Patents by Inventor Craig M. Gates
Craig M. Gates has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20240369923Abstract: In the context of forming radiation patternable structures especially for EUV patterning, wafer structures are described comprising a substrate having a smooth top surface and a radiation sensitive organometallic coating having an average thickness of no more than 100 nm and no more than about 1 defect per square centimeter with a defect size of greater than 48 nm, evaluated with a 3 mm edge exclusion. Corresponding methods for forming a low defect coating comprise spin coating a purified radiation sensitive organometallic resist solution onto a wafer using a spin coater system comprising a delivery line and a delivery nozzle connected to the delivery line to form a coated wafer, and drying the coated wafer to form a radiation sensitive organometallic coating having no more than about 1 defect per square centimeter with a defect size of greater than 48 nm, evaluated with a 3 mm edge exclusion.Type: ApplicationFiled: July 19, 2024Publication date: November 7, 2024Inventors: Benjamin L. Clark, Gaetano Giordano, Shu-Hao Chang, Dominick Smiddy, Mark Geniza, Craig M. Gates, Jan Doise, Peter De Schepper
-
Publication number: 20240309027Abstract: The purification of monoalkyl tin trialkoxides and monoalkyl tin triamides are described using fractional distillation and/or ultrafiltration. The purified compositions are useful as radiation sensitive patterning compositions or precursors thereof. The fractional distillation process has been found to be effective for the removal of metal impurities down to very low levels. The ultrafiltration processes have been found to be effective at removal of fine particulates. Commercially practical processing techniques are described.Type: ApplicationFiled: May 20, 2024Publication date: September 19, 2024Inventors: Benjamin L. Clark, Dominick Smiddy, Mark Geniza, Craig M. Gates
-
Patent number: 12072626Abstract: In the context of forming radiation patternable structures especially for EUV patterning, wafer structures are described comprising a substrate having a smooth top surface and a radiation sensitive organometallic coating having an average thickness of no more than 100 nm and no more than about 1 defect per square centimeter with a defect size of greater than 48 nm, evaluated with a 3 mm edge exclusion. Corresponding methods for forming a low defect coating comprise spin coating a purified radiation sensitive organometallic resist solution onto a wafer using a spin coater system comprising a delivery line and a delivery nozzle connected to the delivery line to form a coated wafer, and drying the coated wafer to form a radiation sensitive organometallic coating having no more than about 1 defect per square centimeter with a defect size of greater than 48 nm, evaluated with a 3 mm edge exclusion.Type: GrantFiled: February 19, 2021Date of Patent: August 27, 2024Assignee: Inpria CorporationInventors: Benjamin L. Clark, Gaetano Giordano, Shu-Hao L. Chang, Dominick Smiddy, Mark Geniza, Craig M. Gates, Jan Doise, Peter de Schepper
-
Patent number: 12024534Abstract: The purification of monoalkyl tin trialkoxides and monoalkyl tin triamides are described using fractional distillation and/or ultrafiltration. The purified compositions are useful as radiation sensitive patterning compositions or precursors thereof. The fractional distillation process has been found to be effective for the removal of metal impurities down to very low levels. The ultrafiltration processes have been found to be effective at removal of fine particulates. Commercially practical processing techniques are described.Type: GrantFiled: October 14, 2022Date of Patent: July 2, 2024Assignee: Inpria CorporationInventors: Benjamin L. Clark, Dominick Smiddy, Mark Geniza, Craig M. Gates
-
Patent number: 11966158Abstract: The purification of monoalkyl tin trialkoxides and monoalkyl tin triamides are described using fractional distillation and/or ultrafiltration. The purified compositions are useful as radiation sensitive patterning compositions or precursors thereof. The fractional distillation process has been found to be effective for the removal of metal impurities down to very low levels. The ultrafiltration processes have been found to be effective at removal of fine particulates. Commercially practical processing techniques are described.Type: GrantFiled: January 30, 2019Date of Patent: April 23, 2024Assignee: Inpria CorporationInventors: Benjamin L. Clark, Dominick Smiddy, Thomas J. Lamkin, Mark Geniza, Joseph B. Edson, Craig M. Gates
