Patents by Inventor Da-Yo Liu

Da-Yo Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic process for multi-etching steps by using single reticle
    Patent number: 7129026
    Abstract: This invention provides a lithographic process for multi-etching steps by using single reticle, wherein the develop step is performed next to a bake step after the photoresist layer has been exposed, such that a photoresist residue is formed on the peripheral region around a transformed pattern of the photoresist. Because the photoresist residue has thinner thickness compared to the photoresist layer, this kind of developed photoresist layer can be used as the very mask for multi-etching steps.
    Type: Grant
    Filed: February 12, 2003
    Date of Patent: October 31, 2006
    Assignee: Chungwha Picture Tubes, Ltd.
    Inventors: Da-Yo Liu, Chin-Tzu Kao, Jui-Chung Chang, Yi-Tsai Hsu
  • Lithographic process for multi-etching steps by using single reticle
    Publication number: 20040157166
    Abstract: This invention provides a lithographic process for multi-etching steps by using single reticle, wherein the develop step is performed next to a bake step after the photoresist layer has been exposed, such that a photoresist residue is formed on the peripheral region around a transformed pattern of the photoresist. Because the photoresist residue has thinner thickness compared to the photoresist layer, this kind of developed photoresist layer can be used as the very mask for multi-etching steps.
    Type: Application
    Filed: February 12, 2003
    Publication date: August 12, 2004
    Inventors: Da-Yo Liu, Chin-Tzu Kao, Jui-Chung Chang, Yi-Tsai Hsu