Abstract: Disclosed are a substrate processing method and a substrate processing apparatus, and more particularly, a substrate processing apparatus which treats a substrate by adjusting airflow supplied to a process space.

Abstract: The present disclosure relates to a spiral baffle system that can adjust the pitch of spiral baffles installed to be spaced apart along the longitudinal direction in the housing during the process of mixing and heating a treatment object inputted and transferred into the housing of the heating furnace.

Abstract: Disclosed is an apparatus for treating a substrate, the apparatus including: a process chamber for treating a substrate with a treatment solution; a treatment solution supply pipe for supplying a liquid used for a liquid treatment to the process chamber; a mixing unit connected to the treatment solution supply pipe and having a mixing space formed therein; a first liquid pipe for supplying a first liquid to the mixing space; a second liquid pipe for supplying a second liquid to the mixing space; an intake pipe for decompressing the mixing space; a first valve for regulating the supply of the first liquid to the mixing space; a second valve for regulating the supply of the second liquid to the mixing space; and an intake valve for regulating whether to decompress the mixing space, in which the mixing unit includes a body including the mixing space, and a first inlet port, a second inlet port, a third inlet port, and an outlet port connected with the mixing space, the outlet port is connected with the liquid su

Abstract: Proposed are a substrate processing apparatus and a substrate processing method capable of efficiently preventing contamination of a substrate and a processing space caused by a reverse flow of purge gas.

Abstract: There are provided a small nuclear reactor cooling system and cooling method. The small nuclear reactor cooling system includes: a cooling unit in which a small nuclear reactor is positioned and which performs cooling processing corresponding to a severe accident in the cooling system when the severe accident occurs in the small nuclear reactor, wherein the cooling unit provides a 1st cooling fluid so as to perform the cooling processing in response to heat generated by the severe accident.

Abstract: Disclosed is a substrate processing apparatus including: a processing container having a processing space therein; a support unit for supporting and rotating a substrate within the processing space; and a nozzle unit for supplying a treatment solution to the substrate, in which the processing container includes a plurality of cups that encloses the processing space and is provided so that openings through which the treatment solution is introduced are stacked in an up and down direction, and each of the plurality of cups includes: a sidewall; and an upper wall extending from the sidewall toward the processing space, and an inner end of an upper wall of a first cup, of which the upper wall is located at the uppermost side among the plurality of cups, protrudes further toward the processing space than an inner end of an upper wall of another cup.

Abstract: An image sensor according to one embodiment may comprise: an image sensing unit which receives light and generates a first Bayer pattern having a first resolution; and a processor which receives a second Bayer pattern that is at least a portion of the first Bayer pattern from the image sensing unit, and then generates a third Bayer pattern having a higher resolution than the second alignment unit on the basis of the received second Bayer pattern.

Abstract: Disclosed is a sterilization device. One embodiment of the sterilization device comprises: a frame including a first coupling part, a second coupling part, and a first connection part for connecting the first coupling part and the second coupling part; a first circuit board disposed in the first coupling part; a second circuit board disposed in the second coupling part; a first ultraviolet light emitting element disposed on one surface of the first circuit board so as to face in a first direction; a second ultraviolet light emitting element disposed on one surface of the second circuit board so as to face in a second direction crossing the first direction; and a first wiring part connected to the second circuit board to supply power, wherein the first connection part includes a first through-hole through which the first wiring part passes.

Abstract: Proposed are a substrate processing apparatus and a substrate processing method capable of efficiently preventing contamination of a substrate and a processing space caused by a reverse flow of purge gas.

Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a housing having a treating space; a support unit configured to support a substrate in the treating space; and a brush unit configured to clean the substrate supported on the support unit, and wherein the brush unit includes: a body having a circular-shaped cross-section; and a plurality of contact pads protruding from the body and defining a plurality of groove portions for discharging foreign substances dropped from a substrate, each groove portion defined between adjacent contact pads, and wherein a width of the groove portion near a center of the body is different from a width of the groove portion near an edge of the body.

Abstract: The present invention relates to a nanoemulsion ophthalmic composition and a preparation method thereof, wherein the nanoemulsion ophthalmic composition is obtained by mixing cyclosporine, castor oil, hydrophilic and hydrophobic emulsifiers, menthol, and an aqueous solvent, and thus exhibits excellent stability as well as ameliorating ocular irritation such as a feeling of grittiness, blurry vision, and the like.

