Abstract: A laser system having a multi-pass amplifier system which includes at least one seed source configured to output at least one seed signal having a seed signal wavelength, at least one pump source configured to output at least one pump signal, at least one multi-pass amplifier system in communication with the seed source and having at least one gain media, a first mirror, and at least a second mirror therein, the gain media device positioned between the first mirror and second mirror and configured to output at least one amplifier output signal having an output wavelength range, the first mirror and second mirror may be configured to reflect the amplifier output signal within the output wavelength range, and at least one optical system may be in communication with the amplifier system and configured to receive the amplifier output signal and output an output signal within the output wavelength range.

Abstract: A laser system having a multi-pass amplifier system which includes at least one seed source configured to output at least one seed signal having a seed signal wavelength, at least one pump source configured to output at least one pump signal, at least one multi-pass amplifier system in communication with the seed source and having at least one gain media, a first mirror, and at least a second mirror therein, the gain media device positioned between the first mirror and second mirror and configured to output at least one amplifier output signal having an output wavelength range, the first mirror and second mirror may be configured to reflect the amplifier output signal within the output wavelength range, and at least one optical system may be in communication with the amplifier system and configured to receive the amplifier output signal and output an output signal within the output wavelength range.

Abstract: A laser system having a multi-pass amplifier system which includes at least one seed source configured to output at least one seed signal having a seed signal wavelength, at least one pump source configured to output at least one pump signal, at least one multi-pass amplifier system in communication with the seed source and having at least one gain media, a first mirror, and at least a second mirror therein, the gain media device positioned between the first mirror and second mirror and configured to output at least one amplifier output signal having an output wavelength range, the first mirror and second mirror may be configured to reflect the amplifier output signal within the output wavelength range, and at least one optical system may be in communication with the amplifier system and configured to receive the amplifier output signal and output an output signal within the output wavelength range.

Abstract: A laser system having a multi-pass amplifier system which includes at least one seed source configured to output at least one seed signal having a seed signal wavelength, at least one pump source configured to output at least one pump signal, at least one multi-pass amplifier system in communication with the seed source and having at least one gain media, a first mirror, and at least a second mirror therein, the gain media device positioned between the first mirror and second mirror and configured to output at least one amplifier output signal having an output wavelength range, the first mirror and second mirror may be configured to reflect the amplifier output signal within the output wavelength range, and at least one optical system may be in communication with the amplifier system and configured to receive the amplifier output signal and output an output signal within the output wavelength range.

Abstract: The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.

Abstract: The present invention provides a gas discharge laser having at least one long-life elongated electrode for producing at least 12 billion high voltage electric discharges in a fluorine containing laser gas. In a preferred embodiment at least one of the electrodes is comprised of a first material having a relatively low anode erosion rate and a second anode material having a relatively higher anode erosion rate. The first anode material is positioned at a desired anode discharge region of the electrode. The second anode material is located adjacent to the first anode material along at least two long sides of the first material. During operation of the laser erosion occurs on both materials but the higher erosion rate of the second material assures that any tendency of the discharge to spread onto the second material will quickly erode away the second material enough to stop the spread of the discharge.

Abstract: A system is disclosed for protecting an internal EUV light source component from ions generated at a plasma formation site. In one aspect, the system may comprise a plurality of foil plates and an arrangement for generating a magnetic field to deflect ions into one of the foil plate surfaces. In another aspect, an electrostatic grid may be positioned for interaction with ions to reduce ion energy, and a magnetic field may be used to deflect the reduced energy ions onto paths wherein the ions do not strike the internal component. In yet another aspect, a grid may be connected to a circuit tuned to a resonant frequency to reduce ion energy. For example, the resonant frequency may be substantially equal to an inverse of a time difference between the time when electrons reach the grid and a subsequent time when ions reach the grid.

Abstract: The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.

Abstract: A method and apparatus if disclosed which may comprise a high power high repetition rate gas discharge laser UV light source which may comprise: a gas discharge chamber comprising an interior wall comprising a vertical wall and an adjacent bottom wall; a gas circulation fan creating a gas flow path adjacent the interior vertical wall and the adjacent bottom wall; an in-chamber dust trap positioned a region of low gas flow, which may be along an interior wall and may comprise at least one meshed screen, e.g., a plurality of meshed screens, which may comprise at least two different gauge meshed screens. The dust trap may extend along the bottom interior wall of the chamber and/or a vertical portion of the interior wall. The dust trap may comprise a first meshed screen having a first gauge; a second meshed screen having a second gauge smaller than the first gauge; and the second meshed screen intermediate the first meshed screen and the interior wall.

Abstract: An apparatus and method is described for effectively and efficiently providing plasma irradiation laser light pulses in an LPP EUV light source which may comprise a laser initial target irradiation pulse generating mechanism irradiating a plasma initiation target with an initial target irradiation pulse to form an EUV generating plasma having an emission region emitting in-band EUV light; a laser plasma irradiation pulse generating mechanism irradiating the plasma with a plasma irradiation pulse after the initial target irradiation pulse so as to compress emission material in the plasma toward the emission region of the plasma.

Abstract: The present invention provides a gas discharge laser having at least one long-life elongated electrode for producing at least 12 billion high voltage electric discharges in a fluorine containing laser gas. In a preferred embodiment at least one of the electrodes is comprised of a first material having a relatively low anode erosion rate and a second anode material having a relatively higher anode erosion rate. The first anode material is positioned at a desired anode discharge region of the electrode. The second anode material is located adjacent to the first anode material along at least two long sides of the first material. During operation of the laser erosion occurs on both materials but the higher erosion rate of the second material assures that any tendency of the discharge to spread onto the second material will quickly erode away the second material enough to stop the spread of the discharge.

Abstract: The present invention provides a gas discharge laser having at least one long-life elongated electrode for producing at least 12 billion high voltage electric discharges in a fluorine containing laser gas. In a preferred embodiment at least one of the electrodes is comprised of a first material having a relatively low anode erosion rate and a second anode material having a relatively higher anode erosion rate. The first anode material is positioned at a desired anode discharge region of the electrode. The second anode material is located adjacent to the first anode material along at least two long sides of the first material. During operation of the laser erosion occurs on both materials but the higher erosion rate of the second material assures that any tendency of the discharge to spread onto the second material will quickly erode away the second material enough to stop the spread of the discharge.

Abstract: The present invention provides a gas discharge laser having at least one long-life elongated electrode for producing at least 12 billion high voltage electric discharges in a fluorine containing laser gas. In a preferred embodiment at least one of the electrodes is comprised of a first material having a relatively low anode erosion rate and a second anode material having a relatively higher anode erosion rate. The first anode material is positioned at a desired anode discharge region of the electrode. The second anode material is located adjacent to the first anode material along at least two long sides of the first material. During operation of the laser erosion occurs on both materials but the higher erosion rate of the second material assures that any tendency of the discharge to spread onto the second material will quickly erode away the second material enough to stop the spread of the discharge.