Patents by Inventor Cristina Camagong

Cristina Camagong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11959874
    Abstract: A nanostructure includes a base layer including a surface. The nanostructure further includes nano-patterned features including non-random topography located on the surface of the base layer. The nanostructure also includes an encapsulating layer including a conductive material arranged on the nano-patterned features.
    Type: Grant
    Filed: November 29, 2018
    Date of Patent: April 16, 2024
    Assignee: International Business Machines Corporation
    Inventors: Cristina Camagong, Hariklia Deligianni, Emily R. Kinser, Roy Yu
  • Patent number: 11562907
    Abstract: A method for forming a nanostructure includes coating an exposed surface of a base layer with a patterning layer. The method further includes forming a pattern in the patterning layer including nano-patterned non-random openings, such that a bottom portion of the non-random openings provides direct access to the exposed surface of the base layer. The method also includes depositing a material in the non-random openings in the patterning layer, such that the material contacts the exposed surface to produce repeating individually articulated nano-scale features. The method includes removing remaining portions of the patterning layer. The method further includes forming an encapsulation layer on exposed surfaces of the repeating individually articulated nanoscale features and the exposed surface of the base layer.
    Type: Grant
    Filed: November 29, 2018
    Date of Patent: January 24, 2023
    Assignee: International Business Machines Corporation
    Inventors: Cristina Camagong, Hariklia Deligianni, Damon B. Farmer, Andrei Fustochenko, Ying He, Emily R. Kinser, Yu Luo, Roy R. Yu
  • Publication number: 20200176262
    Abstract: A method for forming a nanostructure includes coating an exposed surface of a base layer with a patterning layer. The method further includes forming a pattern in the patterning layer including nano-patterned non-random openings, such that a bottom portion of the non-random openings provides direct access to the exposed surface of the base layer. The method also includes depositing a material in the non-random openings in the patterning layer, such that the material contacts the exposed surface to produce repeating individually articulated nano-scale features. The method includes removing remaining portions of the patterning layer. The method further includes forming an encapsulation layer on exposed surfaces of the repeating individually articulated nanoscale features and the exposed surface of the base layer.
    Type: Application
    Filed: November 29, 2018
    Publication date: June 4, 2020
    Inventors: Cristina Camagong, Hariklia Deligianni, Damon B. Farmer, Andrei Fustochenko, Ying He, Emily R. Kinser, Yu Luo, Roy Yu
  • Publication number: 20200173953
    Abstract: A nanostructure includes a base layer including a surface. The nanostructure further includes nano-patterned features including non-random topography located on the surface of the base layer. The nanostructure also includes an encapsulating layer including a conductive material arranged on the nano-patterned features.
    Type: Application
    Filed: November 29, 2018
    Publication date: June 4, 2020
    Inventors: Cristina Camagong, Hariklia Deligianni, Emily R. Kinser, Roy Yu