Patents by Inventor Craig M. Gates

Craig M. Gates has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240369923
    Abstract: In the context of forming radiation patternable structures especially for EUV patterning, wafer structures are described comprising a substrate having a smooth top surface and a radiation sensitive organometallic coating having an average thickness of no more than 100 nm and no more than about 1 defect per square centimeter with a defect size of greater than 48 nm, evaluated with a 3 mm edge exclusion. Corresponding methods for forming a low defect coating comprise spin coating a purified radiation sensitive organometallic resist solution onto a wafer using a spin coater system comprising a delivery line and a delivery nozzle connected to the delivery line to form a coated wafer, and drying the coated wafer to form a radiation sensitive organometallic coating having no more than about 1 defect per square centimeter with a defect size of greater than 48 nm, evaluated with a 3 mm edge exclusion.
    Type: Application
    Filed: July 19, 2024
    Publication date: November 7, 2024
    Inventors: Benjamin L. Clark, Gaetano Giordano, Shu-Hao Chang, Dominick Smiddy, Mark Geniza, Craig M. Gates, Jan Doise, Peter De Schepper
  • Publication number: 20240309027
    Abstract: The purification of monoalkyl tin trialkoxides and monoalkyl tin triamides are described using fractional distillation and/or ultrafiltration. The purified compositions are useful as radiation sensitive patterning compositions or precursors thereof. The fractional distillation process has been found to be effective for the removal of metal impurities down to very low levels. The ultrafiltration processes have been found to be effective at removal of fine particulates. Commercially practical processing techniques are described.
    Type: Application
    Filed: May 20, 2024
    Publication date: September 19, 2024
    Inventors: Benjamin L. Clark, Dominick Smiddy, Mark Geniza, Craig M. Gates
  • Patent number: 12072626
    Abstract: In the context of forming radiation patternable structures especially for EUV patterning, wafer structures are described comprising a substrate having a smooth top surface and a radiation sensitive organometallic coating having an average thickness of no more than 100 nm and no more than about 1 defect per square centimeter with a defect size of greater than 48 nm, evaluated with a 3 mm edge exclusion. Corresponding methods for forming a low defect coating comprise spin coating a purified radiation sensitive organometallic resist solution onto a wafer using a spin coater system comprising a delivery line and a delivery nozzle connected to the delivery line to form a coated wafer, and drying the coated wafer to form a radiation sensitive organometallic coating having no more than about 1 defect per square centimeter with a defect size of greater than 48 nm, evaluated with a 3 mm edge exclusion.
    Type: Grant
    Filed: February 19, 2021
    Date of Patent: August 27, 2024
    Assignee: Inpria Corporation
    Inventors: Benjamin L. Clark, Gaetano Giordano, Shu-Hao L. Chang, Dominick Smiddy, Mark Geniza, Craig M. Gates, Jan Doise, Peter de Schepper
  • Patent number: 12024534
    Abstract: The purification of monoalkyl tin trialkoxides and monoalkyl tin triamides are described using fractional distillation and/or ultrafiltration. The purified compositions are useful as radiation sensitive patterning compositions or precursors thereof. The fractional distillation process has been found to be effective for the removal of metal impurities down to very low levels. The ultrafiltration processes have been found to be effective at removal of fine particulates. Commercially practical processing techniques are described.
    Type: Grant
    Filed: October 14, 2022
    Date of Patent: July 2, 2024
    Assignee: Inpria Corporation
    Inventors: Benjamin L. Clark, Dominick Smiddy, Mark Geniza, Craig M. Gates
  • Patent number: 11966158
    Abstract: The purification of monoalkyl tin trialkoxides and monoalkyl tin triamides are described using fractional distillation and/or ultrafiltration. The purified compositions are useful as radiation sensitive patterning compositions or precursors thereof. The fractional distillation process has been found to be effective for the removal of metal impurities down to very low levels. The ultrafiltration processes have been found to be effective at removal of fine particulates. Commercially practical processing techniques are described.