-
Publication number: 20230251569Abstract: The purification of monoalkyl tin trialkoxides and monoalkyl tin triamides are described using fractional distillation and/or ultrafiltration. The purified compositions are useful as radiation sensitive patterning compositions or precursors thereof. The fractional distillation process has been found to be effective for the removal of metal impurities down to very low levels. The ultrafiltration processes have been found to be effective at removal of fine particulates. Commercially practical processing techniques are described.Type: ApplicationFiled: April 19, 2023Publication date: August 10, 2023Inventors: Benjamin L. Clark, Dominick Smiddy, Thomas J. Lamkin, Mark Genzia, Joseph B. Edson, Craig M. Gates
-
Publication number: 20230039497Abstract: The purification of monoalkyl tin trialkoxides and monoalkyl tin triamides are described using fractional distillation and/or ultrafiltration. The purified compositions are useful as radiation sensitive patterning compositions or precursors thereof. The fractional distillation process has been found to be effective for the removal of metal impurities down to very low levels. The ultrafiltration processes have been found to be effective at removal of fine particulates. Commercially practical processing techniques are described.Type: ApplicationFiled: October 14, 2022Publication date: February 9, 2023Inventors: Benjamin L. Clark, Dominick Smiddy, Mark Geniza, Craig M. Gates
-
Patent number: 11498934Abstract: The purification of monoalkyl tin trialkoxides and monoalkyl tin triamides are described using fractional distillation and/or ultrafiltration. The purified compositions are useful as radiation sensitive patterning compositions or precursors thereof. The fractional distillation process has been found to be effective for the removal of metal impurities down to very low levels. The ultrafiltration processes have been found to be effective at removal of fine particulates. Commercially practical processing techniques are described.Type: GrantFiled: January 30, 2019Date of Patent: November 15, 2022Assignee: Inpria CorporationInventors: Benjamin L. Clark, Dominick Smiddy, Mark Geniza, Craig M. Gates
-
Publication number: 20220269169Abstract: In the context of forming radiation patternable structures especially for EUV patterning, wafer structures are described comprising a substrate having a smooth top surface and a radiation sensitive organometallic coating having an average thickness of no more than 100 nm and no more than about 1 defect per square centimeter with a defect size of greater than 48 nm, evaluated with a 3 mm edge exclusion. Corresponding methods for forming a low defect coating comprise spin coating a purified radiation sensitive organometallic resist solution onto a wafer using a spin coater system comprising a delivery line and a delivery nozzle connected to the delivery line to form a coated wafer, and drying the coated wafer to form a radiation sensitive organometallic coating having no more than about 1 defect per square centimeter with a defect size of greater than 48 nm, evaluated with a 3 mm edge exclusion.Type: ApplicationFiled: February 19, 2021Publication date: August 25, 2022Inventors: Benjamin L. Clark, Gaetano Giordano, Shu-Hao L. Chang, Dominick Smiddy, Mark Geniza, Craig M. Gates, Jan Doise, Peter de Schepper
-
Publication number: 20200239498Abstract: The purification of monoalkyl tin trialkoxides and monoalkyl tin triamides are described using fractional distillation and/or ultrafiltration. The purified compositions are useful as radiation sensitive patterning compositions or precursors thereof. The fractional distillation process has been found to be effective for the removal of metal impurities down to very low levels. The ultrafiltration processes have been found to be effective at removal of fine particulates. Commercially practical processing techniques are described.Type: ApplicationFiled: January 30, 2019Publication date: July 30, 2020Inventors: Benjamin L. Clark, Dominick Smiddy, Mark Geniza, Craig M. Gates
