Abstract: A water treatment system includes a water passage, a magnet and a hydroxyl radical generator. Water flows through the water passage. The magnet is adjacent to the water passage and produces a magnetic field in the water passage, The hydroxyl radical generator generates hydroxyl radicals in the water in the water passage. A water treatment method includes the steps of providing a water passage, producing a magnetic field in the water passage, flowing water through the magnetic field and generating, while the water is in the magnetic field, hydroxyl radicals in the water. The water can be recirculated through the water passage a number of times.

Abstract: A method of calibrating a robot in a processing system is provided. The method includes removably coupling a distance sensor to an end effector of the robot and causing the distance sensor to measure a distance from the sensor to a substrate support. Then it is determined whether the distance meets or is within a selected threshold. Robot joint positions are recorded when the distance meets or is within the selected threshold.

Abstract: A wireless sensor includes at least one capacitive plate for sensing a distance relative to an object of interest within a semiconductor-processing environment. The sensor includes an internal power source and wireless communication such that distance and/or parallelism measurements effected using the capacitive plate(s) can be provided wirelessly to an external device.

Abstract: A wireless substrate-like sensor is provided to facilitate alignment and calibration of semiconductor processing systems. The wireless substrate-like sensor includes an optical image acquisition system that acquires one or more images of targets placed within the semiconductor processing system. Analysis of images of the targets obtained by the wireless substrate-like sensor provides position and/or orientation information in at least three degrees of freedom. An additional target is affixed to a known location within the semiconductor processing system such that imaging the reference position with the wireless substrate-like sensor allows the measurement and compensation for pick-up errors.

Abstract: A wireless substrate-like sensor is provided to facilitate alignment and calibration of semiconductor processing systems. The wireless substrate-like sensor includes an optical image acquisition system that acquires one or more images of targets placed within the semiconductor processing system. Analysis of images of the targets obtained by the wireless substrate-like sensor provides position and/or orientation information in at least three degrees of freedom. An additional target is affixed to a known location within the semiconductor processing system such that imaging the reference position with the wireless substrate-like sensor allows the measurement and compensation for pick-up errors.

Abstract: In accordance with one aspect of the present invention, a wireless substrate-like sensor is provided having at least one weight-reducing feature. The feature can include the type of material from which the sensor is constructed, such as aluminum, an aluminum alloy, magnesium, or ceramic. The feature can also include one or more structural adaptations such as holes, whether through or partial, and struts.

Abstract: In accordance with an aspect of the present invention, a wireless substrate-like sensor is configured to be low-profile. One exemplary low-profile design includes using an image acquisition system on a leadless ceramic carrier chip. Then a circuit board, or rigid interconnect, is provided with a recess to accommodate the image acquisition system. The image acquisition system is disposed within the recess and coupled to the board through the periphery of the leadless ceramic carrier chip.

Abstract: In accordance with an aspect of the present invention, a wireless substrate-like sensor is configured to ensure it does not contaminate a semiconductor processing chamber. The sensor is sealed except for one or more apertures. In one embodiment, a vent is disposed proximate the apertures. In another embodiment, the aperture is coupled to a pressure equalization member that deforms in response to a differential in pressure between the sensor interior and exterior.

Abstract: Embodiments of the present invention generally provide accurate spatial determination, in three dimensions, of the wafer location, along with the provision of information about the presence of any error conditions relative to the wafer(s) such as cross slotting or double stacked wafers inside the wafer carrier. A device in accordance with an embodiment of the invention can be used in conjunction with a wafer handling system which requires the measurement of a wafer's location before it can be picked up and passed through a set of processing steps.

Abstract: Disclosed herein is a tank valve for tank-type toilets comprised of a closed upper portion adapted to extend across the opening of a valve seat, and a hollow lower portion extending downwardly from adjacent the upper portion and adapted to extend within the opening of the valve seat. The lower portion is provided with a vent hole to permit air to escape therefrom to counteract the normal buoyancy of the tank valve. Such an arrangement allows the tank valve to close and terminate the flush without having to utilize the entire supply of flush water contained in the toilet tank.