    Type: Grant
    Filed: January 30, 2019
    Date of Patent: April 23, 2024
    Assignee: Inpria Corporation
    Inventors: Benjamin L. Clark, Dominick Smiddy, Thomas J. Lamkin, Mark Geniza, Joseph B. Edson, Craig M. Gates
  • Publication number: 20230251569
    Abstract: The purification of monoalkyl tin trialkoxides and monoalkyl tin triamides are described using fractional distillation and/or ultrafiltration. The purified compositions are useful as radiation sensitive patterning compositions or precursors thereof. The fractional distillation process has been found to be effective for the removal of metal impurities down to very low levels. The ultrafiltration processes have been found to be effective at removal of fine particulates. Commercially practical processing techniques are described.
    Type: Application
    Filed: April 19, 2023
    Publication date: August 10, 2023
    Inventors: Benjamin L. Clark, Dominick Smiddy, Thomas J. Lamkin, Mark Genzia, Joseph B. Edson, Craig M. Gates
  • Publication number: 20230039497
    Abstract: The purification of monoalkyl tin trialkoxides and monoalkyl tin triamides are described using fractional distillation and/or ultrafiltration. The purified compositions are useful as radiation sensitive patterning compositions or precursors thereof. The fractional distillation process has been found to be effective for the removal of metal impurities down to very low levels. The ultrafiltration processes have been found to be effective at removal of fine particulates. Commercially practical processing techniques are described.
    Type: Application
    Filed: October 14, 2022
    Publication date: February 9, 2023
    Inventors: Benjamin L. Clark, Dominick Smiddy, Mark Geniza, Craig M. Gates
  • Patent number: 11498934
    Abstract: The purification of monoalkyl tin trialkoxides and monoalkyl tin triamides are described using fractional distillation and/or ultrafiltration. The purified compositions are useful as radiation sensitive patterning compositions or precursors thereof. The fractional distillation process has been found to be effective for the removal of metal impurities down to very low levels. The ultrafiltration processes have been found to be effective at removal of fine particulates. Commercially practical processing techniques are described.
    Type: Grant
    Filed: January 30, 2019
    Date of Patent: November 15, 2022
    Assignee: Inpria Corporation
    Inventors: Benjamin L. Clark, Dominick Smiddy, Mark Geniza, Craig M. Gates
  • Publication number: 20220269169
    Abstract: In the context of forming radiation patternable structures especially for EUV patterning, wafer structures are described comprising a substrate having a smooth top surface and a radiation sensitive organometallic coating having an average thickness of no more than 100 nm and no more than about 1 defect per square centimeter with a defect size of greater than 48 nm, evaluated with a 3 mm edge exclusion. Corresponding methods for forming a low defect coating comprise spin coating a purified radiation sensitive organometallic resist solution onto a wafer using a spin coater system comprising a delivery line and a delivery nozzle connected to the delivery line to form a coated wafer, and drying the coated wafer to form a radiation sensitive organometallic coating having no more than about 1 defect per square centimeter with a defect size of greater than 48 nm, evaluated with a 3 mm edge exclusion.
    Type: Application
    Filed: February 19, 2021
    Publication date: August 25, 2022
    Inventors: Benjamin L. Clark, Gaetano Giordano, Shu-Hao L. Chang, Dominick Smiddy, Mark Geniza, Craig M. Gates, Jan Doise, Peter de Schepper
  • Publication number: 20200239498
    Abstract: The purification of monoalkyl tin trialkoxides and monoalkyl tin triamides are described using fractional distillation and/or ultrafiltration. The purified compositions are useful as radiation sensitive patterning compositions or precursors thereof. The fractional distillation process has been found to be effective for the removal of metal impurities down to very low levels. The ultrafiltration processes have been found to be effective at removal of fine particulates. Commercially practical processing techniques are described.
