: A system and method for distributing one or more gases to an atomic layer deposition (ALD) reactor. An integrated inlet manifold block mounted over a showerhead assembly includes high temperature (up to 200° C.) rated valves mounted directly thereto, and short, easily purged reactant lines. Integral passageways and metal seals avoid o-rings and attendant dead zones along flow paths. The manifold includes an internal inert gas channel for purging reactant lines within the block inlet manifold.
    Type: Grant
    Filed: March 21, 2011
    Date of Patent: February 12, 2013
    Assignee: ASM America, Inc.
    Inventors: Timothy J. Provencher, Craig B. Hickson
  • HIGH TEMPERATURE ALD INLET MANIFOLD
    Publication number: 20110162580
    Abstract: A system and method for distributing one or more gases to an atomic layer deposition (ALD) reactor. An integrated inlet manifold block mounted over a showerhead assembly includes high temperature (up to 200° C.) rated valves mounted directly thereto, and short, easily purged reactant lines. Integral passageways and metal seals avoid o-rings and attendant dead zones along flow paths.
    Type: Application
    Filed: March 21, 2011
    Publication date: July 7, 2011
    Applicant: ASM AMERICA, INC.
    Inventors: Timothy J. Provencher, Craig B. Hickson
  • High temperature ALD inlet manifold
    Patent number: 7918938
    Abstract: A system and method for distributing one or more gases to an atomic layer deposition (ALD) reactor. An integrated inlet manifold block mounted over a showerhead assembly includes high temperature (up to 200° C.) rated valves mounted directly thereto, and short, easily purged reactant lines. Integral passageways and metal seals avoid o-rings and attendant dead zones along flow paths.
    Type: Grant
    Filed: January 17, 2007
    Date of Patent: April 5, 2011
    Assignee: ASM America, Inc.
    Inventors: Timothy J. Provencher, Craig B. Hickson
  • High temperature ALD inlet manifold
    Publication number: 20080202416
    Abstract: A system and method for distributing one or more gases to an atomic layer deposition (ALD) reactor. An integrated inlet manifold block mounted over a showerhead assembly includes high temperature (up to 200° C.) rated valves mounted directly thereto, and short, easily purged reactant lines. Integral passageways and metal seals avoid o-rings and attendant dead zones along flow paths.
    Type: Application
    Filed: January 17, 2007
    Publication date: August 28, 2008
    Inventors: Timothy J. Provencher, Craig B. Hickson