Patents by Inventor Craig R. Sykora

Craig R. Sykora has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20170357347
    Abstract: Touch sensitive projection screens are disclosed. In particular, touch sensitive projection screen including drive electrodes, sense electrodes, and optical diffusers are disclosed. The touch sensitive projection screens are adapted for use on a horizontal surface. Touch sensitive projection screens including shrinkable layers are also disclosed.
    Type: Application
    Filed: October 23, 2015
    Publication date: December 14, 2017
    Inventors: Steven T. Swartz, Hui Luo, Neeraj Sharma, Robert A. Yapel, Ronald L. Imken, Jung-Sheng Wu, David T. Yust, Richard J. Pokorny, Lan H. Liu, Craig R. Sykora, David J. McDaniel, Yu Yang, Mitchell A.F. Johnson
  • Publication number: 20170166750
    Abstract: Presently described are hardcoat compositions comprising at least one first (meth)acrylate monomer comprising at least three (meth)acrylate groups and C2-C4 alkoxy repeat units wherein the monomer has a molecular weight per (meth)acrylate group ranging from about 220 to 375 g/mole and at least one second (meth)acrylate monomer comprising at least three (meth)acrylate groups. In one embodiment, the hardcoat composition further comprises and at least 50 wt-% solids of silica nanoparticles. Also described are articles, such as protective films, displays, and touch screens comprising such cured hardcoat compositions.
    Type: Application
    Filed: February 24, 2017
    Publication date: June 15, 2017
    Inventors: Richard J. Pokorny, Steven D. Solomonson, Robert F. Kamrath, Anthony M. Renstrom, Roger W. Barton, Craig R. Sykora
  • Publication number: 20160326383
    Abstract: Presently described are hardcoat compositions comprising at least one first (meth)acrylate monomer comprising at least three (meth)acrylate groups and C2-C4 alkoxy repeat units wherein the monomer has a molecular weight per (meth)acrylate group ranging from about 220 to 375 g/mole and at least one second (meth)acrylate monomer comprising at least three (meth)acrylate groups. The hardcoat composition further comprises inorganic oxide nanoparticles such as silica that comprises a copolymer izable surface treatment and a non-copolymerizable silane surface treatment. Also described are articles, such as protective films, displays, and touch screens comprising such cured hardcoat compositions.
    Type: Application
    Filed: January 13, 2015
    Publication date: November 10, 2016
    Inventors: Richard J. Pokorny, Robert F. Kamrath, Michelle L. Toy, Steven D. Solomonson, Elisa M. Cross, Anthony M. Renstrom, Roger W. Barton, Craig R. Sykora
  • Publication number: 20150132583
    Abstract: Presently described are hardcoat compositions comprising at least one first (meth)acrylate monomer comprising at least three (meth)acrylate groups and C2-C4 alkoxy repeat units wherein the monomer has a molecular weight per (meth)acrylate group ranging from about 220 to 375 g/mole and at least one second (meth)acrylate monomer comprising at least three (meth)acrylate groups. In one embodiment, the hardcoat composition further comprises and at least 30 wt-% solids of silica nanoparticles having an average particle size ranging from 50 to 150 nm. In another embodiment, the hardcoat composition further comprises and at least 30 wt-% solids of inorganic oxide nanoparticles having an average particle size ranging from 50 to 150 nm. Also described are articles, such as protective films, displays, and touch screens comprising such cured hardcoat compositions.
    Type: Application
    Filed: July 10, 2013
    Publication date: May 14, 2015
    Applicant: 3M INNOVATIVE PROPERTIES COMPANY
    Inventors: Richard J. Pokorny, Steven D. Solomonson, Robert F. Kamrath, Anthony M. Renstrom, Roger W. Barton, Craig R. Sykora
  • Patent number: 8885146
    Abstract: An exposure system includes a light source emitting a beam along an optical axis that is capable of inducing a multi-photon reaction in a resin. The exposure system further includes a resin undergoing multiphoton reaction, as well as an automated system including a monitor that measures at least one property of the beam selected from power, pulse length, shape, divergence, or position in a plane normal to the optical axis. The monitor generates at least one signal indicative of the property of the beam, and a sub-system adjusts the beam in response to the signal from the monitor.
