Patents by Inventor Craig R. Simpson

Craig R. Simpson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8395783
    Abstract: Projection systems and methods with mechanically decoupled metrology plates according to embodiments of the present invention can be used to characterize and compensate for misalignment and aberration in production images due to thermal and mechanical effects. Sensors on the metrology plate measure the position of the metrology plate relative to the image and to the substrate during exposure of the substrate to the production image. Data from the sensors are used to adjust the projection optics and/or substrate dynamically to correct or compensate for alignment errors and aberration-induced errors. Compared to prior art systems and methods, the projection systems and methods described herein offer greater design flexibility and relaxed constraints on mechanical stability and thermally induced expansion. In addition, decoupled metrology plates can be used to align two or more objectives simultaneously and independently.
    Type: Grant
    Filed: July 16, 2010
    Date of Patent: March 12, 2013
    Assignee: Rudolph Technologies, Inc.
    Inventors: J. Casey Donaher, Craig R. Simpson, Roger McCleary
  • Publication number: 20120015461
    Abstract: Projection systems and methods with mechanically decoupled metrology plates according to embodiments of the present invention can be used to characterize and compensate for misalignment and aberration in production images due to thermal and mechanical effects. Sensors on the metrology plate measure the position of the metrology plate relative to the image and to the substrate during exposure of the substrate to the production image. Data from the sensors are used to adjust the projection optics and/or substrate dynamically to correct or compensate for alignment errors and aberration-induced errors. Compared to prior art systems and methods, the projection systems and methods described herein offer greater design flexibility and relaxed constraints on mechanical stability and thermally induced expansion. In addition, decoupled metrology plates can be used to align two or more objectives simultaneously and independently.
    Type: Application
    Filed: July 16, 2010
    Publication date: January 19, 2012
    Applicant: Azores Corp.
    Inventors: J. Casey Donaher, Craig R. Simpson, Roger McCleary
  • Patent number: 6483572
    Abstract: Misalignment errors in a lithographic system resulting from the effect of environmental changes on the lens system itself are detected and corrected. A fiducial on the reticle adjacent to its working area is projected through the lens. A metrology plate carried by the lens holds reference mirrors and detectors. The reference mirrors receive the resultant image and reflect it to detectors in a reflected image plane. This provides feedback to the reticle alignment system as to the extent of misalignment, if any. Correction is made by moving the reticle until alignment is achieved and detected. This motion is achieved by using a reticle chuck with linear motors.
    Type: Grant
    Filed: November 20, 2001
    Date of Patent: November 19, 2002
    Assignee: Azores Corporation
    Inventors: Craig R. Simpson, Mark S. Lucas
  • Publication number: 20020085189
    Abstract: Misalignment errors in a lithographic system resulting from the effect of environmental changes on the lens system itself are detected and corrected. A fiducial on the reticle adjacent to its working area is projected through the lens. A metrology plate carried by the lens holds reference mirrors and detectors The reference mirrors receive the resultant image and reflect it to detectors in a reflected image plane. This provides feedback to the reticle alignment system as to the extent of misalignment, if any. Correction is made by moving the reticle until alignment is achieved and detected. This motion is achieved by using a reticle chuck with linear motors.
    Type: Application
    Filed: November 20, 2001
    Publication date: July 4, 2002
    Applicant: MRS Technology, Inc.
    Inventors: Craig R. Simpson, Mark S. Lucas
  • Patent number: 6320644
    Abstract: Misalignment errors in a lithographic system resulting from the effect of environmental changes on the lens system itself are detected and corrected. A fiducial on the reticle adjacent to its working area is projected through the lens. A metrology plate carried by the lens holds reference mirrors and detectors. The reference mirrors receive the resultant image and reflect it to detectors in a reflected image plane. This provides feedback to the reticle alignment system as to the extent of misalignment, if any. Correction is made by moving the reticle until alignment is achieved and detected. This motion is achieved by using a reticle chuck with linear motors.
    Type: Grant
    Filed: April 18, 1994
    Date of Patent: November 20, 2001
    Inventors: Craig R. Simpson, Marc S. Lucas
  • Patent number: 5828142
    Abstract: A lithographic stage is carried by a platen formed of a plurality of tiles containing a uniformly spaced grid of teeth and having low reluctance and high resistivity. The teeth have been formed by powder metal technology using as powder particles of a ferromagnetic material, the particles being of high resistivity or coated with an insulating material. The space between the teeth is filled with non-magnetic material, such as epoxy, and the entire platen finished such that it has a smooth and uniform flat upper surface.
    Type: Grant
    Filed: August 22, 1997
    Date of Patent: October 27, 1998
    Assignee: MRS Technology, Inc.
    Inventor: Craig R. Simpson
  • Patent number: 5677758
    Abstract: Two lithographic substrate stages are used in a single lithographic system. While a substrate on one stage is being exposed, a second substrate is being loaded, unloaded, or aligned on a second stage. After exposure, the first stage is unloaded, reloaded, and the newly-loaded substrate is aligned, while the second substrate on the second stage is being exposed. The two stages are thus used alternately in different steps of the process. One of the steps is being performed on one stage while a different step is being performed on the other stage. The substrates on both stages are, therefore, being acted upon simultaneously. The two stages are carried on a single linear motor platen, and moved about the platen by use of linear motors. The two stages alternately both move in clockwise directions about the platen, or both move in counterclockwise directions. When both move in clockwise directions, the first stage is moving to the exposure position, and the second stage is moving to the unload/load/align station.
    Type: Grant
    Filed: February 9, 1995
    Date of Patent: October 14, 1997
    Assignee: MRS Technology, Inc.
    Inventors: Robert A. McEachern, Mark S. Lucas, Craig R. Simpson
  • Patent number: 4855792
    Abstract: A direct reticle reference alignment system for use in photolithography for use with substrates having optical transmissivity. The system includes a movable stage (14), a transmissive substrate (11) held by the stage and bearing at least one plate mark (15) upon its upper surface, an optical system having a light source (1) for illuminating and projecting a reticle alignment image (4) upon the substrate (11) for alignment with the plate mark (15), a sensor (17) mounted in the stage (14) below the substrate (11) and the plate mark (15) to receive light from the projected alignment image (4), the sensor (17) producing an electrical signal related to the degree of alignment, and a stage control actuated by the signal to position the stage (14) and, so, align the substrate (11) with the reticle (4). The sensor (17) includes a light channel (19), such as a fiber optic rod, positioned to receive images from the lower surface (13) of said substrate ( 11) and carry them to the photocell.
    Type: Grant
    Filed: May 13, 1988
    Date of Patent: August 8, 1989
    Assignee: MRS Technology, Inc.
    Inventors: David S. Holbrook, Craig R. Simpson