Patents by Inventor Cynthia Pierre

Cynthia Pierre has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • BIORENEWABLE BIODEGRADABLE SURFACTANTS
    Publication number: 20140200353
    Abstract: Disclosed are compounds of formula (I) and salts, hydrates, or solvates thereof, where R1 and R2 are defined herein, compositions containing these compounds, and methods of using these compounds in a variety of applications, such as a surfactant or performance additive.
    Type: Application
    Filed: August 16, 2012
    Publication date: July 17, 2014
    Applicant: DOW GLOBAL TECHNOLOGIES ,LLC
    Inventors: Brad C. Bailey, Sze-Sze Ng, Cynthia Pierre, Cynthia L. Rand
  • Enhancing the physical properties of semi-crystalline polymers via solid-state shear pulverization
    Patent number: 8729223
    Abstract: Solid-state shear pulverization of semi-crystalline polymers and copolymers thereof and related methods for enhanced crystallization kinetics and physical/mechanical properties.
    Type: Grant
    Filed: April 1, 2013
    Date of Patent: May 20, 2014
    Assignee: Northwestern University
    Inventors: John M. Torkelson, Cynthia Pierre, Amanda Flores
  • Enhancing the Physical Properties of Semi-Crystalline Polymers via Solid-State Shear Pulverization
    Publication number: 20140031508
    Abstract: Solid-state shear pulverization of semi-crystalline polymers and copolymers thereof and related methods for enhanced crystallization kinetics and physical/mechanical properties.
    Type: Application
    Filed: April 1, 2013
    Publication date: January 30, 2014
    Applicant: Northwestern University
    Inventors: John M. Torkelson, Cynthia Pierre, Amanda Flores
  • Enhancing the physical properties of semi-crystalline polymers via solid-state shear pulverization
    Patent number: 8410245
    Abstract: Solid-state shear pulverization of semi-crystalline polymers and copolymers thereof and related methods for enhanced crystallization kinetics and physical/mechanical properties.
    Type: Grant
    Filed: February 2, 2009
    Date of Patent: April 2, 2013
    Assignee: Northwestern University
    Inventors: John M. Torkelson, Cynthia Pierre, Amanda Flores
  • UNDERLAYER COMPOSITION AND METHOD OF IMAGING UNDERLAYER
    Publication number: 20120088192
    Abstract: A method of forming a pattern comprises diffusing an acid, generated by irradiating a portion of a photosensitive layer, into an underlayer comprising an acid sensitive copolymer comprising an acid decomposable group and an attachment group, to form an interpolymer crosslink and/or covalently bonded to the surface of the substrate. Diffusing comprises heating the underlayer and photosensitive layer. The acid sensitive group reacts with the diffused acid to form a polar region at the surface, in the shape of the pattern. The photosensitive layer is removed to forming a self-assembling layer comprising a block copolymer having a block with an affinity for the polar region, and a block having less affinity than the first. The first block forms a domain aligned to the polar region, and the second block forms a domain aligned to the first. Removing either the first or second domain exposes a portion of the underlayer.
    Type: Application
    Filed: October 4, 2011
    Publication date: April 12, 2012
    Applicants: DOW GLOBAL TECHNOLOGIES LLC, ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Peter Trefonas, Phillip Dene Hustad, Cynthia Pierre
  • UNDERLAYER COMPOSITION AND METHOD OF IMAGING UNDERLAYER COMPOSITION
    Publication number: 20120088188
    Abstract: A method of forming a pattern comprises diffusing an acid formed by irradiating a portion of a photosensitive layer, into an underlayer comprising an acid sensitive copolymer having acid decomposable groups and attachment groups covalently bonded to the surface of the substrate and/or forming an interpolymer crosslink. Diffusing comprises heating the underlayer and photosensitive layer. The acid sensitive group reacts with the diffused acid to form a polar region on the underlayer, with the shape of the pattern. The photosensitive layer is removed, forming a self-assembling layer comprising a block copolymer having a first block with an affinity for the polar region, and a second block having less affinity for the polar region. The first block forms a domain aligned to the polar region, and the second block forms another domain aligned to the first. Removing either domain exposes a portion of the underlayer.
    Type: Application
    Filed: October 4, 2011
    Publication date: April 12, 2012
    Applicants: DOW GLOBAL TECHNOLOGIES LLC, ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Peter Trefonas, Phillip Dene Hustad, Cynthia Pierre
  • Enhancing the physical properties of semi-crystalline polymers via solid-state shear pulverization
    Publication number: 20090198032
    Abstract: Solid-state shear pulverization of semi-crystalline polymers and copolymers thereof and related methods for enhanced crystallization kinetics and physical/mechanical properties.
    Type: Application
    Filed: February 2, 2009
    Publication date: August 6, 2009
    Inventors: John M. Torkelson, Cynthia Pierre, Amanda Flores