-
Publication number: 20200241413Abstract: The purification of monoalkyl tin trialkoxides and monoalkyl tin triamides are described using fractional distillation and/or ultrafiltration. The purified compositions are useful as radiation sensitive patterning compositions or precursors thereof. The fractional distillation process has been found to be effective for the removal of metal impurities down to very low levels. The ultrafiltration processes have been found to be effective at removal of fine particulates. Commercially practical processing techniques are described.Type: ApplicationFiled: January 30, 2019Publication date: July 30, 2020Inventors: Benjamin L. Clark, Dominick Smiddy, Thomas J. Lamkin, Mark Geniza, Joseph B. Edson, Craig M. Gates
-
Patent number: 10189231Abstract: Provided herein are ecologically friendly waterproof fabrics that include a base fabric having a body-facing surface and an outward-facing surface, and a hydrophobic, waterproof barrier disposed on the outward-facing surface of the base fabric. The base fabric may be a wicking fabric or may be treated with a compound that enhances wicking, and the hydrophobic, waterproof barrier may include a plastic polymer, polyurethane, polyethylene, and/or polytetrafluoroethylene. The waterproof fabrics also may include an abrasion-resistant coating and/or a PFC-free durable water repellant (DWR) agent disposed on an outward-facing surface of the hydrophobic, waterproof barrier, and one or both of the abrasion-resistant coating and/or PFC-free DWR agent may be discontinuous. Also provided are methods of making a waterproof fabric.Type: GrantFiled: February 17, 2017Date of Patent: January 29, 2019Assignee: Columbia Sportswear North America, Inc.Inventors: Michael E. “Woody” Blackford, Jeffrey Thomas Mergy, Craig M. Gates, Wayne Alan Skankey
-
Patent number: 10086582Abstract: Provided herein are waterproof fabrics that include a base fabric having a body-facing surface and an outward-facing surface, and a hydrophobic, waterproof barrier disposed on the outward-facing surface of the base fabric, a seam through the waterproof fabric, and a waterproof tape disposed on an outward-facing surface of the hydrophobic, waterproof barrier and aligned to seal the seam against water ingress. The base fabric may be a wicking fabric or may be treated with a compound that enhances wicking, and the hydrophobic, waterproof barrier may include a plastic polymer, polyurethane, polyethylene, and/or polytetrafluoroethylene. The waterproof fabrics also may include an abrasion-resistant coating and/or a durable water repellant (DWR) agent disposed on an outward-facing surface of the hydrophobic, waterproof barrier, and one or both of the abrasion-resistant coating and/or DWR agent may be discontinuous. Also provided are methods of making a waterproof fabric.Type: GrantFiled: September 11, 2015Date of Patent: October 2, 2018Assignee: Columbia Sportswear North America, Inc.Inventors: Michael E. “Woody” Blackford, Jeffrey Thomas Mergy, Craig M. Gates, Wayne Alan Skankey
-
Publication number: 20170157902Abstract: Provided herein are ecologically friendly waterproof fabrics that include a base fabric having a body-facing surface and an outward-facing surface, and a hydrophobic, waterproof barrier disposed on the outward-facing surface of the base fabric. The base fabric may be a wicking fabric or may be treated with a compound that enhances wicking, and the hydrophobic, waterproof barrier may include a plastic polymer, polyurethane, polyethylene, and/or polytetrafluoroethylene. The waterproof fabrics also may include an abrasion-resistant coating and/or a PFC-free durable water repellant (DWR) agent disposed on an outward-facing surface of the hydrophobic, waterproof barrier, and one or both of the abrasion-resistant coating and/or PFC-free DWR agent may be discontinuous. Also provided are methods of making a waterproof fabric.Type: ApplicationFiled: February 17, 2017Publication date: June 8, 2017Inventors: Michael E. "Woody" Blackford, Jeffrey Thomas Mergy, Craig M. Gates, Wayne Alan Skankey
-
