Patents by Inventor Craig R. Sykora
Craig R. Sykora has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20170357347Abstract: Touch sensitive projection screens are disclosed. In particular, touch sensitive projection screen including drive electrodes, sense electrodes, and optical diffusers are disclosed. The touch sensitive projection screens are adapted for use on a horizontal surface. Touch sensitive projection screens including shrinkable layers are also disclosed.Type: ApplicationFiled: October 23, 2015Publication date: December 14, 2017Inventors: Steven T. Swartz, Hui Luo, Neeraj Sharma, Robert A. Yapel, Ronald L. Imken, Jung-Sheng Wu, David T. Yust, Richard J. Pokorny, Lan H. Liu, Craig R. Sykora, David J. McDaniel, Yu Yang, Mitchell A.F. Johnson
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Publication number: 20170166750Abstract: Presently described are hardcoat compositions comprising at least one first (meth)acrylate monomer comprising at least three (meth)acrylate groups and C2-C4 alkoxy repeat units wherein the monomer has a molecular weight per (meth)acrylate group ranging from about 220 to 375 g/mole and at least one second (meth)acrylate monomer comprising at least three (meth)acrylate groups. In one embodiment, the hardcoat composition further comprises and at least 50 wt-% solids of silica nanoparticles. Also described are articles, such as protective films, displays, and touch screens comprising such cured hardcoat compositions.Type: ApplicationFiled: February 24, 2017Publication date: June 15, 2017Inventors: Richard J. Pokorny, Steven D. Solomonson, Robert F. Kamrath, Anthony M. Renstrom, Roger W. Barton, Craig R. Sykora
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Publication number: 20160326383Abstract: Presently described are hardcoat compositions comprising at least one first (meth)acrylate monomer comprising at least three (meth)acrylate groups and C2-C4 alkoxy repeat units wherein the monomer has a molecular weight per (meth)acrylate group ranging from about 220 to 375 g/mole and at least one second (meth)acrylate monomer comprising at least three (meth)acrylate groups. The hardcoat composition further comprises inorganic oxide nanoparticles such as silica that comprises a copolymer izable surface treatment and a non-copolymerizable silane surface treatment. Also described are articles, such as protective films, displays, and touch screens comprising such cured hardcoat compositions.Type: ApplicationFiled: January 13, 2015Publication date: November 10, 2016Inventors: Richard J. Pokorny, Robert F. Kamrath, Michelle L. Toy, Steven D. Solomonson, Elisa M. Cross, Anthony M. Renstrom, Roger W. Barton, Craig R. Sykora
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Publication number: 20150132583Abstract: Presently described are hardcoat compositions comprising at least one first (meth)acrylate monomer comprising at least three (meth)acrylate groups and C2-C4 alkoxy repeat units wherein the monomer has a molecular weight per (meth)acrylate group ranging from about 220 to 375 g/mole and at least one second (meth)acrylate monomer comprising at least three (meth)acrylate groups. In one embodiment, the hardcoat composition further comprises and at least 30 wt-% solids of silica nanoparticles having an average particle size ranging from 50 to 150 nm. In another embodiment, the hardcoat composition further comprises and at least 30 wt-% solids of inorganic oxide nanoparticles having an average particle size ranging from 50 to 150 nm. Also described are articles, such as protective films, displays, and touch screens comprising such cured hardcoat compositions.Type: ApplicationFiled: July 10, 2013Publication date: May 14, 2015Applicant: 3M INNOVATIVE PROPERTIES COMPANYInventors: Richard J. Pokorny, Steven D. Solomonson, Robert F. Kamrath, Anthony M. Renstrom, Roger W. Barton, Craig R. Sykora
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Patent number: 8885146Abstract: An exposure system includes a light source emitting a beam along an optical axis that is capable of inducing a multi-photon reaction in a resin. The exposure system further includes a resin undergoing multiphoton reaction, as well as an automated system including a monitor that measures at least one property of the beam selected from power, pulse length, shape, divergence, or position in a plane normal to the optical axis. The monitor generates at least one signal indicative of the property of the beam, and a sub-system adjusts the beam in response to the signal from the monitor.Type: GrantFiled: December 9, 2013Date of Patent: November 11, 2014Assignee: 3M Innovative Properties CompanyInventors: Robert J. DeVoe, Brian J. Gates, Dean Faklis, Robert T. Krasa, Przemyslaw P. Markowicz, Craig R. Sykora
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Patent number: 8858807Abstract: A process for making a microneedle array master comprises: (a) providing a photoreactive composition, the photoreactive composition comprising: (1) at least one reactive species that is capable of undergoing an acid- or radical-initiated chemical reaction, and (2) at least one multiphoton photoinitiator system; and (b) imagewise exposing at least a portion of the composition to light sufficient to cause simultaneous absorption of at least two photons, thereby inducing at least one acid- or radical-initiated chemical reaction where the composition is exposed to the light, the imagewise exposing being carried out in a pattern that is effective to define at least the surface of a plurality of microneedles. The microneedles may be solid and the outer surface of the microneedles may be characterized by at least one concave area. The master may be used to fabricate a tool for replication.Type: GrantFiled: March 23, 2007Date of Patent: October 14, 2014Assignee: 3M Innovative Properties CompanyInventors: Robert J. DeVoe, Dennis E. Ferguson, Franklyn L. Frederickson, Mitchell A. F. Johnson, Mikhail L. Pekurovsky, Craig R. Sykora, Jeremy K. Larsen
