Abstract: The present invention relates to a planar-type plasma diagnosis apparatus comprising: a transmission antenna for applying a frequency-variable microwave to plasma; a reception antenna for receiving the microwave from the plasma; and a body part encompassing the transmission antenna and the reception antenna so that same are insulated from each other, wherein the upper surface of the transmission antenna for applying the microwave and the upper surface of the reception antenna for receiving the microwave are planar, and side surfaces of the upper surfaces of the transmission antenna and the reception antenna face each other.

Abstract: A plasma generation apparatus includes a plasma generation unit. The plasma generation unit has a spherical or elliptical cavity. The plasma generation unit receives radio-frequency (RF) power in such a manner that bounce resonance of electrons is performed to generate plasma in the cavity. The cavity has a plasma extraction hole to communicate with an external space.

Abstract: The present invention relates to a planar-type plasma diagnosis apparatus comprising: a transmission antenna for applying a frequency-variable microwave to plasma; a reception antenna for receiving the microwave from the plasma; and a body part encompassing the transmission antenna and the reception antenna so that same are insulated from each other, wherein the upper surface of the transmission antenna for applying the microwave and the upper surface of the reception antenna for receiving the microwave are planar, and side surfaces of the upper surfaces of the transmission antenna and the reception antenna face each other.

Abstract: A plasma generation apparatus includes a plasma generation unit. The plasma generation unit has a spherical or elliptical cavity. The plasma generation unit receives radio-frequency (RF) power in such a manner that bounce resonance of electrons is performed to generate plasma in the cavity. The cavity has a plasma extraction hole to communicate with an external space.

Abstract: A gas permeability measurement apparatus and a gas permeability measurement method, including a first chamber filled with a measurement gas and maintained at a constant pressure, a second chamber connected in series to the first chamber, a third chamber connected in series to the second chamber, and a separating plate having a through-hole and separating the second chamber and the third chamber from each other. A conductance adjusting part is disposed between the second and third chambers to adjust conductance passing through the through-hole of the separating plate. A vacuum pump is connected to the third chamber to exhaust the third chamber. A differential pressure gauge measures differential pressure between the second and third chambers. A sample is disposed between the first and second chambers. The measurement gas is delivered to the second chamber after permeating the sample, and the conductance adjusting part sequentially provides at least two different conductances.

Abstract: A substrate processing apparatus and method includes a chamber, a remote plasma source outside the chamber to provide activated ammonia and activated hydrogen fluoride into the chamber, and a direct plasma source to provide ion energy to a substrate inside the chamber. The plasma source includes ground electrodes extending in a first direction on a first plane perpendicularly spaced apart from a plane on which the substrate is disposed and defined by the first direction and a second direction perpendicular to the first direction and power electrodes disposed between the ground electrodes, extending in the first direction parallel to each other and receiving power from an RF power source to generate plasma between adjacent ground electrodes. The activated ammonia and the activated hydrogen fluoride are supplied on the substrate through a space between the power electrode and the ground electrode.

Abstract: The present invention relates to a spectroscopy analyzer for real-time diagnostics of process, and more particularly, to a spectroscopy analyzer for real-time diagnostics of process, in which a beam is injected to a reaction byproduct or a reactant and then an output beam is measured, thereby performing quantitative and qualitative analysis of the reaction byproduct or the reactant.

Abstract: The present invention relates to a spectroscopy analyzer for real-time diagnostics of process, and more particularly, to a spectroscopy analyzer for real-time diagnostics of process, in which a beam is injected to a reaction byproduct or a reactant and then an output beam is measured, thereby performing quantitative and qualitative analysis of the reaction byproduct or the reactant.

Abstract: The present invention relates to an apparatus and method for monitoring an electron density and electron temperature of a plasma.

Abstract: A flux distribution measuring apparatus measures distribution of flow rates of a flowable medium. The measuring apparatus includes thin metal wire(s) for scanning a flowable medium and lead wires connected to the thin metal wire(s), wherein a voltage difference is detected between adjacent lead wires while the measuring apparatus scans the flowable medium in the direction perpendicular to a flow path of the flowable medium. The voltage differences are generated due to temperature changes in the thin metal wire(s) while scanning the flowable medium having different flow rates. The measuring apparatus visualizes the distribution of flow rates of a flowable medium using a computer which receives and processes the voltage differences detected.

Abstract: A flux distribution measuring apparatus measures distribution of flow rates of a flowable medium. The measuring apparatus includes thin metal wire(s) for scanning a flowable medium and lead wires connected to the thin metal wire(s), wherein a voltage difference is detected between adjacent lead wires while the measuring apparatus scans the flowable medium in the direction perpendicular to a flow path of the flowable medium. The voltage differences are generated due to temperature changes in the thin metal wire(s) while scanning the flowable medium having different flow rates. The measuring apparatus visualizes the distribution of flow rates of a flowable medium using a computer which receives and processes the voltage differences detected.