Abstract: An embodiment discloses a sterilization module comprising: a frame including a support part that includes one surface and one end, and a fastening part connected to the one end; a first circuit board disposed in the fastening part; and an ultraviolet irradiation device disposed on the first circuit board, wherein the support part comprises: the other end facing the one end; and a side end facing the other end. The frame comprises: a protrusion connected to the side end of the support part; and a guide part connected to the other end of the support part. The fastening part and the guide part extend in a first direction perpendicular to one surface of the support part, and the protrusion extends in a direction opposite to the first direction. The guide part comprises: a first guide part and a second guide part that are spaced apart from each other in a second direction parallel to the one end.

Abstract: Provided herein are a fabric-based substrate and an organic electronic device including the same. The fabric-based substrate includes a fabric layer having an upper surface and a lower surface. A plurality of electrodes are disposed on the upper surface of the fabric layer. An adhesive layer is provided on the upper surface and the lower surface of the fabric layer and filled at least some empty regions between the electrodes and the fabric layer, between the electrodes, and at least some pores in the fabric layer. A self-healing polymer layer is disposed on the adhesive layer located on the lower surface of the fabric layer.

Abstract: A method of manufacturing a highly conductive polymer thin film is proposed. The method includes a step of coating a substrate with a first dopant solution including a polymer material and a first dopant to form a conductive polymer thin film subjected to first conductive treatment; and a step of performing second conductive treatment using a second dopant solution including pyronin B on the conductive polymer thin film to form a highly conductive polymer thin film.

Abstract: A light source module including a fixing plate configured to extend in a first direction; a circuit board disposed on the fixing plate; a plurality of ultraviolet light emitting elements disposed on the circuit board in the first direction; a first reflection plate disposed at one side of the fixing plate; and a second reflection plate disposed at the other side of the fixing plate. Further, the plurality of ultraviolet light emitting elements are disposed between the first reflection plate and the second reflection plate in the first direction.

Abstract: An apparatus for treating a substrate of the present invention includes a buffer unit, an inversion unit, a first transfer chamber, a second transfer chamber, a first cleaning chamber, and a second cleaning chamber. The first transfer chamber, the inversion unit, and the second transfer chamber are sequentially arranged in one direction. The first cleaning chamber is disposed at one side of the first transfer chamber, and the second cleaning chamber is disposed at one side of the second transfer chamber. A first main transfer robot provided in the first transfer chamber directly transfers the substrate between the buffer unit, the inversion unit, and the first cleaning chamber. The second main transfer robot provided in the second transfer chamber directly transfers the substrate between the buffer unit, the inversion unit, and the second cleaning chamber.

Abstract: Disclosed in an embodiment is a light source comprising: a housing; a coupling unit which fixes the housing on the target structure; a light source module for emitting light onto the target structure; and a power source module which supplies power to the light source module. The light source module comprises: a first circuit board; a second circuit board disposed on one side of the first circuit board; a third circuit board disposed on another side of the first circuit board; at least one first ultraviolet light emitting element disposed on one surface of the first circuit board; at least one second ultraviolet light emitting element disposed on one surface of the second circuit board; and at least one third ultraviolet light emitting element disposed on one surface of the third circuit board, wherein one surface of the second circuit board and one surface of the third circuit are disposed so as to face each other.

Abstract: Disclosed in an embodiment is a light source comprising: a housing; a coupling unit which fixes the housing on the target structure; a light source module for emitting light onto the target structure; and a power source module which supplies power to the light source module. The light source module comprises: a first circuit board; a second circuit board disposed on one side of the first circuit board; a third circuit board disposed on another side of the first circuit board; at least one first ultraviolet light emitting element disposed on one surface of the first circuit board; at least one second ultraviolet light emitting element disposed on one surface of the second circuit board; and at least one third ultraviolet light emitting element disposed on one surface of the third circuit board, wherein one surface of the second circuit board and one surface of the third circuit are disposed so as to face each other.

Abstract: Provided is a feed side spacer comprising a network structure, wherein the network structure includes a hexagonal eye, the hexagonal eye includes a pair of parallel portions parallel to a flow direction of a supply liquid, and an inclined portion disposed in a diagonal direction with respect to the flow direction of the supply liquid; the parallel portion has a length of 1 mm to 5 mm; the inclined portion has a length of 5.1 mm to 10 mm; and an angle formed by sides in contact with each other of the inclined portion is from 50° to 80°, and a separation membrane element comprising same.

Abstract: Provided is a feed spacer having a three-layer structure, in which a set forming the feed spacer is formed in a three-layer structure, so that the set, which is in contact with a reverse osmosis membrane, convects raw water to a center of the structure of the feed spacer and a laminar flow velocity gradient is generated at the center to decrease a polarization phenomenon of a reverse osmosis filter module and minimize pressure loss, and a reverse osmosis membrane filter module including the feed spacer.