Abstract: A system for determining scattering parameters (S-parameters) characterizing the behavior of a network applies a wideband stimulus signal containing multiple signal components as input to the network. The system then measures incident and reflected waveforms at all of the network's ports, digitizes and converts the measured waveforms from time domain to frequency domain data, and then computes the S-parameters values for each frequency component of interest from the frequency domain data for that frequency. The system also determines its own error coefficients (E-coefficients) for each frequency of interest from data collected during a sequence of measurements in response to either a sinusoid or a wideband signal and adjusts the computed S-parameter values accordingly.

Abstract: A method of creating a layer-to-layer alignment mark in a semiconductor wafer includes the step of depositing a first conductor layer on a substrate associated with the semiconductor wafer. The method also includes the step of fabricating a number of alignment trenches in the first conductor layer. Moreover, the method includes the step of depositing a first insulator layer on the first conductor layer so as to fill the number of alignment trenches. Yet further, the method includes the step of removing material associated with the first insulator layer from the number of alignment trenches such that an upper surface of the first conductor layer and an upper surface of the first insulator layer define a first alignment step feature which possesses a predetermined height. The method also includes the step of depositing a second conductor layer on the semiconductor wafer subsequent to the removing step. A semiconductor wafer is also disclosed.

Abstract: A system for determining scattering parameters (S-parameters) characterizing the behavior of a network applies a wideband stimulus signal containing multiple signal components as input to the network. The system then measures incident and reflected waveforms at all of the network's ports, digitizes and converts the measured waveforms from time domain to frequency domain data, and then computes the S-parameters values for each frequency component of interest from the frequency domain data for that frequency. The system also determines its own error coefficients (E-coefficients) for each frequency of interest from data collected during a sequence of measurements in response to either a sinusoid or a wideband signal and adjusts the computed S-parameter values accordingly.

Abstract: A method of creating a layer-to-layer alignment mark in a semiconductor wafer includes the step of depositing a first conductor layer on a substrate associated with the semiconductor wafer. The method also includes the step of fabricating a number of alignment trenches in the first conductor layer. Moreover, the method includes the step of depositing a first insulator layer on the first conductor layer so as to fill the number of alignment trenches. Yet further, the method includes the step of removing material associated with the first insulator layer from the number of alignment trenches such that an upper surface of the first conductor layer and an upper surface of the first insulator layer define a first alignment step feature which possesses a predetermined height. The method also includes the step of depositing a second conductor layer on the semiconductor wafer subsequent to the removing step. A semiconductor wafer is also disclosed.