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Publication number: 20140092372Abstract: An exposure system includes a light source emitting a beam along an optical axis that is capable of inducing a multi-photon reaction in a resin. The exposure system further includes a resin undergoing multiphoton reaction, as well as an automated system including a monitor that measures at least one property of the beam selected from power, pulse length, shape, divergence, or position in a plane normal to the optical axis. The monitor generates at least one signal indicative of the property of the beam, and a sub-system adjusts the beam in response to the signal from the monitor.Type: ApplicationFiled: December 9, 2013Publication date: April 3, 2014Applicant: 3M INNOVATIVE PROPERTIES COMPANYInventors: Robert J. DeVoe, Brian J. Gates, Dean Faklis, Robert T. Krasa, Przemyslaw P. Markowicz, Craig R. Sykora
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Patent number: 8605256Abstract: An exposure system includes a light source emitting a beam along an optical axis that is capable of inducing a multi-photon reaction in a resin. The exposure system further includes a resin undergoing multiphoton reaction, as well as an automated system including a monitor that measures at least one property of the beam selected from power, pulse length, shape, divergence, or position in a plane normal to the optical axis. The monitor generates at least one signal indicative of the property of the beam, and a sub-system adjusts the beam in response to the signal from the monitor.Type: GrantFiled: February 17, 2009Date of Patent: December 10, 2013Assignee: 3M Innovative Properties CompanyInventors: Robert J. DeVoe, Brian J. Gates, Dean Faklis, Robert T. Krasa, Przemyslaw P. Markowicz, Craig R. Sykora
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Patent number: 8455846Abstract: A method includes scanning a radiation beam with respect to a multi-photon curable photoreactive composition. The radiation beam includes a power sufficient to at least partially cure a volume of the multiphoton curable photoreactive composition. The method further includes modifying a characteristic of the radiation beam as the radiation beam is scanned.Type: GrantFiled: November 6, 2008Date of Patent: June 4, 2013Assignee: 3M Innovative Properties CompanyInventors: Brian J. Gates, Robert T. Krasa, Przemyslaw P. Markowicz, Craig R. Sykora, Robert J. DeVoe, Dean Faklis
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Patent number: 8451457Abstract: A system comprising a substrate having thereon a multiphoton curable photoreactive composition, a light source that emits a light beam comprising a plurality of wavelengths onto at least one region of the composition on the substrate, and a detector that detects a portion of light reflected from the composition to obtain a location signal with respect to the substrate, wherein the location signal is based at least on a wavelength of the reflected light.Type: GrantFiled: October 3, 2008Date of Patent: May 28, 2013Assignee: 3m Innovative Properties CompanyInventors: Brian J. Gates, Craig R. Sykora, Dean Faklis, Andrew J. Murnan, Nestor O. Farmiga
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Patent number: 8004767Abstract: A process for making a microlens array or a microlens array masterform comprises (a) providing a photoreactive composition, the photoreactive composition comprising (1) at least one reactive species that is capable of undergoing an acid- or radical-initiated chemical reaction, and (2) at least one multiphoton photoinitiator system; and (b) imagewise exposing at least a portion of the composition to light sufficient to cause simultaneous absorption of at least two photons, thereby inducing at least one acid- or radical-initiated chemical reaction where the composition is exposed to the light, the imagewise exposing being carried out in a pattern that is effective to define at least the surface of a plurality of microlenses, each of the microlenses having a principal axis and a focal length, and at least one of the microlenses being an aspherical microlens.Type: GrantFiled: July 27, 2009Date of Patent: August 23, 2011Assignee: 3M Innovative Properties CompanyInventors: Robert J. DeVoe, Dora M. Paolucci, Craig R. Sykora, Todd A. Ballen, Douglas S. Dunn, Jeffrey M. Florczak, Catherine A. Leatherdale
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Patent number: 7893410Abstract: A method including providing a substrate having thereon a layer including a multiphoton polymerizable composition, applying a light beam to at least one region of the layer, wherein the light beam cures or initiates cure of the multiphoton curable photoreactive composition; and processing a portion of the light beam reflected off the substrate to obtain a location signal of an interface between the layer and the substrate at each region.Type: GrantFiled: December 20, 2006Date of Patent: February 22, 2011Assignee: 3M Innovative Properties CompanyInventors: Craig R. Sykora, Steven C. Reed, Serge Wetzels, Catherine A. Leatherdale, Matthew R. C. Atkinson
