Patents by Inventor Cristina Crespi

Cristina Crespi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11755862
    Abstract: There is provided a method for rendering an image according to selected image quality attributes. Two or more image quality attributes are selected from a plurality of attributes of the image. A set of pigments for an area of the image and a density for each pixel of the area are determined. A quantity of pretreatment for deposition onto a print target is determined, where the pretreatment quantity is dependent on the pigments, the density, and the selected image quality attributes.
    Type: Grant
    Filed: April 9, 2018
    Date of Patent: September 12, 2023
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Marta Blanch Pinol, Cristina Crespi Argemi, Sara Echevarria Benito
  • Publication number: 20210110221
    Abstract: There is provided a method for rendering an image according to selected image quality attributes. Two or more image quality attributes are selected from a plurality of attributes of the image. A set of pigments for an area of the image and a density for each pixel of the area are determined. A quantity of pretreatment for deposition onto a print target is determined, where the pretreatment quantity is dependent on the pigments, the density, and the selected image quality attributes.
    Type: Application
    Filed: April 9, 2018
    Publication date: April 15, 2021
    Inventors: Marta Blanch Pinol, Cristina Crespi Argemi, Sara Echevarria Benito
  • Publication number: 20200148906
    Abstract: A method, in a printing system comprising a carriage that includes a first print head for depositing a first print fluid on a substrate and a second print head for depositing a second print fluid on the substrate, in which the method comprises using the second print head, pre-treating the substrate to obstruct print fluid migration into a porous structure of the substrate by depositing a post-print-treatment fluid over at least a portion of the substrate prior to deposition of the first print fluid on the substrate.
    Type: Application
    Filed: April 17, 2017
    Publication date: May 14, 2020
    Inventors: Marta BLANCH PIÑOL, Cristina CRESPI, Jennifer KORNGIEBEL
  • Patent number: 6799823
    Abstract: One aspect of the invention lowers boundary artifacts by depleting selectively at a boundary, only in high-color-saturation areas. In another aspect, printmasking defines depletion regions. In yet another, a printer treats different drop-to-pass allocations as of opposite sign. Some preferred embodiments exploit the multilayer Shakes mask system: each mask represents a number of drops to fire, and masks are additive, depending on image content. In preferred embodiments the high-value mask is used in opposition, reducing the number of drops to fire. Bits are set in this mask at pixels close to boundaries, to define depletion regions that negate artifact-causing boundary coalescence. An adaptive version measures nonuniformity in an area-fill test pattern, and uses results to define localized depletion bits for high-value mask(s).
    Type: Grant
    Filed: September 5, 2002
    Date of Patent: October 5, 2004
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Antoni Gil Miquel, Cristina Crespi, Francisco Guerrero, Santiago Garcia Reyero, Sascha de Peña
  • Publication number: 20040046816
    Abstract: One aspect of the invention lowers boundary artifacts by depleting selectively at a boundary, only in high-color-saturation areas. In another aspect, printmasking defines depletion regions. In yet another, a printer treats different drop-to-pass allocations as of opposite sign. Some preferred embodiments exploit the multilayer Shakes mask system: each mask represents a number of drops to fire, and masks are additive, depending on image content. In preferred embodiments the high-value mask is used in opposition, reducing the number of drops to fire. Bits are set in this mask at pixels close to boundaries, to define depletion regions that negate artifact-causing boundary coalescence. An adaptive version measures nonuniformity in an area-fill test pattern, and uses results to define localized depletion bits for high-value mask(s).
    Type: Application
    Filed: September 5, 2002
    Publication date: March 11, 2004
    Inventors: Antoni Gil Miquel, Cristina Crespi, Francisco Guerrero, Santiago Garcia Reyero, Sascha de Pena