Publication number: 20160075101Abstract: Provided herein are waterproof fabrics that include a base fabric having a body-facing surface and an outward-facing surface, and a hydrophobic, waterproof barrier disposed on the outward-facing surface of the base fabric, a seam through the waterproof fabric, and a waterproof tape disposed on an outward-facing surface of the hydrophobic, waterproof barrier and aligned to seal the seam against water ingress. The base fabric may be a wicking fabric or may be treated with a compound that enhances wicking, and the hydrophobic, waterproof barrier may include a plastic polymer, polyurethane, polyethylene, and/or polytetrafluoroethylene. The waterproof fabrics also may include an abrasion-resistant coating and/or a durable water repellant (DWR) agent disposed on an outward-facing surface of the hydrophobic, waterproof barrier, and one or both of the abrasion-resistant coating and/or DWR agent may be discontinuous. Also provided are methods of making a waterproof fabric.Type: ApplicationFiled: September 11, 2015Publication date: March 17, 2016Inventors: Michael E. "Woody" Blackford, Jeffrey Thomas Mergy, Craig M. Gates, Wayne Alan Skankey
-
Patent number: 7938512Abstract: The described embodiments relate to slotted substrates. One exemplary method forms a feature into a substrate, at least in part, by directing a laser beam at the substrate. During at least a portion of said directing, the method supplies a conductive material proximate the substrate.Type: GrantFiled: December 4, 2006Date of Patent: May 10, 2011Assignee: Hewlett-Packard Development Company, L.P.Inventors: Jong-Souk Yeo, Mark Huth, Mehrgan Khavari, Alexey S Kabalnov, Craig M. Gates, Sean P Mcclelland
-
Patent number: 7923658Abstract: A method of laser machining a substrate is provided. The method comprises directing laser energy at a first surface of the substrate, while providing an assist medium at the first surface of the substrate at least at approximately the area at which the laser energy is being directed. The assist medium is no longer provided prior to completion of formation of a feature in the substrate created utilizing the laser energy.Type: GrantFiled: October 29, 2004Date of Patent: April 12, 2011Assignee: Hewlett-Packard Development Company, L.P.Inventors: Mark Huth, Philip G Rourke, Craig M. Gates
-
Patent number: 7163640Abstract: The described embodiments relate to slotted substrates. One exemplary method forms a feature into a substrate, at least in part, by directing a laser beam at the substrate. During at least a portion of said directing, the method supplies a conductive material proximate the substrate.Type: GrantFiled: May 21, 2004Date of Patent: January 16, 2007Assignee: Hewlett-Packard Development Company, L.P.Inventors: Jong-Souk Yeo, Mark Huth, Mehrgan Khavari, Alexey S Kabalnov, Craig M. Gates, Sean P Mcclelland
-
Patent number: 6790325Abstract: A method for creating a mandrel for electroforming orifice sheets with tapered bores is described. The method uses photo-imagable polymer or photoresist to create the desired profile. This is followed by electroforming a parent mandrel over which a mandrel-quality sheet of glass is melted. An array of pillars with defined location and shape is formed with a desired profile for the mandrel to be used for the electroforming process. The glass is then metalized. A photoresist mask is formed on the metalized glass and a dielectric is deposited onto the pillars.Type: GrantFiled: April 9, 2001Date of Patent: September 14, 2004Assignee: Hewlett-Packard Development Company, L.P.Inventors: Craig M. Gates, Niranjan Thirukkovalur
-
Publication number: 20020144613Abstract: A method for creating a mandrel for electroforming orifice sheets with tapered bores is described. The method uses photo-imagable polymer or photoresist to create the desired profile. This is followed by electroforming a parent mandrel over which a mandrel-quality sheet of glass is melted. An array of pillars with defined location and shape is formed with a desired profile for the mandrel to be used for the electroforming process. The glass is then metalized. A photoresist mask is formed on the metalized glass and a dielectric is deposited onto the pillars.Type: ApplicationFiled: April 9, 2001Publication date: October 10, 2002Inventors: Craig M. Gates, Niranjan Thirukkovalur