Abstract: A plasma processing apparatus includes a plasma chamber, an electrostatic chuck disposed in the plasma chamber and a pressure control ring disposed in the plasma chamber. The pressure control ring includes a body surrounding an electrostatic chuck in a plan view, an exhaust part disposed in a portion of the body along a first direction, the exhaust part configured to induce a flow of gas in the plasma chamber toward the first direction in a plan view, and a blocking part disposed in another portion of the body along a second direction perpendicular to the first direction in a plan view, the blocking part configured to block the flow of the gas in the second direction.

Abstract: A showerhead has a body portion includes first and second surface opposite surfaces, a gas supply channel open at the first surface, and a plurality of gas injecting holes connected to the gas supply channel and open at the second surface to allow gas delivered through the gas supply channel to be discharged from the showerhead at the second surface. The second surface has a first region and a second region, divided by a first virtual line passing through a center of the second surface. The gas injecting holes are inclined in directions substantially perpendicular to the first virtual line to discharge gas in directions away from the first virtual line, and gas injecting holes open at the first region and the second region are inclined in opposite directions.