Patents by Inventor Da-Bai Jiang

Da-Bai Jiang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Monitoring method of exposure apparatus
    Patent number: 8233142
    Abstract: In a monitoring method of an exposure apparatus, a top critical dimension (TCD) and a bottom critical dimension (BCD) of the test pattern formed on a photo-sensitive material layer are measured. A dose deviation (?E) and a focus deviation (?F) are calculated by following equations: TCD+BCD=??E+(TCD0+BCD0) TCD?BCD=?1?F+?2?F3 Here, ?, ?1 and ?2 are constants, ?E=E?E0, ?F=F?F0, E represents a real exposure dose, F represents a real exposure focus, E0 represents a dose defined when a middle critical dimension of the test pattern is equal to a predetermined value, F0 represents a focus defined when TCD of the test pattern is equal to BCD thereof, and TCD0 and BCD0 are theoretical values in case of E0 and F0.
    Type: Grant
    Filed: September 29, 2009
    Date of Patent: July 31, 2012
    Assignee: United Microelectronics Corp.
    Inventors: Da-Bai Jiang, Ching-Shu Lo
  • MONITORING METHOD OF EXPOSURE APPARATUS
    Publication number: 20110076601
    Abstract: In a monitoring method of an exposure apparatus, a top critical dimension (TCD) and a bottom critical dimension (BCD) of the test pattern formed on a photo-sensitive material layer are measured. A dose deviation (?E) and a focus deviation (?F) are calculated by following equations: TCD+BCD=??E+(TCD0+BCD0) TCD?BCD=?1?F+?2?F3 Here, ?, ?1 and ?2 are constants, ?E=E?E0, ?F=F?F0, E represents a real exposure dose, F represents a real exposure focus, E0 represents a dose defined when a middle critical dimension of the test pattern is equal to a predetermined value, F0 represents a focus defined when TCD of the test pattern is equal to BCD thereof, and TCD0 and BCD0 are theoretical values in case of E0 and F0.
    Type: Application
    Filed: September 29, 2009
    Publication date: March 31, 2011
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Da-Bai Jiang, Ching-Shu Lo