Patents by Inventor Craig G. Clabough

Craig G. Clabough has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Temperature optimization of a physical vapor deposition process to prevent extrusion into openings
    Patent number: 7033931
    Abstract: A physical vapor deposition process for maintaining the wafer below a critical temperature. The rate at which material particles are sputtered from the target and thus deposited on the wafer is controllable in response to power supplied to the target. Maintaining a desired deposition rate maintains the wafer temperature below the critical temperature.
    Type: Grant
    Filed: August 1, 2003
    Date of Patent: April 25, 2006
    Assignee: Agere Systems Inc.
    Inventors: Maxwell W. Lippitt, III, Craig G. Clabough, Joseph W. Buckfeller, Timothy J. Daniel
  • Wafer pedestal cover
    Publication number: 20040226516
    Abstract: A pedestal cover for a semiconductor wafer. The wafer is positioned overlying the pedestal cover in a material deposition chamber, with the cover defining a peripheral circumferential trench therein. During the material deposition process, deposited material is formed within the trench and the build up of material adjacent a peripheral edge of the wafer is thereby avoided.
    Type: Application
    Filed: September 30, 2003
    Publication date: November 18, 2004
    Inventors: Timothy J. Daniel, Joseph W. Buckfeller, Craig G. Clabough, Donald W. Collier