Abstract: A system and method for generating simulated wiring connections between a semiconductor device and a carrier. The method comprises identifying a plurality of first factors and instances of each first factor relating to the semiconductor device and identifying a plurality of second factors and instances of each second factor relating to the carrier. The first and second factors are associated with each other on a one-to-one basis. A simulated wiring connection is generated between a first I/O terminal and a matching second I/O terminal, subject to an identified instance of each first factor of each first I/O terminal being correlated to an identified instance of the associated second factor of the matching second I/O terminal. A simulated wiring connection is generated between third I/O terminals located in a first region and fourth I/O terminals located in a second region.

Abstract: A system and method for generating simulated wiring connections between first I/O terminals of a semiconductor device and second I/O terminals of a carrier. The method comprises identifying a plurality of first factors and instances of each first factor relating to a semiconductor device and identifying a plurality of second factors and instances of each second factor relating to a carrier. The first and second factors are associated with each other on a one-to-one basis. The instances of each first factor are correlated to the instances of each associated second factor on a one-to-one basis. A simulated wiring connection automatically is generated between each first I/O terminal and a matching second I/O terminal, subject to an identified instance of each first factor of each first I/O terminal being correlated to an identified instance of the associated second factor of the matching second I/O terminal.