    Type: Application
    Filed: January 30, 2019
    Publication date: July 30, 2020
    Inventors: Benjamin L. Clark, Dominick Smiddy, Mark Geniza, Craig M. Gates
  • Publication number: 20200241413
    Abstract: The purification of monoalkyl tin trialkoxides and monoalkyl tin triamides are described using fractional distillation and/or ultrafiltration. The purified compositions are useful as radiation sensitive patterning compositions or precursors thereof. The fractional distillation process has been found to be effective for the removal of metal impurities down to very low levels. The ultrafiltration processes have been found to be effective at removal of fine particulates. Commercially practical processing techniques are described.
    Type: Application
    Filed: January 30, 2019
    Publication date: July 30, 2020
    Inventors: Benjamin L. Clark, Dominick Smiddy, Thomas J. Lamkin, Mark Geniza, Joseph B. Edson, Craig M. Gates
  • Patent number: 10189231
    Abstract: Provided herein are ecologically friendly waterproof fabrics that include a base fabric having a body-facing surface and an outward-facing surface, and a hydrophobic, waterproof barrier disposed on the outward-facing surface of the base fabric. The base fabric may be a wicking fabric or may be treated with a compound that enhances wicking, and the hydrophobic, waterproof barrier may include a plastic polymer, polyurethane, polyethylene, and/or polytetrafluoroethylene. The waterproof fabrics also may include an abrasion-resistant coating and/or a PFC-free durable water repellant (DWR) agent disposed on an outward-facing surface of the hydrophobic, waterproof barrier, and one or both of the abrasion-resistant coating and/or PFC-free DWR agent may be discontinuous. Also provided are methods of making a waterproof fabric.
    Type: Grant
    Filed: February 17, 2017
    Date of Patent: January 29, 2019
    Assignee: Columbia Sportswear North America, Inc.
    Inventors: Michael E. “Woody” Blackford, Jeffrey Thomas Mergy, Craig M. Gates, Wayne Alan Skankey
  • Patent number: 10086582
    Abstract: Provided herein are waterproof fabrics that include a base fabric having a body-facing surface and an outward-facing surface, and a hydrophobic, waterproof barrier disposed on the outward-facing surface of the base fabric, a seam through the waterproof fabric, and a waterproof tape disposed on an outward-facing surface of the hydrophobic, waterproof barrier and aligned to seal the seam against water ingress. The base fabric may be a wicking fabric or may be treated with a compound that enhances wicking, and the hydrophobic, waterproof barrier may include a plastic polymer, polyurethane, polyethylene, and/or polytetrafluoroethylene. The waterproof fabrics also may include an abrasion-resistant coating and/or a durable water repellant (DWR) agent disposed on an outward-facing surface of the hydrophobic, waterproof barrier, and one or both of the abrasion-resistant coating and/or DWR agent may be discontinuous. Also provided are methods of making a waterproof fabric.
    Type: Grant
    Filed: September 11, 2015
    Date of Patent: October 2, 2018
    Assignee: Columbia Sportswear North America, Inc.
    Inventors: Michael E. “Woody” Blackford, Jeffrey Thomas Mergy, Craig M. Gates, Wayne Alan Skankey
  • Publication number: 20170157902
    Abstract: Provided herein are ecologically friendly waterproof fabrics that include a base fabric having a body-facing surface and an outward-facing surface, and a hydrophobic, waterproof barrier disposed on the outward-facing surface of the base fabric. The base fabric may be a wicking fabric or may be treated with a compound that enhances wicking, and the hydrophobic, waterproof barrier may include a plastic polymer, polyurethane, polyethylene, and/or polytetrafluoroethylene. The waterproof fabrics also may include an abrasion-resistant coating and/or a PFC-free durable water repellant (DWR) agent disposed on an outward-facing surface of the hydrophobic, waterproof barrier, and one or both of the abrasion-resistant coating and/or PFC-free DWR agent may be discontinuous. Also provided are methods of making a waterproof fabric.
