Patents by Inventor Cuihuan WANG

Cuihuan WANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12292396
    Abstract: An X-ray analysis system is provided with multi-source design and an X-ray analysis method is provided with multi-source design. According to the embodiments, the X-ray analysis system includes a ray source including a plurality of ray generating devices that generate a ray; a detector that detects a signal generated due to an analyzed object being irradiated by the ray from the ray source; and a controller that controls the ray source, so that two or more ray generating devices in the ray source simultaneously generate corresponding rays to irradiate the analyzed object.
    Type: Grant
    Filed: January 23, 2023
    Date of Patent: May 6, 2025
    Assignee: SHENZHEN ANGSTROM EXCELLENCE TECHNOLOGY CO. LTD
    Inventors: Xuena Zhang, Feng Hong, Cuihuan Wang
  • Publication number: 20240044821
    Abstract: Disclosed is a combined X-ray fluorescence (XRF) analysis device. According to embodiments, the combined X-ray fluorescence analysis device includes: a ray emission channel including a ray source; an energy dispersive XRF (EDXRF) detection channel including an EDXRF detector, and the EDXRF detector is configured to detect fluorescence at different energies within a certain energy range in fluorescence emitted by an object irradiated by a ray from the ray emission channel; and a wavelength dispersive XRF (WDXRF) detection channel including a WDXRF detector, and the WDXRF detector is configured to detect fluorescence at one or more specific wavelengths in the fluorescence emitted by the object irradiated by the ray from the ray emission channel.
    Type: Application
    Filed: May 4, 2023
    Publication date: February 8, 2024
    Inventors: Xuena ZHANG, Feng HONG, Cuihuan WANG
  • Publication number: 20230236143
    Abstract: An X-ray analysis system is provided with multi-source design and an X-ray analysis method is provided with multi-source design. According to the embodiments, the X-ray analysis system includes a ray source including a plurality of ray generating devices that generate a ray; a detector that detects a signal generated due to an analyzed object being irradiated by the ray from the ray source; and a controller that controls the ray source, so that two or more ray generating devices in the ray source simultaneously generate corresponding rays to irradiate the analyzed object.
    Type: Application
    Filed: January 23, 2023
    Publication date: July 27, 2023
    Inventors: Xuena ZHANG, Feng HONG, Cuihuan WANG