Patents by Inventor Crystal J. Hass

Crystal J. Hass has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for forming an ion implanted electrostatic chuck
    Patent number: 6115232
    Abstract: The present invention provides a method for forming an electrostatic chuck. A chuck body is provided in which the chuck body includes an insulating layer. Metal is implanted into a surface of the chuck body, wherein a conductive layer of metal is formed within the insulating layer of the chuck body.
    Type: Grant
    Filed: December 3, 1998
    Date of Patent: September 5, 2000
    Assignee: LSI Logic Corporation
    Inventors: Crystal J. Hass, Patrick J. Kelleher
  • Method for improved gate oxide integrity on bulk silicon
    Patent number: 6096625
    Abstract: The present invention provides a method for manufacturing a semiconductor device on a substrate. The process involves denuding the substrate by heating to create a denuded zone within the substrate. A screen oxide layer is formed prior to implanting ions into the substrate. This oxide layer remains during the implantation step. The screen oxide layer is removed when forming gates for the semiconductor device.
    Type: Grant
    Filed: October 20, 1997
    Date of Patent: August 1, 2000
    Assignee: LSI Logic Corporation
    Inventors: David W. Daniel, Theodore C. Moore, Crystal J. Hass
  • Method for manufacturing a monitor element
    Patent number: 5576224
    Abstract: A method and structure for sensing data such as temperature with respect to objects such as silicon wafers undergoing fabrication or other processes involve the use of a monitor element of material and configuration similar to that of the objects being processed. A structure such as a closed loop or segment of a spiral may be formed on the surface of the monitor element, and acts as a secondary coil when brought into operative relation with a transformer structure which includes a primary coil, a current source and a sensing device. The sensing device senses variations in the electrical characteristics in the primary coil, caused by the presence of the monitor element, and can thereby determine the temperature or other desired data relating to the monitor element, which is substantially the same as comparable data for the objects being processed.
    Type: Grant
    Filed: June 2, 1995
    Date of Patent: November 19, 1996
    Assignees: AT&T Global Information Solutions Company, Hyundai Electronics America, Symbios Logic Inc.
    Inventors: James P. Yakura, Richard K. Cole, Matthew S. Von Thun, Crystal J. Hass, Derryl D. J. Allman
  • Structure and method for remotely measuring process data
    Patent number: 5466614
    Abstract: A method and structure for sensing data such as temperature with respect to objects such as silicon wafers undergoing fabrication or other processes involve the use of a monitor element of material and configuration similar to that of the objects being processed. A structure such as a closed loop or segment of a spiral may be formed on the surface of the monitor element, and acts as a secondary coil when brought into operative relation with a transformer structure which includes a primary coil, a current source and a sensing device. The sensing device senses variations in the electrical characteristics in the primary coil, caused by the presence of the monitor element, and can thereby determine the temperature or other desired data relating to the monitor element, which is substantially the same as comparable data for the objects being processed.
    Type: Grant
    Filed: September 20, 1993
    Date of Patent: November 14, 1995
    Assignees: AT&T Global Information Solutions Company, Hyundai Electronics America
    Inventors: James P. Yakura, Richard K. Cole, Matthew S. Von Thun, Crystal J. Hass, Derryl D. J. Allman