    Type: Grant
    Filed: December 9, 2013
    Date of Patent: November 11, 2014
    Assignee: 3M Innovative Properties Company
    Inventors: Robert J. DeVoe, Brian J. Gates, Dean Faklis, Robert T. Krasa, Przemyslaw P. Markowicz, Craig R. Sykora
  • Patent number: 8858807
    Abstract: A process for making a microneedle array master comprises: (a) providing a photoreactive composition, the photoreactive composition comprising: (1) at least one reactive species that is capable of undergoing an acid- or radical-initiated chemical reaction, and (2) at least one multiphoton photoinitiator system; and (b) imagewise exposing at least a portion of the composition to light sufficient to cause simultaneous absorption of at least two photons, thereby inducing at least one acid- or radical-initiated chemical reaction where the composition is exposed to the light, the imagewise exposing being carried out in a pattern that is effective to define at least the surface of a plurality of microneedles. The microneedles may be solid and the outer surface of the microneedles may be characterized by at least one concave area. The master may be used to fabricate a tool for replication.
    Type: Grant
    Filed: March 23, 2007
    Date of Patent: October 14, 2014
    Assignee: 3M Innovative Properties Company
    Inventors: Robert J. DeVoe, Dennis E. Ferguson, Franklyn L. Frederickson, Mitchell A. F. Johnson, Mikhail L. Pekurovsky, Craig R. Sykora, Jeremy K. Larsen
  • Publication number: 20140092372
    Abstract: An exposure system includes a light source emitting a beam along an optical axis that is capable of inducing a multi-photon reaction in a resin. The exposure system further includes a resin undergoing multiphoton reaction, as well as an automated system including a monitor that measures at least one property of the beam selected from power, pulse length, shape, divergence, or position in a plane normal to the optical axis. The monitor generates at least one signal indicative of the property of the beam, and a sub-system adjusts the beam in response to the signal from the monitor.
    Type: Application
    Filed: December 9, 2013
    Publication date: April 3, 2014
    Applicant: 3M INNOVATIVE PROPERTIES COMPANY
    Inventors: Robert J. DeVoe, Brian J. Gates, Dean Faklis, Robert T. Krasa, Przemyslaw P. Markowicz, Craig R. Sykora
  • Patent number: 8605256
    Abstract: An exposure system includes a light source emitting a beam along an optical axis that is capable of inducing a multi-photon reaction in a resin. The exposure system further includes a resin undergoing multiphoton reaction, as well as an automated system including a monitor that measures at least one property of the beam selected from power, pulse length, shape, divergence, or position in a plane normal to the optical axis. The monitor generates at least one signal indicative of the property of the beam, and a sub-system adjusts the beam in response to the signal from the monitor.
    Type: Grant
    Filed: February 17, 2009
    Date of Patent: December 10, 2013
    Assignee: 3M Innovative Properties Company
    Inventors: Robert J. DeVoe, Brian J. Gates, Dean Faklis, Robert T. Krasa, Przemyslaw P. Markowicz, Craig R. Sykora
  • Patent number: 8455846
    Abstract: A method includes scanning a radiation beam with respect to a multi-photon curable photoreactive composition. The radiation beam includes a power sufficient to at least partially cure a volume of the multiphoton curable photoreactive composition. The method further includes modifying a characteristic of the radiation beam as the radiation beam is scanned.
    Type: Grant
    Filed: November 6, 2008
    Date of Patent: June 4, 2013
    Assignee: 3M Innovative Properties Company
    Inventors: Brian J. Gates, Robert T. Krasa, Przemyslaw P. Markowicz, Craig R. Sykora, Robert J. DeVoe, Dean Faklis
  • Patent number: 8451457
    Abstract: A system comprising a substrate having thereon a multiphoton curable photoreactive composition, a light source that emits a light beam comprising a plurality of wavelengths onto at least one region of the composition on the substrate, and a detector that detects a portion of light reflected from the composition to obtain a location signal with respect to the substrate, wherein the location signal is based at least on a wavelength of the reflected light.