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Publication number: 20110001950Abstract: An exposure system includes a light source emitting a beam along an optical axis that is capable of inducing a multi-photon reaction in a resin. The exposure system further includes a resin undergoing multiphoton reaction, as well as an automated system including a monitor that measures at least one property of the beam selected from power, pulse length, shape, divergence, or position in a plane normal to the optical axis. The monitor generates at least one signal indicative of the property of the beam, and a sub-system adjusts the beam in response to the signal from the monitor.Type: ApplicationFiled: February 17, 2009Publication date: January 6, 2011Inventors: Robert J. DeVoe, Brian J. Gates, Dean Faklis, Robert T. Krasa, Przemyslaw P. Markowicz, Craig R. Sykora
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Publication number: 20100296106Abstract: A system comprising a substrate having thereon a multiphoton curable photoreactive composition, a light source that emits a light beam comprising a plurality of wavelengths onto at least one region of the composition on the substrate, and a detector that detects a portion of light reflected from the composition to obtain a location signal with respect to the substrate, wherein the location signal is based at least on a wavelength of the reflected light.Type: ApplicationFiled: October 3, 2008Publication date: November 25, 2010Inventors: Brian J. Gates, Craig R. Sykora, Dean Faklis, Andrew J. Murnan, Nestor O. Farmiga
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Publication number: 20090284840Abstract: A process for making a microlens array or a microlens array masterform comprises (a) providing a photoreactive composition, the photoreactive composition comprising (1) at least one reactive species that is capable of undergoing an acid- or radical-initiated chemical reaction, and (2) at least one multiphoton photoinitiator system; and (b) imagewise exposing at least a portion of the composition to light sufficient to cause simultaneous absorption of at least two photons, thereby inducing at least one acid- or radical-initiated chemical reaction where the composition is exposed to the light, the imagewise exposing being carried out in a pattern that is effective to define at least the surface of a plurality of microlenses, each of the microlenses having a principal axis and a focal length, and at least one of the microlenses being an aspherical microlens.Type: ApplicationFiled: July 27, 2009Publication date: November 19, 2009Inventors: Robert J. DeVoe, Dora M. Paolucci, Craig R. Sykora, Todd A. Ballen, Douglas S. Dunn, Jeffrey M. Florczak, Catherine A. Leatherdale
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Publication number: 20090250635Abstract: A method including providing a substrate having thereon a layer including a multiphoton polymerizable composition, applying a light beam to at least one region of the layer, wherein the light beam cures or initiates cure of the multiphoton curable photoreactive composition; and processing a portion of the light beam reflected off the substrate to obtain a location signal of an interface between the layer and the substrate at each region.Type: ApplicationFiled: December 20, 2006Publication date: October 8, 2009Inventors: Craig R. Sykora, Steven C. Reed, Serge Wetzels, Catherine A. Leatherdale, Matthew R. C. Atkinson
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Patent number: 7583444Abstract: A process for making a microlens array or a microlens array masterform comprises (a) providing a photoreactive composition, the photoreactive composition comprising (1) at least one reactive species that is capable of undergoing an acid- or radical-initiated chemical reaction, and (2) at least one multiphoton photoinitiator system; and (b) imagewise exposing at least a portion of the composition to light sufficient to cause simultaneous absorption of at least two photons, thereby inducing at least one acid- or radical-initiated chemical reaction where the composition is exposed to the light, the imagewise exposing being carried out in a pattern that is effective to define at least the surface of a plurality of microlenses, each of the microlenses having a principal axis and a focal length, and at least one of the microlenses being an aspherical microlens.Type: GrantFiled: December 21, 2005Date of Patent: September 1, 2009Assignee: 3M Innovative Properties CompanyInventors: Robert J. DeVoe, Dora M. Paolucci, Craig R. Sykora, Todd A. Ballen, Douglas S. Dunn, Jeffrey M. Florczak, Catherine A. Leatherdale
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Patent number: D873517Type: GrantFiled: July 21, 2017Date of Patent: January 21, 2020Assignee: 3M INNOVATIVE PROPERTIES COMPANYInventors: Lijun Zu, Sarah L. Hagen, Kim C. Sachs, Jr., Craig R. Sykora
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Patent number: D893974Type: GrantFiled: January 4, 2019Date of Patent: August 25, 2020Assignee: 3M INNOVATIVE PROPERTIES COMPANYInventors: Lijun Zu, Jonathan C. Dilley, Donald T. Landin, Anthony D. Deutsch, Andrew C. Anderson, Craig R. Sykora
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Patent number: D946845Type: GrantFiled: July 19, 2018Date of Patent: March 22, 2022Assignee: 3M INNOVATIVE PROPERTIES COMPANYInventors: Adrian H. Cook, Sarah L. Hagen, Astghik Poladyan, David C. Raithel, Craig R. Sykora