Patents by Inventor Cristopher Mark Pavloff

Cristopher Mark Pavloff has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process kit for substrate processing chamber
    Patent number: 7981262
    Abstract: A process kit comprises a shield and ring assembly positioned about a substrate support in a processing chamber to reduce deposition of process deposits on internal chamber components and an overhang edge of the substrate. The shield comprises a cylindrical band having a top wall that surrounds a sputtering target and a bottom wall that surrounds the substrate support, a support ledge, a sloped step, and a U-shaped channel with gas conductance holes. The ring assembly comprises a deposition ring and cover ring, the cover ring having a bulb-shaped protuberance about the periphery of the ring.
    Type: Grant
    Filed: January 29, 2007
    Date of Patent: July 19, 2011
    Assignee: Applied Materials, Inc.
    Inventors: Cristopher Mark Pavloff, Ilyoung Hong
  • COOLING SHIELD FOR SUBSTRATE PROCESSING CHAMBER
    Publication number: 20080257263
    Abstract: A process kit comprises an upper shield to encircle a sputtering target in a substrate processing chamber, to reduce deposition of process deposits on the chamber components and the overhanging edge of the substrate. The shield described is of unitary construction with a top ring, support ledge and cylindrical band having a plurality of steps.
    Type: Application
    Filed: April 23, 2007
    Publication date: October 23, 2008
    Inventors: Cristopher Mark Pavloff, Kathleen Scheible
  • PROCESS KIT FOR SUBSTRATE PROCESSING CHAMBER
    Publication number: 20080178801
    Abstract: A process kit comprises a shield and ring assembly positioned about a substrate support in a processing chamber to reduce deposition of process deposits on internal chamber components and an overhang edge of the substrate. The shield comprises a cylindrical band having a top wall that surrounds a sputtering target and a bottom wall that surrounds the substrate support, a support ledge, a sloped step, and a U-shaped channel with gas conductance holes. The ring assembly comprises a deposition ring and cover ring, the cover ring having a bulb-shaped protuberance about the periphery of the ring.
    Type: Application
    Filed: January 29, 2007
    Publication date: July 31, 2008
    Inventors: Cristopher Mark Pavloff, Ilyoung Hong