    Type: Grant
    Filed: October 3, 2008
    Date of Patent: May 28, 2013
    Assignee: 3m Innovative Properties Company
    Inventors: Brian J. Gates, Craig R. Sykora, Dean Faklis, Andrew J. Murnan, Nestor O. Farmiga
  • Patent number: 8004767
    Abstract: A process for making a microlens array or a microlens array masterform comprises (a) providing a photoreactive composition, the photoreactive composition comprising (1) at least one reactive species that is capable of undergoing an acid- or radical-initiated chemical reaction, and (2) at least one multiphoton photoinitiator system; and (b) imagewise exposing at least a portion of the composition to light sufficient to cause simultaneous absorption of at least two photons, thereby inducing at least one acid- or radical-initiated chemical reaction where the composition is exposed to the light, the imagewise exposing being carried out in a pattern that is effective to define at least the surface of a plurality of microlenses, each of the microlenses having a principal axis and a focal length, and at least one of the microlenses being an aspherical microlens.
    Type: Grant
    Filed: July 27, 2009
    Date of Patent: August 23, 2011
    Assignee: 3M Innovative Properties Company
    Inventors: Robert J. DeVoe, Dora M. Paolucci, Craig R. Sykora, Todd A. Ballen, Douglas S. Dunn, Jeffrey M. Florczak, Catherine A. Leatherdale
  • Patent number: 7893410
    Abstract: A method including providing a substrate having thereon a layer including a multiphoton polymerizable composition, applying a light beam to at least one region of the layer, wherein the light beam cures or initiates cure of the multiphoton curable photoreactive composition; and processing a portion of the light beam reflected off the substrate to obtain a location signal of an interface between the layer and the substrate at each region.
    Type: Grant
    Filed: December 20, 2006
    Date of Patent: February 22, 2011
    Assignee: 3M Innovative Properties Company
    Inventors: Craig R. Sykora, Steven C. Reed, Serge Wetzels, Catherine A. Leatherdale, Matthew R. C. Atkinson
  • Publication number: 20110001950
    Abstract: An exposure system includes a light source emitting a beam along an optical axis that is capable of inducing a multi-photon reaction in a resin. The exposure system further includes a resin undergoing multiphoton reaction, as well as an automated system including a monitor that measures at least one property of the beam selected from power, pulse length, shape, divergence, or position in a plane normal to the optical axis. The monitor generates at least one signal indicative of the property of the beam, and a sub-system adjusts the beam in response to the signal from the monitor.
    Type: Application
    Filed: February 17, 2009
    Publication date: January 6, 2011
    Inventors: Robert J. DeVoe, Brian J. Gates, Dean Faklis, Robert T. Krasa, Przemyslaw P. Markowicz, Craig R. Sykora
  • Publication number: 20100296106
    Abstract: A system comprising a substrate having thereon a multiphoton curable photoreactive composition, a light source that emits a light beam comprising a plurality of wavelengths onto at least one region of the composition on the substrate, and a detector that detects a portion of light reflected from the composition to obtain a location signal with respect to the substrate, wherein the location signal is based at least on a wavelength of the reflected light.
    Type: Application
    Filed: October 3, 2008
    Publication date: November 25, 2010
    Inventors: Brian J. Gates, Craig R. Sykora, Dean Faklis, Andrew J. Murnan, Nestor O. Farmiga
  • Publication number: 20090284840
    Abstract: A process for making a microlens array or a microlens array masterform comprises (a) providing a photoreactive composition, the photoreactive composition comprising (1) at least one reactive species that is capable of undergoing an acid- or radical-initiated chemical reaction, and (2) at least one multiphoton photoinitiator system; and (b) imagewise exposing at least a portion of the composition to light sufficient to cause simultaneous absorption of at least two photons, thereby inducing at least one acid- or radical-initiated chemical reaction where the composition is exposed to the light, the imagewise exposing being carried out in a pattern that is effective to define at least the surface of a plurality of microlenses, each of the microlenses having a principal axis and a focal length, and at least one of the microlenses being an aspherical microlens.