    Type: Application
    Filed: February 17, 2017
    Publication date: June 8, 2017
    Inventors: Michael E. "Woody" Blackford, Jeffrey Thomas Mergy, Craig M. Gates, Wayne Alan Skankey
  • Publication number: 20160075101
    Abstract: Provided herein are waterproof fabrics that include a base fabric having a body-facing surface and an outward-facing surface, and a hydrophobic, waterproof barrier disposed on the outward-facing surface of the base fabric, a seam through the waterproof fabric, and a waterproof tape disposed on an outward-facing surface of the hydrophobic, waterproof barrier and aligned to seal the seam against water ingress. The base fabric may be a wicking fabric or may be treated with a compound that enhances wicking, and the hydrophobic, waterproof barrier may include a plastic polymer, polyurethane, polyethylene, and/or polytetrafluoroethylene. The waterproof fabrics also may include an abrasion-resistant coating and/or a durable water repellant (DWR) agent disposed on an outward-facing surface of the hydrophobic, waterproof barrier, and one or both of the abrasion-resistant coating and/or DWR agent may be discontinuous. Also provided are methods of making a waterproof fabric.
    Type: Application
    Filed: September 11, 2015
    Publication date: March 17, 2016
    Inventors: Michael E. "Woody" Blackford, Jeffrey Thomas Mergy, Craig M. Gates, Wayne Alan Skankey
  • Patent number: 7938512
    Abstract: The described embodiments relate to slotted substrates. One exemplary method forms a feature into a substrate, at least in part, by directing a laser beam at the substrate. During at least a portion of said directing, the method supplies a conductive material proximate the substrate.
    Type: Grant
    Filed: December 4, 2006
    Date of Patent: May 10, 2011
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Jong-Souk Yeo, Mark Huth, Mehrgan Khavari, Alexey S Kabalnov, Craig M. Gates, Sean P Mcclelland
  • Patent number: 7923658
    Abstract: A method of laser machining a substrate is provided. The method comprises directing laser energy at a first surface of the substrate, while providing an assist medium at the first surface of the substrate at least at approximately the area at which the laser energy is being directed. The assist medium is no longer provided prior to completion of formation of a feature in the substrate created utilizing the laser energy.
    Type: Grant
    Filed: October 29, 2004
    Date of Patent: April 12, 2011
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Mark Huth, Philip G Rourke, Craig M. Gates
  • Patent number: 7163640
    Abstract: The described embodiments relate to slotted substrates. One exemplary method forms a feature into a substrate, at least in part, by directing a laser beam at the substrate. During at least a portion of said directing, the method supplies a conductive material proximate the substrate.
    Type: Grant
    Filed: May 21, 2004
    Date of Patent: January 16, 2007
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Jong-Souk Yeo, Mark Huth, Mehrgan Khavari, Alexey S Kabalnov, Craig M. Gates, Sean P Mcclelland
  • Patent number: 6790325
    Abstract: A method for creating a mandrel for electroforming orifice sheets with tapered bores is described. The method uses photo-imagable polymer or photoresist to create the desired profile. This is followed by electroforming a parent mandrel over which a mandrel-quality sheet of glass is melted. An array of pillars with defined location and shape is formed with a desired profile for the mandrel to be used for the electroforming process. The glass is then metalized. A photoresist mask is formed on the metalized glass and a dielectric is deposited onto the pillars.
    Type: Grant
    Filed: April 9, 2001
    Date of Patent: September 14, 2004
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Craig M. Gates, Niranjan Thirukkovalur
  • Publication number: 20020144613
    Abstract: A method for creating a mandrel for electroforming orifice sheets with tapered bores is described. The method uses photo-imagable polymer or photoresist to create the desired profile. This is followed by electroforming a parent mandrel over which a mandrel-quality sheet of glass is melted. An array of pillars with defined location and shape is formed with a desired profile for the mandrel to be used for the electroforming process. The glass is then metalized. A photoresist mask is formed on the metalized glass and a dielectric is deposited onto the pillars.
    Type: Application
    Filed: April 9, 2001
    Publication date: October 10, 2002
    Inventors: Craig M. Gates, Niranjan Thirukkovalur