    Type: Application
    Filed: July 27, 2009
    Publication date: November 19, 2009
    Inventors: Robert J. DeVoe, Dora M. Paolucci, Craig R. Sykora, Todd A. Ballen, Douglas S. Dunn, Jeffrey M. Florczak, Catherine A. Leatherdale
  • Publication number: 20090250635
    Abstract: A method including providing a substrate having thereon a layer including a multiphoton polymerizable composition, applying a light beam to at least one region of the layer, wherein the light beam cures or initiates cure of the multiphoton curable photoreactive composition; and processing a portion of the light beam reflected off the substrate to obtain a location signal of an interface between the layer and the substrate at each region.
    Type: Application
    Filed: December 20, 2006
    Publication date: October 8, 2009
    Inventors: Craig R. Sykora, Steven C. Reed, Serge Wetzels, Catherine A. Leatherdale, Matthew R. C. Atkinson
  • Patent number: 7583444
    Abstract: A process for making a microlens array or a microlens array masterform comprises (a) providing a photoreactive composition, the photoreactive composition comprising (1) at least one reactive species that is capable of undergoing an acid- or radical-initiated chemical reaction, and (2) at least one multiphoton photoinitiator system; and (b) imagewise exposing at least a portion of the composition to light sufficient to cause simultaneous absorption of at least two photons, thereby inducing at least one acid- or radical-initiated chemical reaction where the composition is exposed to the light, the imagewise exposing being carried out in a pattern that is effective to define at least the surface of a plurality of microlenses, each of the microlenses having a principal axis and a focal length, and at least one of the microlenses being an aspherical microlens.
    Type: Grant
    Filed: December 21, 2005
    Date of Patent: September 1, 2009
    Assignee: 3M Innovative Properties Company
    Inventors: Robert J. DeVoe, Dora M. Paolucci, Craig R. Sykora, Todd A. Ballen, Douglas S. Dunn, Jeffrey M. Florczak, Catherine A. Leatherdale
  • Publication number: 20090099537
    Abstract: A process for making a microneedle array master comprises: (a) providing a photoreactive composition, the photoreactive composition comprising: (1) at least one reactive species that is capable of undergoing an acid- or radical-initiated chemical reaction, and (2) at least one multiphoton photoinitiator system; and (b) imagewise exposing at least a portion of the composition to light sufficient to cause simultaneous absorption of at least two photons, thereby inducing at least one acid- or radical-initiated chemical reaction where the composition is exposed to the light, the imagewise exposing being carried out in a pattern that is effective to define at least the surface of a plurality of microneedles. The microneedles may be solid and the outer surface of the microneedles may be characterized by at least one concave area. The master may be used to fabricate a tool for replication.
    Type: Application
    Filed: March 23, 2007
    Publication date: April 16, 2009
    Inventors: Robert J. DeVoe, Dennis E. Ferguson, Franklyn L. Frederickson, Mitchell A.F. Johnson, Mikhail L. Pekurovsky, Craig R. Sykora, Jeremy K. Larsen
  • Patent number: D873517
    Type: Grant
    Filed: July 21, 2017
    Date of Patent: January 21, 2020
    Assignee: 3M INNOVATIVE PROPERTIES COMPANY
    Inventors: Lijun Zu, Sarah L. Hagen, Kim C. Sachs, Jr., Craig R. Sykora
  • Patent number: D893974
    Type: Grant
    Filed: January 4, 2019
    Date of Patent: August 25, 2020
    Assignee: 3M INNOVATIVE PROPERTIES COMPANY
    Inventors: Lijun Zu, Jonathan C. Dilley, Donald T. Landin, Anthony D. Deutsch, Andrew C. Anderson, Craig R. Sykora